Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...最新文献

筛选
英文 中文
On the Formation of Swirl Defects in Silicon and Germanium 硅和锗中旋流缺陷的形成
R. Tognato
{"title":"On the Formation of Swirl Defects in Silicon and Germanium","authors":"R. Tognato","doi":"10.1002/PSSA.2210980248","DOIUrl":"https://doi.org/10.1002/PSSA.2210980248","url":null,"abstract":"","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"60 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91020738","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Temperature Dependence of Electromechanical Properties of LGS Crystals LGS晶体机电性能的温度依赖性
A. B. Ilyaev, B. Umarov, L. A. Shabanova, M. F. Dubovik
{"title":"Temperature Dependence of Electromechanical Properties of LGS Crystals","authors":"A. B. Ilyaev, B. Umarov, L. A. Shabanova, M. F. Dubovik","doi":"10.1002/PSSA.2210980243","DOIUrl":"https://doi.org/10.1002/PSSA.2210980243","url":null,"abstract":"","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"58 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78042924","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 55
Eine analytische Approximation für die Ortsabhängigkeit des Potentials bei Schottky-Randschichten 分析方法对苏格兰地图分区的效能
H. Lemke
{"title":"Eine analytische Approximation für die Ortsabhängigkeit des Potentials bei Schottky-Randschichten","authors":"H. Lemke","doi":"10.1002/PSSA.2210980259","DOIUrl":"https://doi.org/10.1002/PSSA.2210980259","url":null,"abstract":"","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"20 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83166252","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
RF Plasma Annealing Effects at the Wet Oxidized Si/SiO2 Interface 湿氧化Si/SiO2界面的射频等离子体退火效应
S. Alexandrova, A. Szekeres, W. Füssel, H. Flietner
{"title":"RF Plasma Annealing Effects at the Wet Oxidized Si/SiO2 Interface","authors":"S. Alexandrova, A. Szekeres, W. Füssel, H. Flietner","doi":"10.1002/PSSA.2210980239","DOIUrl":"https://doi.org/10.1002/PSSA.2210980239","url":null,"abstract":"Radio frequency (rf) O2-plasma treatments produce markedly annealing effects on wet oxidized Si/SiO2-interfaces being more pronounced at higher substrate temperatures (300°C). This effect may be understood by plasma generated hydrogen in the oxide layer. \u0000 \u0000 \u0000 \u0000Sauerstoff-Hochfrequenzplasmabehandlungen erzeugen bei einem durch feuchte Oxidation hergestellten Si/SiO2-System ausgesprochene Ausheileffekte bei hoheren Substrat-Temperaturen (300°C). Diese Wirkung kann verstanden werden, wenn man eine Wasserstofffreisetzung im Oxid durch das Plasma annimmt.","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"331 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86782458","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Hopping Conduction and Defect States in Reactively Sputtered Silicon Nitride Thin Films 反应溅射氮化硅薄膜的跳变传导和缺陷态
L. Gier, A. Scharmann, D. Schalch
{"title":"Hopping Conduction and Defect States in Reactively Sputtered Silicon Nitride Thin Films","authors":"L. Gier, A. Scharmann, D. Schalch","doi":"10.1002/PSSA.2210980234","DOIUrl":"https://doi.org/10.1002/PSSA.2210980234","url":null,"abstract":"Silicon nitride films are deposited by reactive rf sputtering from a silicon target. Measurements of the electrical conductivity of films are performed between LNT and 400 K. Charge transport characteristics are discussed in terms of thermally activated bandtail and hopping conduction mechanisms with regard to existing models. Defect densities in the midgap of amorphous, hydrogen-free nitride films are determined to be of the order of 1020 cm−3. \u0000 \u0000 \u0000 \u0000Siliziumnitrid-Schichten werden durch reaktives HF-Aufstauben hergestellt. Die elektrische Leitfahigkeit der Schichten wird zwischen LNT und 400 K gemessen. Die Ergebnisse werden anhand existierender Modellvorstellungen als thermisch aktivierte Bandtail- bzw. Hopping-Mechanismen gedeutet. Defektdichten in intrinsischem Siliziumnitrid in der Grosenordnung von 1020 cm−3 konnten bestimmt werden.","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"134 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86325100","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Similarity between Spinodal Decomposition and Clustering in Si Highly Doped with As 高掺As硅中Spinodal分解与聚类的相似性
Lu Zhiheng
{"title":"Similarity between Spinodal Decomposition and Clustering in Si Highly Doped with As","authors":"Lu Zhiheng","doi":"10.1002/PSSA.2210980218","DOIUrl":"https://doi.org/10.1002/PSSA.2210980218","url":null,"abstract":"The diffusion equation of As in supersaturated concentration in Si is established following Cahn's theory based on a coherent phase transformation. The electrically active solubility is quantitatively described by a critical concentration for the spinodal decomposition in an Ising model, and the atomic mixing energy of the AsSi system is determined to ϵ = 0.15 eV. The calculated value of the dimension of the percipitates is compared with the experimental results. \u0000 \u0000 \u0000 \u0000Die Diffusionsgleichung von As in Ubersattigungskonzentration wird fur Si entsprechend der Cahnschen Theorie auf der Grundlage eines koharenten Phasenubergangs aufgestellt. Die elektrisch aktive Loslichkeit wird quantitativ beschrieben durch eine kritische Konzentration fur spinodale Zersetzung in einem Ising-Modell, und die atomare Mischungsenergie des AsSi-Systems wird zu ϵ = 0,15 eV bestimmt. Die berechneten Werte fur die Abmessung der Prazipitate werden mit experimentellen Ergebnissen verglichen.","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"97 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88677931","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Stress Induced Optical Anisotropy in Magnetic Garnet Films 磁性石榴石薄膜中应力诱导的光学各向异性
H. Hemme, H. Dötsch, H. Dammann
{"title":"Stress Induced Optical Anisotropy in Magnetic Garnet Films","authors":"H. Hemme, H. Dötsch, H. Dammann","doi":"10.1002/PSSA.2210980245","DOIUrl":"https://doi.org/10.1002/PSSA.2210980245","url":null,"abstract":"","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"1 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83032769","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
The Optical Absorption Edge of Thin GeO2 Films Doped with Copper 掺杂铜的GeO2薄膜的光学吸收边缘
B. Rai
{"title":"The Optical Absorption Edge of Thin GeO2 Films Doped with Copper","authors":"B. Rai","doi":"10.1002/PSSA.2210980256","DOIUrl":"https://doi.org/10.1002/PSSA.2210980256","url":null,"abstract":"","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"5 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73616894","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Anomalous Photovoltaic Effect in CdTe Films Illuminated with Monochromatic Light 单色光照射下CdTe薄膜的反常光伏效应
S. Sharma, R. Srivastava
{"title":"Anomalous Photovoltaic Effect in CdTe Films Illuminated with Monochromatic Light","authors":"S. Sharma, R. Srivastava","doi":"10.1002/PSSA.2210980232","DOIUrl":"https://doi.org/10.1002/PSSA.2210980232","url":null,"abstract":"","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"58 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73823298","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High Temperature Drift Mobilities in High Resistivity Silicon 高电阻硅的高温漂移迁移率
E. Caselli, R. Cabanillas, R. Wainschenker, M. Cutella
{"title":"High Temperature Drift Mobilities in High Resistivity Silicon","authors":"E. Caselli, R. Cabanillas, R. Wainschenker, M. Cutella","doi":"10.1002/PSSA.2210980258","DOIUrl":"https://doi.org/10.1002/PSSA.2210980258","url":null,"abstract":"","PeriodicalId":90917,"journal":{"name":"Machine learning and interpretation in neuroimaging : international workshop, MLINI 2011, held at NIPS 2011, Sierra Nevada, Spain, December 16-17, 2011 : revised selected and invited contributions. MLINI (Workshop) (2011 : Sierra Nevada...","volume":"76 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1986-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83884416","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信