2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)最新文献

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Modeling of Sputtered Mo-Al2O3 Nanocomposites Using a Combination of FDTD Method and Maxwell Garnett Approximation 基于FDTD和Maxwell Garnett近似的溅射Mo-Al2O3纳米复合材料建模
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/NMDC50713.2021.9677493
Naznin Akter, Muhammad Hasan, J. Becerril-Gonzalez, N. Pala, O. Arés-Muzio
{"title":"Modeling of Sputtered Mo-Al2O3 Nanocomposites Using a Combination of FDTD Method and Maxwell Garnett Approximation","authors":"Naznin Akter, Muhammad Hasan, J. Becerril-Gonzalez, N. Pala, O. Arés-Muzio","doi":"10.1109/NMDC50713.2021.9677493","DOIUrl":"https://doi.org/10.1109/NMDC50713.2021.9677493","url":null,"abstract":"In this study, Mo-Al2O3 nano composites (NCs) films with different thicknesses and nominal metal volume fractions (f) were grown on polished glass substrates, using sequential DC and RF sputtering. The reflectance (R) and transmittance (T) curves of the NCs were measured in the spectral range of 300 nm and 1700 nm. The measured R and T characteristics of NCs were compared with the numerical FDTD models. Two approaches were used: (1) Individual Mo nanoparticles with proper size and distribution (bcc lattice) were modelled. (2) NCs layers were modelled as homogeneous thin films with optical constants (real and imaginary parts of the complex index of refraction) obtained through Maxwell Garnett effective medium approximation. In both cases, optical constants of pure bulk Mo and sputtered Mo were used, and the results were compared.","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"9 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83844691","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Unsupervised Learning & Reservoir Computing Leveraging Analog Spintronic Phenomena 利用模拟自旋电子现象的无监督学习和库计算
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/nmdc50713.2021.9677501
J. Friedman
{"title":"Unsupervised Learning & Reservoir Computing Leveraging Analog Spintronic Phenomena","authors":"J. Friedman","doi":"10.1109/nmdc50713.2021.9677501","DOIUrl":"https://doi.org/10.1109/nmdc50713.2021.9677501","url":null,"abstract":"","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"29 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80855256","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Bioelectronic System Scaling Solutions with Nanopackaging 纳米包装的生物电子系统缩放解决方案
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/nmdc50713.2021.9677503
M. Pulugurtha
{"title":"Bioelectronic System Scaling Solutions with Nanopackaging","authors":"M. Pulugurtha","doi":"10.1109/nmdc50713.2021.9677503","DOIUrl":"https://doi.org/10.1109/nmdc50713.2021.9677503","url":null,"abstract":"","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"257 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76202979","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Dispersive Lossy Media for Narrowing Plasmon Linewidths 用于缩小等离子体线宽的色散有损介质
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/NMDC50713.2021.9677510
Ryan Peck, A. Khademi, Juanjuan Ren, S. Hughes, A. Brolo, R. Gordon
{"title":"Dispersive Lossy Media for Narrowing Plasmon Linewidths","authors":"Ryan Peck, A. Khademi, Juanjuan Ren, S. Hughes, A. Brolo, R. Gordon","doi":"10.1109/NMDC50713.2021.9677510","DOIUrl":"https://doi.org/10.1109/NMDC50713.2021.9677510","url":null,"abstract":"Narrow plasmon linewidths are often desirable for plasmonic devices such as biosensors. Loss is often associated with broad linewidths, and much effort is spent in reducing losses in metals. Although losses can be effectively reduced by a variety of methods such as, reducing surface roughness, and including optical gain to counter the loss, losses will never be fully eliminated from a system [1]. Rather than avoiding loss, we focus on how the linewidth can be reduced in the presence of loss. In this paper, we show how a dispersive lossy surrounding dielectric can narrow the plasmon linewidth. We support this claim with experimental scattering measurements using a dark field microscope, as well as with Green function calculations.","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"9 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74162337","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Proposal of Energy Efficient Ferroelectric PDSOI LIF Neuron for Spiking Neural Network Applications 一种用于脉冲神经网络的高能效铁电PDSOI liff神经元
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/NMDC50713.2021.9677533
P. Sowparna, V. Rajakumari, K. P. Pradhan
{"title":"A Proposal of Energy Efficient Ferroelectric PDSOI LIF Neuron for Spiking Neural Network Applications","authors":"P. Sowparna, V. Rajakumari, K. P. Pradhan","doi":"10.1109/NMDC50713.2021.9677533","DOIUrl":"https://doi.org/10.1109/NMDC50713.2021.9677533","url":null,"abstract":"The proposed device is a partially depleted silicon on insulator (PD-SOI) with a ferroelectric material as a part of gate stack structure demonstrating the functions of leaky integrate and fire (LIF) neurons with a minimum energy of 9.375 pJ/spike and area of $0.25 mu mathrm{m}^{2}$. A high-k ferroelectric (FE) dielectric in the gate stack improves the energy performance by reducing the subthreshold swing. The scaled down area of the device helps to integrate more LIF neurons in the network. The frequency of spiking increases with increase in input voltage which is also an important function in a biological neuron. Thus, the implementation of this device in neuromorphic systems reduces the power consumption by the electronic devices and improves the overall performance.","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"31 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75776219","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
FEM Approach to the Robust Design of a Graphene-Based 3D Structure for THz Devices 基于石墨烯的太赫兹器件三维结构稳健设计的有限元方法
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/NMDC50713.2021.9677563
P. Kuzhir, Monica La Mura, P. Lamberti, A. Paddubskaya, V. Tucci, V. Vanyukov
{"title":"FEM Approach to the Robust Design of a Graphene-Based 3D Structure for THz Devices","authors":"P. Kuzhir, Monica La Mura, P. Lamberti, A. Paddubskaya, V. Tucci, V. Vanyukov","doi":"10.1109/NMDC50713.2021.9677563","DOIUrl":"https://doi.org/10.1109/NMDC50713.2021.9677563","url":null,"abstract":"In this work, we propose the investigation of the terahertz performance of a graphene-based multilayer metasurface, assessing the reflection and absorption capability of the considered structure in the view of designing a robust passive device for the manipulation of THz radiation. In particular, we develop a Finite Element Method (FEM)-based model of a patterned SiO2/gold/PMMA/graphene/PMMA multilayer device and use it to assess the electromagnetic response in the THz frequency range of the proposed metamaterial. The structure has a SiO2 substrate, patterned with straight grooves and covered by a nanometric thin film of gold. On top of the cavities is a PMMA/graphene/PMMA sandwich layer. By considering an incident wave on the top surface, the absorption enhancement provided by the addition of the graphene layer is assessed. Further, the impact of the patterning layout, i.e. the grooves' height variation, on the THz power transmission, reflection, and absorption of normally incident EM waves is investigated. The FEM model provides the ideal tool for the assessment of the device sensitivity to the design parameters, allowing the design centering in the most robust nominal solution.","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"52 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85610608","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
D-Shaped Photonic Crystal Fiber Based Surface Plasmon Resonance Sensor Using Dual Coating of Metal Oxide for Healthcare Applications 基于双金属氧化物涂层的d形光子晶体光纤表面等离子体共振传感器在医疗保健中的应用
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/NMDC50713.2021.9677553
Veerpal Kaur, Surinder Singh
{"title":"D-Shaped Photonic Crystal Fiber Based Surface Plasmon Resonance Sensor Using Dual Coating of Metal Oxide for Healthcare Applications","authors":"Veerpal Kaur, Surinder Singh","doi":"10.1109/NMDC50713.2021.9677553","DOIUrl":"https://doi.org/10.1109/NMDC50713.2021.9677553","url":null,"abstract":"The phenomenon of surface plasmon resonance (SPR) is the basis of adsorption measurements for many tools that have resulted in several sensor applications. In this paper, a D-shaped photonic crystal fiber (PCF) based surface plasmon resonance (SPR) sensor with dual coating of conducting metal oxide is proposed. A brief study is performed to analyze the use of dual coated metal oxide plasmonic material to sense the lower refractive index (RI) chemicals. Firstly, the flat surface of photonic crystal fiber is coated with Indium Tin Oxide (ITO) followed by a coat of Zinc Oxide (ZnO) to enhance the plasmonpolariton generation. The SPR wavelength is tuned to the infrared region by changing the metal doping concentration. The external flat surface of the sensor is more convenient for liquid infiltration than liquid filling into small circular holes in conventional PCF sensors. The proposed sensor design has maximum wavelength sensitivity of 10000 nm/RIU in the RI detection range of 1.30-1.38 with a resolution of $2.0 times 10^{-5}$ and can be utilized specifically in the lab-on-chip technology for healthcare industry.","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"22 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86206444","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Atomic-scale Modeling of 2D Material Based Contacts and Transistors for Nanoscale Electronics 纳米电子学中基于二维材料的触点和晶体管的原子尺度建模
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/nmdc50713.2021.9677494
L. Jelver, K. Jacobsen, O. Hansen, S. Smidstrup, V. Arcisauskaite, A. Blom
{"title":"Atomic-scale Modeling of 2D Material Based Contacts and Transistors for Nanoscale Electronics","authors":"L. Jelver, K. Jacobsen, O. Hansen, S. Smidstrup, V. Arcisauskaite, A. Blom","doi":"10.1109/nmdc50713.2021.9677494","DOIUrl":"https://doi.org/10.1109/nmdc50713.2021.9677494","url":null,"abstract":"","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"30 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83781720","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Pulsed nanosecond discharge in heptane in contact with Ag solution: Feasibility of nanoparticles synthesis 与银溶液接触的庚烷脉冲纳秒放电:纳米颗粒合成的可行性
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/nmdc50713.2021.9677524
K. Mohammadi, A. Hamdan
{"title":"Pulsed nanosecond discharge in heptane in contact with Ag solution: Feasibility of nanoparticles synthesis","authors":"K. Mohammadi, A. Hamdan","doi":"10.1109/nmdc50713.2021.9677524","DOIUrl":"https://doi.org/10.1109/nmdc50713.2021.9677524","url":null,"abstract":"","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"24 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84853789","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Viability of Boron Nitride Nanotubes as a Support Structure for Metal Nanoparticle Catalysts for the Plasma-Catalytic Synthesis of Ammonia 氮化硼纳米管作为金属纳米颗粒催化剂在等离子体催化合成氨中的可行性
2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC) Pub Date : 2021-12-12 DOI: 10.1109/NMDC50713.2021.9677529
Steven Walker, Gareth D Price, Elmira Pajootan, S. Coulombe
{"title":"Viability of Boron Nitride Nanotubes as a Support Structure for Metal Nanoparticle Catalysts for the Plasma-Catalytic Synthesis of Ammonia","authors":"Steven Walker, Gareth D Price, Elmira Pajootan, S. Coulombe","doi":"10.1109/NMDC50713.2021.9677529","DOIUrl":"https://doi.org/10.1109/NMDC50713.2021.9677529","url":null,"abstract":"Nonthermal plasma-catalytic processes are being investigated as an alternative method to the energy-intensive and environmentally impactful Haber-Bosch (H-B) process for ammonia synthesis. Due to the large-scale production of this commodity chemical, the H-B process uses 1-2% of the world's energy, 3-5% of the world's refined natural gas and corresponding CO2 emissions. With the recent development of large-scale electrolysers for H2 production powered by renewable electricity, the integration of a plasma process at scale may be the last step toward the all-electric and environment-friendly green ammonia synthesis. However, the most encouraging results are still an order of magnitude below the H-B process in terms of energy efficiency. Key to success are the nanocatalysts, the plasma excitation and gas mixing, with reaction kinetics as the coupling between these variables. Boron nitride nanotubes (BNNTs) are a dielectric material with high chemical and thermal stability, and a unique affinity to ammonia. These properties make them interesting substrates for nanocatalysts. We report on the surface modification of BNNTs and the deposition of metal catalyst nanoparticles by two sequential plasma processing steps; plasma functionalization and pulsed laser ablation to produce BNNT-supported nanoparticle catalysts. We also report our additional findings on the morphology, activity, and stability of the produced catalysts.","PeriodicalId":6742,"journal":{"name":"2021 IEEE 16th Nanotechnology Materials and Devices Conference (NMDC)","volume":"20 1","pages":"1-5"},"PeriodicalIF":0.0,"publicationDate":"2021-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74283700","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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