2018 4th IEEE International Conference on Emerging Electronics (ICEE)最新文献

筛选
英文 中文
Functionalized Silicon Nanoporous Membranes for Efficient Dialysis 用于高效透析的功能化硅纳米孔膜
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/icee44586.2018.8938002
Ananya Ghosh, Fidal V T, S. Sengupta, E. Bhattacharya
{"title":"Functionalized Silicon Nanoporous Membranes for Efficient Dialysis","authors":"Ananya Ghosh, Fidal V T, S. Sengupta, E. Bhattacharya","doi":"10.1109/icee44586.2018.8938002","DOIUrl":"https://doi.org/10.1109/icee44586.2018.8938002","url":null,"abstract":"Suitability of using ultrathin silicon nanoporous membranes (SNMs), fabricated using batch processes, for use in dialysis is investigated. In the present work, the diffusion of urea and creatinine through the SNMs were studied using two reservoirs containing the retentate and the permeate solution. Stirring of the solutions in the reservoirs was found to accelerate the diffusion process. Surface treatments on the SNM were carried out to prevent bio-fouling. Silanization followed by acid treatment was found to be the most effective method for preventing binding of urea on the SNM surface. Constant cycling in the trans-reservoir, maintained the concentration gradient of the dialysate and the diffusion increased significantly. The SNM appears to be a promising candidate for dialysis.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"22 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87255965","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Thin EOT MoS2 FET for Efficient Photodetection and Gas Sensing 用于高效光电检测和气体传感的薄EOT MoS2场效应管
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/icee44586.2018.8937927
Kartikey Thakar, Abin Varghese, Sushovan Dhara, Sayantani Ghosh, S. Lodha
{"title":"Thin EOT MoS2 FET for Efficient Photodetection and Gas Sensing","authors":"Kartikey Thakar, Abin Varghese, Sushovan Dhara, Sayantani Ghosh, S. Lodha","doi":"10.1109/icee44586.2018.8937927","DOIUrl":"https://doi.org/10.1109/icee44586.2018.8937927","url":null,"abstract":"In this report, we demonstrate photodetection and gas sensing using thin (scaled) effective oxide thickness (EOT) bottom gate molybdenum disulfide (MoS2) field-effect transistors (FETs). The thin EOT enables low voltage operation while the bottom gate architecture eliminates parasitic top gate optical absorption losses during photodetection and provides open top surface area for gas sensing. Electrical characterization of the MoS2 FETs shows an on-state mobility of 35 cm2/Vs for an operating voltage range of 1 V with excellent electrostatic control. The bottom gate MoS2 FETs were employed for photodetection and gas sensing with a low operating voltage range of 0.5 V. High responsivity of 2 A/W, and a photo-amplification ratio of 103 were obtained for 532 nm illumination. Sensitivity value of nearly 32% was obtained for N2 gas exposure.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"17 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90315244","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
GaN Growth Process by MOCVD Revisited: TEM Study of Microstructural Evolution Presented 回顾了MOCVD生长GaN的过程:TEM研究了微观结构的演变
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/icee44586.2018.8937929
S. Saha, Krishna Yaddanapudi, K. Muraleedharan, S. Raghavan, D. Banerjee
{"title":"GaN Growth Process by MOCVD Revisited: TEM Study of Microstructural Evolution Presented","authors":"S. Saha, Krishna Yaddanapudi, K. Muraleedharan, S. Raghavan, D. Banerjee","doi":"10.1109/icee44586.2018.8937929","DOIUrl":"https://doi.org/10.1109/icee44586.2018.8937929","url":null,"abstract":"Microstructure evolution of GaN grown on c-sapphire by MOCVD has been systematically studied using transmission electron microscopy based techniques. Individual samples have been derived by interrupting the GaN growth at various steps, starting from nitridation at 530° C, followed by the standard two step growth comprising of first deposition of low temperature GaN nucleation layer (LT-GaN NL) and then ramping up the temperature followed by high temperature GaN epilayer growth. Effect of nitridation, and the microstructure of the nitride layer for various nitridation temperatures has been recently reported by our group [1], where we have shown that the nitride layer formed at this nitridation temperature is cubic spinel AlxOyNz. In this paper it will be shown, that the LT-GaN grown on this AlxOyNz (after nitridation at 530° C) is primarily cubic zinc blende (zb) in structure, with multiple twin variants existing about various {111} planes. Its crystallographic orientation relationships with the underlying nitride layer and the sapphire substrate will be shown. The transformation of LT-GaN and the regions of transformation from cubic zb phase to the wurtzite (w) phase during the annealing step will be presented. Subsequent effects on the GaN epilayer growth due to the microstructural evolution of these underlying layers along with the evolution of defects will also be discussed.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"26 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83152291","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Mapping of Bulk Diffusion Length and Effective Back Surface Recombination Velocity in Silicon Solar Cells 硅太阳能电池体扩散长度和有效后表面复合速度的映射
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/icee44586.2018.8937904
R. Jain, S. Behera, K. Sreejith, A. Kottantharayil, P. Basu, A. Sharma
{"title":"Mapping of Bulk Diffusion Length and Effective Back Surface Recombination Velocity in Silicon Solar Cells","authors":"R. Jain, S. Behera, K. Sreejith, A. Kottantharayil, P. Basu, A. Sharma","doi":"10.1109/icee44586.2018.8937904","DOIUrl":"https://doi.org/10.1109/icee44586.2018.8937904","url":null,"abstract":"Mapping of diffusion length (L) in the bulk region and effective back surface recombination velocity (SRV) in AI-BSF and PERC Si solar cells has been carried out by utilizing the spectral response (SR) at desired wavelengths. Light beam induced current (LBIC) technique was used to generate the maps of SR and reflectivity (R) on cell area (6” x6”). MATLAB tool was used to convert the spatial maps of SR and R into L and SRV. We found that (i) the distribution of L in multi-crystalline cells varied from grain to grain in wide range (150-600 $mu$m) while in mono-crystalline cells, it varied in rather narrow range (450-600$mu$m); (ii) the values of SRV for PERC cells (120-250 cm/sec for mono-crystalline and 100-250 cm/sec for multi-crystalline) and AI-BSF cells (320-400 cm/sec for mono-crystalline and 250-350 cm/sec for multi-crystalline) differ by considerable magnitude due to passivation quality at back side. Three multi-crystalline AI-BSF Si solar cells of cell efficiencies 17.6%, 17.9% and 18.1% were investigated with the proposed methodology and demonstrated that the efficiency deficit is primarily due to defects present in bulk material and poor back surface passivation.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"45 1","pages":"1-5"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83844097","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
High-performance ultraviolet detector employing out-of-plane rGO/MoS2 PN heterostructure 采用面外rGO/MoS2 PN异质结构的高性能紫外探测器
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/icee44586.2018.8937993
Rahul Kumar, Neeraj Goel, R. Raliya, P. Biswas, Mahesh Kumar
{"title":"High-performance ultraviolet detector employing out-of-plane rGO/MoS2 PN heterostructure","authors":"Rahul Kumar, Neeraj Goel, R. Raliya, P. Biswas, Mahesh Kumar","doi":"10.1109/icee44586.2018.8937993","DOIUrl":"https://doi.org/10.1109/icee44586.2018.8937993","url":null,"abstract":"We demonstrated an ultraviolet detector employing an in-plane transport channel of n-type MoS2 with out-of-plane p-type rGO, which acts as a sensitizer for underlying n-type MoS2 photodetector. A developed vertical built-in field from vertical p-n nano-heterojunction separates the photo-excited carriers at the rGO/MoS2 interface. Therefore, the rGO/MoS2 device showed a notably improved photo-responsivity of $sim$ 6.92 A)/W and an excellent detectivity of 1.26 $times$ 1012 Jones under the irradiation of ultraviolet light. Moreover, the device exhibited an excellent reproducibility and stability in ambient environment even after four months.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"98 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83607944","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Simple Charge and Capacitance Compact Model for Asymmetric III-V DGFETs Using CCDA 基于CCDA的非对称III-V dgfet的简单电荷电容紧凑模型
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/ICEE44586.2018.8937952
Mohit D. Ganeriwala, G. M. Sarath Chandran, N. Mohapatra
{"title":"A Simple Charge and Capacitance Compact Model for Asymmetric III-V DGFETs Using CCDA","authors":"Mohit D. Ganeriwala, G. M. Sarath Chandran, N. Mohapatra","doi":"10.1109/ICEE44586.2018.8937952","DOIUrl":"https://doi.org/10.1109/ICEE44586.2018.8937952","url":null,"abstract":"In this paper, we have proposed a simple, computationally efficient and physic-based compact model for III-V double gate field effect transistors (DGFETs) including gate insulator thickness asymmetry. The semiconductor charge and the gate capacitance are calculated using the recently proposed constant charge density approximation (CCDA). The CCDA approximation eliminates the need of knowing the exact wavefunction and thus provides an analytically simple way to model the DGFET electrostatics. The CCDA approximation assumes a constant charge centroid which is a limitation of this methodology. To address this issue, a physics-based charge centroid correction is also presented in this work. The proposed model (with charge centroid correction) is mathematically simple, scalable to any (a) (b) number of sub-bands and accurate for a wide range of gate voltages.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"16 1","pages":"1-6"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73239638","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of Antisolvent Method on the Performance of HOIP based Memristive Devices 抗溶剂法对基于HOIP的记忆器件性能的影响
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/icee44586.2018.8937971
H. J. Gogoi, Ankur Solanki, A. T. Mallajosyula
{"title":"Effect of Antisolvent Method on the Performance of HOIP based Memristive Devices","authors":"H. J. Gogoi, Ankur Solanki, A. T. Mallajosyula","doi":"10.1109/icee44586.2018.8937971","DOIUrl":"https://doi.org/10.1109/icee44586.2018.8937971","url":null,"abstract":"This paper presents a hybrid organic inorganic perovskite based memristive device having a structure that is commonly used for solar cells. Toluene is used as antisolvent during perovskite layer coating and its effect on the memristive device performance is studied in this report. It has been found that the antisolvent improves the morphology of the perovskite film. With this method, we obtained non-reversible resistive switching in the device with an on/off ratio of 104. This device also shows a reversible resistance switching with a set voltage of 0.5 V and a reset voltage of -0.9 V, measured at a sweep rate of 1 mV/s. The fabricated memory device shows promising performance and could be used as a non-volatile memory device for low power consuming applications.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"27 1","pages":"1-5"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81536072","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Skyrmionic implementation of Spike Time Dependent Plasticity (STDP) enabled Spiking Neural Network (SNN) under supervised learning scheme 在监督学习方案下,Skyrmionic实现了峰值时间依赖可塑性(STDP)的峰值神经网络(SNN)
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/icee44586.2018.8937850
U. Sahu, Kushaagra Goyal, Utkarsh Saxena, T. Chavan, U. Ganguly, D. Bhowmik
{"title":"Skyrmionic implementation of Spike Time Dependent Plasticity (STDP) enabled Spiking Neural Network (SNN) under supervised learning scheme","authors":"U. Sahu, Kushaagra Goyal, Utkarsh Saxena, T. Chavan, U. Ganguly, D. Bhowmik","doi":"10.1109/icee44586.2018.8937850","DOIUrl":"https://doi.org/10.1109/icee44586.2018.8937850","url":null,"abstract":"Hardware implementation of Artificial Neural Network (ANN) algorithms, which are being currently used widely by the data sciences community, provides advantages of memory-computing intertwining, high speed and low energy dissipation which software implementation of the same does not have. In this paper, we simulate a spintronic hardware implementation of a third generation neural network - Spike Time Dependent Plasticity (STDP) learning enabled Spiking Neural Network (SNN), which is closer to functioning of the brain than most other ANN-s. Spin orbit torque driven skyrmionic device, driven by a transistor based circuit to enable STDP, is used as a synapse here. We use a combination of micromagnetic simulations, transistor circuit simulations and implementation of SNN algorithm in a numerical package to simulate our skyrmionic SNN. We train the skyrmionic SNN on different datasets under a supervised learning scheme and calculate the energy dissipated in updating the weights of the synapses in order to train the network.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"80 1","pages":"1-6"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78393277","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Impact of Linear Intergranular Variation in Remnant Polarization on Negative Capacitance Field Effect Transistor 残余极化线性晶间变化对负电容场效应晶体管的影响
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/icee44586.2018.8937999
K. Qureshi, G. Pahwa, Y. Chauhan
{"title":"Impact of Linear Intergranular Variation in Remnant Polarization on Negative Capacitance Field Effect Transistor","authors":"K. Qureshi, G. Pahwa, Y. Chauhan","doi":"10.1109/icee44586.2018.8937999","DOIUrl":"https://doi.org/10.1109/icee44586.2018.8937999","url":null,"abstract":"We present an explicable study of the impact of variability in the remnant polarization (Pr) of the polycrystalline ferroelectric layer of a double gate (DG) NCFET. We analyze the impact of intergranular linear variance in Pr considering (i) source end as reference point and (ii) drain end as reference point with the percentage value advancing to the other end. The study evaluates the device performance at various ferroelectric thicknesses for both long as well as short gate lengths. The electrical characteristics exhibit different behaviour for low and high values of applied drain bias. While for low drain voltage, intuitive results are obtained, high drain voltage characteristics follow a distinct trend of subthreshold swing (SS) decreasing from its initially deteriorated value, as the magnitude of Pr variance decreases from source to drain, whereas the tendency is reversed moving from drain to source. Based on the results, we further conclude that in order to prevent the hysteric effects, the granular variation between the first and the last grain should not exceed 25% for long channel and 20% for short channel devices.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"61 1","pages":"1-5"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73893084","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The role of Na+, Zn2+ cations on the mechanical, thermal and moisture permeation behaviors of poly(vinyl butyral) based ionomeric films Na+、Zn2+阳离子对聚乙烯醇基离子膜力学、热、湿渗透性能的影响
2018 4th IEEE International Conference on Emerging Electronics (ICEE) Pub Date : 2018-12-01 DOI: 10.1109/icee44586.2018.8937908
S. Saravanan, Akshay Km, S. Kn, Praveen C Ramamurthy
{"title":"The role of Na+, Zn2+ cations on the mechanical, thermal and moisture permeation behaviors of poly(vinyl butyral) based ionomeric films","authors":"S. Saravanan, Akshay Km, S. Kn, Praveen C Ramamurthy","doi":"10.1109/icee44586.2018.8937908","DOIUrl":"https://doi.org/10.1109/icee44586.2018.8937908","url":null,"abstract":"In the present study, the inclusion of ionic moieties in the poly(vinyl butyral) matrix was accomplished by co-polymerizing butyraldehyde with poly(vinyl alcohol) and carboxy benzaldehyde in aqueous acidic medium. FT-IR and NMR spectroscopy results confirms the formation of acetal and butyral linkage in the polymer. Mechanical studies (both static and dynamic) of these ionomeric films show flexibility with ionic linkages up to 15 mol % acid neutralized with sodium and zinc ions. Zinc ionomers exhibit enhanced mechanical properties compared to sodium neutralized samples, because of its ionic size and ion-pair association within the multiplets. The moisture permeability studies accessed through calcium degradation test show the films with 15 mol % exhibit enhanced impermeability than other sodium ion neutralized films. The same trend was also observed for organic solar cells that are encapsulated with these films after exposure to external environment for 400 h. The water interaction with ionomer films was also evaluated at various temperatures and the results were presented based on the ionpair clustering and the steric hindrances in due of phenyl ring attachment to the base PVB matrix.","PeriodicalId":6590,"journal":{"name":"2018 4th IEEE International Conference on Emerging Electronics (ICEE)","volume":"114 1","pages":"1-6"},"PeriodicalIF":0.0,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79216020","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信