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Manufacturing of Carbon Nanotube-Polystyrene Filament for 3D Printing: Nanoparticle Dispersion and Electromagnetic Properties 用于3D打印的碳纳米管-聚苯乙烯长丝的制造:纳米颗粒的分散和电磁性能
Nanomanufacturing and Metrology Pub Date : 2022-12-15 DOI: 10.3390/nanomanufacturing2040017
K. I. Baskakova, A. Okotrub, L. G. Bulusheva, O. Sedelnikova
{"title":"Manufacturing of Carbon Nanotube-Polystyrene Filament for 3D Printing: Nanoparticle Dispersion and Electromagnetic Properties","authors":"K. I. Baskakova, A. Okotrub, L. G. Bulusheva, O. Sedelnikova","doi":"10.3390/nanomanufacturing2040017","DOIUrl":"https://doi.org/10.3390/nanomanufacturing2040017","url":null,"abstract":"3D printing is a promising technology for creating polymer objects of a given architecture with specified functional properties. In fact, the choice of filaments for 3D printing is quite limited. Here, we report a process for producing polystyrene filaments with 0.0025–2 wt.% single-walled carbon nanotubes (SWCNTs) by extruding crushed polystyrene composites. The resulting filaments are characterized by a high uniformity of filler distribution and the absence of air pores. Comparison of microscopy data and electromagnetic properties of base composites and composite materials printed from filaments showed that extrusion and printing improve SWCNT dispersion. The proposed method can be used to create filaments for 3D printing of objects from various base polymers containing functional fillers up to the electrical percolation threshold and above.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"30 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2022-12-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84157767","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Industrial Manufacturing Applications of Zinc Oxide Nanomaterials: A Comprehensive Study 氧化锌纳米材料在工业制造中的应用研究
Nanomanufacturing and Metrology Pub Date : 2022-12-05 DOI: 10.3390/nanomanufacturing2040016
Md Abdus Subhan, Newton Neogi, K. Choudhury
{"title":"Industrial Manufacturing Applications of Zinc Oxide Nanomaterials: A Comprehensive Study","authors":"Md Abdus Subhan, Newton Neogi, K. Choudhury","doi":"10.3390/nanomanufacturing2040016","DOIUrl":"https://doi.org/10.3390/nanomanufacturing2040016","url":null,"abstract":"Nanomaterials (NMs) that are created with zinc oxide are very valuable for a wide variety of applications. There is a present interest in ZnO nanoparticles in a wide range of industries. This interest may be attributed to the fact that ZnO NPs have many important features. It will be necessary for ZnO NPs to possess certain qualities in order for them to rapidly find uses in industry and for these applications to have an effect on the expansion of the economy. A large surface area, a large bandgap, photocatalytic property, biosensing, bioimaging, and other qualities are included in this list. In this article, the extraordinary characteristics of ZnO NPs, as well as their novel applications in industrial settings and the challenges that come along with their utilization, will be discussed.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"42 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2022-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90053193","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 13
Correction: Comparison of EUV Photomask Metrology Between CD-AFM and TEM 校正:CD-AFM与TEM的EUV光掩模计量比较
Nanomanufacturing and Metrology Pub Date : 2022-12-01 DOI: 10.1007/s41871-022-00165-3
G. Dai, K. Hahm, Lipfert Sebastian, M. Heidelmann
{"title":"Correction: Comparison of EUV Photomask Metrology Between CD-AFM and TEM","authors":"G. Dai, K. Hahm, Lipfert Sebastian, M. Heidelmann","doi":"10.1007/s41871-022-00165-3","DOIUrl":"https://doi.org/10.1007/s41871-022-00165-3","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"4 1","pages":"440"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80071697","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Correction: Ghost Imaging with Deep Learning for Position Mapping of Weakly Scattered Light Source 校正:基于深度学习的幽灵成像用于弱散射光源的位置映射
Nanomanufacturing and Metrology Pub Date : 2022-12-01 DOI: 10.1007/s41871-022-00160-8
Y. Mizutani, S. Kataoka, T. Uenohara, Y. Takaya
{"title":"Correction: Ghost Imaging with Deep Learning for Position Mapping of Weakly Scattered Light Source","authors":"Y. Mizutani, S. Kataoka, T. Uenohara, Y. Takaya","doi":"10.1007/s41871-022-00160-8","DOIUrl":"https://doi.org/10.1007/s41871-022-00160-8","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"37 1","pages":"435"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90688208","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Correction: A Proposal of Hyperbolic Fitting Method by Applying the Properties of Functions for Plateau Surface Analysis in ISO 13565–3 修正:ISO 13565-3中应用函数性质进行高原表面分析的双曲拟合方法的建议
Nanomanufacturing and Metrology Pub Date : 2022-12-01 DOI: 10.1007/s41871-022-00167-1
R. Sakakibara, I. Yoshida, Yuki Kondo, M. Numada, Kenichi Yamashita
{"title":"Correction: A Proposal of Hyperbolic Fitting Method by Applying the Properties of Functions for Plateau Surface Analysis in ISO 13565–3","authors":"R. Sakakibara, I. Yoshida, Yuki Kondo, M. Numada, Kenichi Yamashita","doi":"10.1007/s41871-022-00167-1","DOIUrl":"https://doi.org/10.1007/s41871-022-00167-1","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"57 1","pages":"442"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73719454","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Correction: Additive Manufacturing of Metal Micro-ring and Tube by Laser-Assisted Electrophoretic Deposition with Laguerre–Gaussian Beam 修正:拉盖尔-高斯光束激光辅助电泳沉积金属微环和微管的增材制造
Nanomanufacturing and Metrology Pub Date : 2022-12-01 DOI: 10.1007/s41871-022-00163-5
K. Nakazawa, S. Ozawa, F. Iwata
{"title":"Correction: Additive Manufacturing of Metal Micro-ring and Tube by Laser-Assisted Electrophoretic Deposition with Laguerre–Gaussian Beam","authors":"K. Nakazawa, S. Ozawa, F. Iwata","doi":"10.1007/s41871-022-00163-5","DOIUrl":"https://doi.org/10.1007/s41871-022-00163-5","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"172 1","pages":"438"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73160472","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Correction: Closed-Loop Control of an XYZ Micro-Stage and Designing of Mechanical Structure for Reduction in Motion Errors 修正:XYZ微工作台的闭环控制及减少运动误差的机械结构设计
Nanomanufacturing and Metrology Pub Date : 2022-12-01 DOI: 10.1007/s41871-022-00164-4
H. Matsukuma, K. Adachi, Takuma Sugawara, Y. Shimizu, Wei Gao, Eiji Niwa, Yoshihiro Sasaki
{"title":"Correction: Closed-Loop Control of an XYZ Micro-Stage and Designing of Mechanical Structure for Reduction in Motion Errors","authors":"H. Matsukuma, K. Adachi, Takuma Sugawara, Y. Shimizu, Wei Gao, Eiji Niwa, Yoshihiro Sasaki","doi":"10.1007/s41871-022-00164-4","DOIUrl":"https://doi.org/10.1007/s41871-022-00164-4","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"38 2","pages":"439"},"PeriodicalIF":0.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72407007","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Manufacturing Functional Polymer Surfaces by Direct Laser Interference Patterning (DLIP): A Polymer Science View 用直接激光干涉图样(DLIP)制造功能性聚合物表面:高分子科学的观点
Nanomanufacturing and Metrology Pub Date : 2022-11-29 DOI: 10.3390/nanomanufacturing2040015
C. Barbero, D. Acevedo
{"title":"Manufacturing Functional Polymer Surfaces by Direct Laser Interference Patterning (DLIP): A Polymer Science View","authors":"C. Barbero, D. Acevedo","doi":"10.3390/nanomanufacturing2040015","DOIUrl":"https://doi.org/10.3390/nanomanufacturing2040015","url":null,"abstract":"Direct laser interference patterning (DLIP) involves the formation of patterns of light intensity using coherent laser light beams that interfere between them. Light on the ultraviolet (<350 nm) and NIR (800–2000 nm) is absorbed in chromophores present in the polymer structure or in loaded absorbing species (dyes, polymers, nanoparticles). The absorbed light induces photothermal/photochemical processes, which alter permanently the topography of the polymer surface. The success of DLIP at different wavelengths is discussed in relation to the optical/thermal properties of the polymers and previous data on laser ablation of polymers. The size of the pattern is related directly to the wavelength of the light and inversely to the sine of the angle between beams and the refractive index of the external medium. In that way, nanometric structures (<100 nm) could be produced. Since the patterning occurs in a single short pulse (<10 ns), large surfaces can be modified. Both bacterial biofilm inhibition and human cell differentiation/orientation have been achieved. Large improvements in technological devices (e.g., thin film solar cells) using DLIP structured surfaces have also been demonstrated. Prospective application of DLIP to common polymers (e.g., Teflon®) and complex polymeric systems (e.g., layer-by-layer multilayers) is discussed on the basis of reported polymer data.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"1 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2022-11-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90251073","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Correction: A Comprehensive FIB Lift-out Sample Preparation Method for Scanning Probe Microscopy 更正:一种用于扫描探针显微镜的综合FIB提取样品制备方法
Nanomanufacturing and Metrology Pub Date : 2022-11-24 DOI: 10.1007/s41871-022-00155-5
F. Ji, Y. Yao, T. Xin, J. Seidel
{"title":"Correction: A Comprehensive FIB Lift-out Sample Preparation Method for Scanning Probe Microscopy","authors":"F. Ji, Y. Yao, T. Xin, J. Seidel","doi":"10.1007/s41871-022-00155-5","DOIUrl":"https://doi.org/10.1007/s41871-022-00155-5","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"48 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2022-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90225125","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Correction: Measurement Method of Internal Residual Stress in Plastic Parts Using Terahertz Spectroscopy 修正:使用太赫兹光谱测量塑料零件内部残余应力的方法
Nanomanufacturing and Metrology Pub Date : 2022-11-23 DOI: 10.1007/s41871-022-00158-2
Y. Kajihara, R. Takahashi, I. Yoshida, S. Saito, Norihiko Sekine, Shuichi Nowatari, Shigeo Miyake
{"title":"Correction: Measurement Method of Internal Residual Stress in Plastic Parts Using Terahertz Spectroscopy","authors":"Y. Kajihara, R. Takahashi, I. Yoshida, S. Saito, Norihiko Sekine, Shuichi Nowatari, Shigeo Miyake","doi":"10.1007/s41871-022-00158-2","DOIUrl":"https://doi.org/10.1007/s41871-022-00158-2","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"48 1","pages":"433"},"PeriodicalIF":0.0,"publicationDate":"2022-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73782521","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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