Modeling Aspects in Optical Metrology IX最新文献

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Optical measurements and numerical simulations of the Mueller matrix at silicon nanowire structures 硅纳米线结构米勒矩阵的光学测量和数值模拟
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-23 DOI: 10.1117/12.2673770
J. Grundmann, T. Käseberg, B. Bodermann
{"title":"Optical measurements and numerical simulations of the Mueller matrix at silicon nanowire structures","authors":"J. Grundmann, T. Käseberg, B. Bodermann","doi":"10.1117/12.2673770","DOIUrl":"https://doi.org/10.1117/12.2673770","url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"590 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123420824","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Advanced in situ metrology for large aperture flat mirrors 先进的大口径平面镜原位测量技术
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-23 DOI: 10.1117/12.2673949
E. Qi, Hai Hu, Xiao Luo, Zhenyu Liu
{"title":"Advanced in situ metrology for large aperture flat mirrors","authors":"E. Qi, Hai Hu, Xiao Luo, Zhenyu Liu","doi":"10.1117/12.2673949","DOIUrl":"https://doi.org/10.1117/12.2673949","url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"27 24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133650020","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Realization of subsampling schemes for compressive nano-FTIR imaging 压缩纳米ftir成像的子采样方案实现
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-23 DOI: 10.1117/12.2672558
D. Siebenkotten, M. Marschall, G. Wübbeler, A. Hoehl, E. Rühl, C. Elster, B. Kästner
{"title":"Realization of subsampling schemes for compressive nano-FTIR imaging","authors":"D. Siebenkotten, M. Marschall, G. Wübbeler, A. Hoehl, E. Rühl, C. Elster, B. Kästner","doi":"10.1117/12.2672558","DOIUrl":"https://doi.org/10.1117/12.2672558","url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114490516","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
On aberration retrieval for optical microscopes in length metrology 长度计量中光学显微镜像差的提取
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-23 DOI: 10.1117/12.2672294
J. Krüger, B. Bodermann, R. Köning, P. Manley, L. Zschiedrich, Philipp‐Immanuel Schneider, A. Heinrich, C. Eder, Ulrike Zeiser, Aksel Goehnermeier
{"title":"On aberration retrieval for optical microscopes in length metrology","authors":"J. Krüger, B. Bodermann, R. Köning, P. Manley, L. Zschiedrich, Philipp‐Immanuel Schneider, A. Heinrich, C. Eder, Ulrike Zeiser, Aksel Goehnermeier","doi":"10.1117/12.2672294","DOIUrl":"https://doi.org/10.1117/12.2672294","url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125284156","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Simulating achromatic plasmonic lenses with inverted design for improved nano-optics 模拟消色差等离子体透镜的倒置设计改进纳米光学
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-23 DOI: 10.1117/12.2673769
T. Käseberg, S. Kroker, B. Bodermann
{"title":"Simulating achromatic plasmonic lenses with inverted design for improved nano-optics","authors":"T. Käseberg, S. Kroker, B. Bodermann","doi":"10.1117/12.2673769","DOIUrl":"https://doi.org/10.1117/12.2673769","url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130477733","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Forward simulation of coherent beams on grating structures for coherent scatterometry 相干散射测量中光栅结构上相干光束的正演模拟
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-23 DOI: 10.1117/12.2673231
M. Hammerschmidt, L. Zschiedrich, L. Šiaudinytė, P. Manley, Philipp‐Immanuel Schneider, S. Burger
{"title":"Forward simulation of coherent beams on grating structures for coherent scatterometry","authors":"M. Hammerschmidt, L. Zschiedrich, L. Šiaudinytė, P. Manley, Philipp‐Immanuel Schneider, S. Burger","doi":"10.1117/12.2673231","DOIUrl":"https://doi.org/10.1117/12.2673231","url":null,"abstract":"Modelling the scattering of focused, coherent light by nano-scale structures is oftentimes used to reconstruct or infer geometrical or material properties of structures under investigation in optical scatterometry. This comprises both periodic and aperiodic nano-structures. Coherent Fourier scatterometry with focused light exploits the diffraction pattern formed by the nano-structures in Fourier plane. While the scattering of a focused beam by a spatially isolated scatterer is a standard modelling task for state-of-the art electromagnetic solvers based, e.g., on the finite element method, the case of periodically structured samples is more involved. In particular when the focused light covers several grating periods of as it is commonly the case. We will present a coherent illumination model for scattering of focused beams such as Gaussian -- and Bessel -- beams by periodic structures such as line gratings. The model allows to take into account optical wavefront aberrations in optical systems used for both, the illumination and detection of the scattered fields. We compare the model with strategies implemented on large-scale super-cells and inverse Floquet-transform strategies to superimpose both near- and far- fields coherently.","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"56 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130061682","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Systematic influence of line edge roughness on the line width measured by scatterometry 线边缘粗糙度对散射法测量的线宽的系统影响
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-23 DOI: 10.1117/12.2675801
T. Siefke, S. Heidenreich
{"title":"Systematic influence of line edge roughness on the line width measured by scatterometry","authors":"T. Siefke, S. Heidenreich","doi":"10.1117/12.2675801","DOIUrl":"https://doi.org/10.1117/12.2675801","url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114954047","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Efficient simulation of microscopic imaging for reconstruction of nanostructures 纳米结构重建中显微成像的高效模拟
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-23 DOI: 10.1117/12.2673077
P. Manley, J. Krüger, B. Bodermann, R. Köning, A. Heinrich, C. Eder, Aksel Goehnermeier, Ulrike Zeiser, M. Hammerschmidt, L. Zschiedrich, Philipp‐Immanuel Schneider
{"title":"Efficient simulation of microscopic imaging for reconstruction of nanostructures","authors":"P. Manley, J. Krüger, B. Bodermann, R. Köning, A. Heinrich, C. Eder, Aksel Goehnermeier, Ulrike Zeiser, M. Hammerschmidt, L. Zschiedrich, Philipp‐Immanuel Schneider","doi":"10.1117/12.2673077","DOIUrl":"https://doi.org/10.1117/12.2673077","url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124582930","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Efficient reconstruction of model parameters using Bayesian target-vector optimization 利用贝叶斯目标向量优化高效重建模型参数
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-23 DOI: 10.1117/12.2673590
Matthias Plock, Sven Burger, Philipp‐Immanuel Schneider
{"title":"Efficient reconstruction of model parameters using Bayesian target-vector optimization","authors":"Matthias Plock, Sven Burger, Philipp‐Immanuel Schneider","doi":"10.1117/12.2673590","DOIUrl":"https://doi.org/10.1117/12.2673590","url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125221551","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Results of uncertainty evaluation on the thickness and refractive index spectrum measurement of silicon dioxide thin film layer using a spectroscopic ellipsometer 光谱椭偏仪测量二氧化硅薄膜层厚度和折射率光谱的不确定度评定结果
Modeling Aspects in Optical Metrology IX Pub Date : 2023-08-10 DOI: 10.1117/12.2673375
Y. Cho, W. Chegal, Junho Choi
{"title":"Results of uncertainty evaluation on the thickness and refractive index spectrum measurement of silicon dioxide thin film layer using a spectroscopic ellipsometer","authors":"Y. Cho, W. Chegal, Junho Choi","doi":"10.1117/12.2673375","DOIUrl":"https://doi.org/10.1117/12.2673375","url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"23 9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-08-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125689523","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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