Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components最新文献

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Talbot lithography as an alternative for contact lithography for submicron features 塔尔博特光刻技术可替代接触光刻技术用于亚微米特征
L. Dunbar, D. Nguyen, B. Timotijevic, U. Vogler, S. Veseli, G. Bergonzi, S. Angeloni, A. Bramati, R. Voelkel, R. Stanley
{"title":"Talbot lithography as an alternative for contact lithography for submicron features","authors":"L. Dunbar, D. Nguyen, B. Timotijevic, U. Vogler, S. Veseli, G. Bergonzi, S. Angeloni, A. Bramati, R. Voelkel, R. Stanley","doi":"10.1117/12.2036896","DOIUrl":"https://doi.org/10.1117/12.2036896","url":null,"abstract":"In this paper we show that using optical photolithography it’s possible to obtain submicron features for periodic structures using the Talbot effect. To use the Talbot effect without the need of an absolute distance measurement between the mask and the wafer we integrate over several exposures for varying wafer mask distances. Here we discuss the salient features of ‘integrated Talbot lithography’. Particularly, we show that to obtain good contrasts an excellent control of the illumination light is essential; for this we use the MO Exposure Optics (MOEO) developed by SUSS MicroOptics (SMO). Finally we show that 1μm and 0.55μm diameter holes can be made using this technique.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"84 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124848692","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
Wafer-level radiometric performance testing of uncooled microbolometer arrays 非冷却微辐射热计阵列的片级辐射性能测试
D. Dufour, P. Topart, B. Tremblay, C. Julien, Louis Martin, C. Vachon
{"title":"Wafer-level radiometric performance testing of uncooled microbolometer arrays","authors":"D. Dufour, P. Topart, B. Tremblay, C. Julien, Louis Martin, C. Vachon","doi":"10.1117/12.2040201","DOIUrl":"https://doi.org/10.1117/12.2040201","url":null,"abstract":"A turn-key semi-automated test system was constructed to perform on-wafer testing of microbolometer arrays. The system allows for testing of several performance characteristics of ROIC-fabricated microbolometer arrays including NETD, SiTF, ROIC functionality, noise and matrix operability, both before and after microbolometer fabrication. The system accepts wafers up to 8 inches in diameter and performs automated wafer die mapping using a microscope camera. Once wafer mapping is completed, a custom-designed quick insertion 8-12 μm AR-coated Germanium viewport is placed and the chamber is pumped down to below 10-5 Torr, allowing for the evaluation of package-level focal plane array (FPA) performance. The probe card is electrically connected to an INO IRXCAM camera core, a versatile system that can be adapted to many types of ROICs using custom-built interface printed circuit boards (PCBs). We currently have the capability for testing 384x288, 35 μm pixel size and 160x120, 52 μm pixel size FPAs. For accurate NETD measurements, the system is designed to provide an F/1 view of two rail-mounted blackbodies seen through the Germanium window by the die under test. A master control computer automates the alignment of the probe card to the dies, the positioning of the blackbodies, FPA image frame acquisition using IRXCAM, as well as data analysis and storage. Radiometric measurement precision has been validated by packaging dies measured by the automated probing system and re-measuring the SiTF and Noise using INO’s pre-existing benchtop system.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"262 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126144015","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Measurements of thermal conductivity of La0.95Sr0.05CoO3 nanofibers using MEMS devices 利用MEMS器件测量La0.95Sr0.05CoO3纳米纤维的热导率
Weihe Xu, H. Hadim, Y. Chu, Yong Shi, E. Nazaretski
{"title":"Measurements of thermal conductivity of La0.95Sr0.05CoO3 nanofibers using MEMS devices","authors":"Weihe Xu, H. Hadim, Y. Chu, Yong Shi, E. Nazaretski","doi":"10.1117/12.2054464","DOIUrl":"https://doi.org/10.1117/12.2054464","url":null,"abstract":"Thermoelectric oxide nanofibers prepared by electrospinning are expected to have reduced thermal conductivity when compared to bulk samples. Measurements of nanofibers’ thermal conductivity is challenging since it involves sophisticated sample preparation methods. In this work, we present a novel method suitable for measurements of thermal conductivity in a single nanofiber. A microelectro-mechanical (MEMS) device has been designed and fabricated to perform thermal conductivity measurements on a single nanofiber. A special Si template was designed to collect and transfer individual nanofibers onto a MEMS device. Pt was deposited by Focused Ion Beam to reduce the effective length of a prepared nanofiber. A single La0.95Sr0.05CoO3 nanofiber with a diameter of 140 nm was studied and characterized using this approach. Measured thermal conductivity of a nanofiber was determined to be 0.7 W/m•K, which is 23% of the value reported for bulk La0.95Sr0.05CoO3 samples.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127235509","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Manufacturing technique of large-area optical elements with micro/nano structures on both surfaces 双表面微纳结构的大面积光学元件制造技术
Toshimitsu Takaoka, Hidetoshi Fukui, T. Yamashita, T. Matsuo, Kazuya Yamamoto, H. Owari, Hiroshi Ito
{"title":"Manufacturing technique of large-area optical elements with micro/nano structures on both surfaces","authors":"Toshimitsu Takaoka, Hidetoshi Fukui, T. Yamashita, T. Matsuo, Kazuya Yamamoto, H. Owari, Hiroshi Ito","doi":"10.1117/12.2038745","DOIUrl":"https://doi.org/10.1117/12.2038745","url":null,"abstract":"Melt transcription molding is one of novel processes suitable for manufacturing large-area thin film with microstructures. We designed the mold which enables to transfer structures on both surfaces for the melt transcription molding machine and examined about relations of temperature and pressure on the accuracy of dimension and optical strain. To keep the high accuracy of relative position between both surfaces, the mold can avoid strain caused by the thermal expansion of metal and is optimized by three-dimension unsteady heat conduction analysis. As a result, distribution of pressure mainly affects stress and distribution density, influences shrinkage and accuracy of position. The decenter between both surfaces was several micrometers. This makes it possible to mass-produce the large-area optical elements which is formed the micro and nano structures on both surfaces with extremely low birefringence at high productivity.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"50 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121923602","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Analog of electromagnetically induced transparency in coupled one-dimensional photonic crystal cavities 耦合一维光子晶体腔中电磁感应透明的模拟
F. Tian, Guangya Zhou, F. Chau, Y. Du, Jie Deng
{"title":"Analog of electromagnetically induced transparency in coupled one-dimensional photonic crystal cavities","authors":"F. Tian, Guangya Zhou, F. Chau, Y. Du, Jie Deng","doi":"10.1117/12.2039455","DOIUrl":"https://doi.org/10.1117/12.2039455","url":null,"abstract":"In this paper, the analog to electromagnetically induced transparency (EIT) in the double-coupled one-dimensional photonic crystal cavities are proposed and experimentally observed. This EIT-like effect is due to the interference of two resonance modes and the leaky propagation mode. A nanoelectromechanical systems (NEMS) comb drive is used to align the two resonant wavelengths up, which is first used in the studies of the EIT-like effect. The fabrication of the device bases on the standard semiconductor process. Finally, the evolution of the EIT-like transmission spectrum with the applied voltages is shown in the last part of this paper.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130653795","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Development and testing of an AO-structured illumination microscope ao结构照明显微镜的研制与测试
Matthew Kissel, M. Reinig, O. Azucena, Juan J. Diaz Leon, J. Kubby
{"title":"Development and testing of an AO-structured illumination microscope","authors":"Matthew Kissel, M. Reinig, O. Azucena, Juan J. Diaz Leon, J. Kubby","doi":"10.1117/12.2044092","DOIUrl":"https://doi.org/10.1117/12.2044092","url":null,"abstract":"The design of an Adaptive Optics (AO) Structured Illumination (SI) microscope is presented. Two key technologies are combined to provide effective super-resolution at significant depths in tissue. AO is used to measure and compensate for optical aberrations in both the system and the tissue by measuring the optical path differences in the wavefront. Uncorrected, these aberrations significantly reduce imaging resolution, particularly as we view deeper into tissue. SI allows us to reconstruct an image with resolution beyond the Rayleigh limit of the optics by aliasing high spatial frequencies, outside the limit of the optics, to lower frequencies within the system pass band. The aliasing is accomplished by spatially modulating the illumination at a frequency near the cutoff frequency of the system. These aliased frequencies are superimposed on the lower spatial frequencies of the object in our image. Using multiple images and an inverse algorithm, we separate the aliased and normal frequencies, restore them to their original frequency positions, and recreate the original spectrum of the object. This allows us to recreate a super-resolution image of the object. A problem arises with thick aberrating tissue. Tissue aberrations, including sphere, increase with depth into the tissue and reduce the high spatial frequency response of a system. This degrades the ability of SI to reconstruct at superresolution and limits its use to relatively shallow depths. However, adding AO to the system compensates for these aberrations allowing SI to work at maximum efficiency even deep within aberrating tissue.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"538 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124526623","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
120° silicon double mirrors for use in a micro-optical gyroscope 用于微光学陀螺仪的120°硅双反射镜
T. Niesel, A. Dietzel
{"title":"120° silicon double mirrors for use in a micro-optical gyroscope","authors":"T. Niesel, A. Dietzel","doi":"10.1117/12.2035484","DOIUrl":"https://doi.org/10.1117/12.2035484","url":null,"abstract":"A new concept for the realization of a micro optical laser gyroscope was developed. It allows minimization of the influence of alignment errors by the use of double mirrors. As a consequence, the performance of a ring resonator structure is less vulnerable to micro assembly tolerances. The idea being pursued to improve the design robustness is based on the use of double mirror elements in which the angle between the two mirrors is intrinsically defined by silicon crystalline structure. With an angle of 120° between the mirrors the resulting reflection direction from each double mirror element is robust against deviations from ideal incidence angle. Here, the optical distortions due to rotational misalignments of double mirror elements that occur either during assembly or during operation due to thermal stresses are extremely low and can be determined after production and compensated. After describing the free space ring resonator concept all major processing and manufacturing steps of the double mirror elements are discussed. For the fabrication of these mirrors silicon wafers are used which are almost in (100) orientation but are tilted by 5.3° in <011> direction and, therefore, provide an etching facet with a slope of 60° by KOH wet chemical etching. A 33% KOH solution with addition of isopropanol is used to obtain more uniform and smooth facet surfaces. Two wafers structured in such way are connected by silicon direct bonding and then cut into small mirror elements which are mounted onto the gyroscope micro platform.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132282904","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
On-chip polarizer on image sensor using advanced CMOS technology 图像传感器片上偏光片采用先进的CMOS技术
K. Sasagawa, N. Wakama, T. Noda, T. Tokuda, K. Kakiuchi, J. Ohta
{"title":"On-chip polarizer on image sensor using advanced CMOS technology","authors":"K. Sasagawa, N. Wakama, T. Noda, T. Tokuda, K. Kakiuchi, J. Ohta","doi":"10.1117/12.2040012","DOIUrl":"https://doi.org/10.1117/12.2040012","url":null,"abstract":"The structures in advanced complementary metal-oxide-semiconductor (CMOS) integrated circuit technology are in the range of deep-submicron. It allows designing and integrating nano-photonic structures for the visible to near infrared region on a chip. In this work, we designed and fabricated an image sensor with on-pixel metal wire grid polarizers by using a 65-nm standard CMOS technology. It is known that the extinction ratio of a metal wire grid polarizer is increased with decrease in the grid pitch. With the metal wire layers of the 65-nm technology, the grid pitch sufficiently smaller than the wavelengths of visible light can be realized. The extinction ratio of approximately 20 dB has been successfully achieved at a wavelength of 750 nm. In the CMOS technologies, it is usual to include multiple metal layers. This feature is also useful to increase the extinction ratio of polarizers. We designed dual layer polarizers. Each layer partially reflects incident light. Thus, the layers form a cavity and its transmission spectrum depends on the layer position. The extinction ratio of 19.2 dB at 780 nm was achieved with the grid pitch greater than the single layer polarizer. The high extinction ratio is obtained only red to near infrared region because the fine metal layers of deepsubmicron standard CMOS process is usually composed of Cu. Thus, it should be applied for measurement or observation where wide spectrum is not required such as optical rotation measurement of optically active materials or electro-optic imaging of RF/THz wave.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132211298","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Accurate and simple calibration of DLP projector systems 准确和简单的校准DLP投影仪系统
J. Wilm, O. V. Olesen, R. Larsen
{"title":"Accurate and simple calibration of DLP projector systems","authors":"J. Wilm, O. V. Olesen, R. Larsen","doi":"10.1117/12.2038687","DOIUrl":"https://doi.org/10.1117/12.2038687","url":null,"abstract":"Much work has been devoted to the calibration of optical cameras, and accurate and simple methods are now available which require only a small number of calibration targets. The problem of obtaining these parameters for light projectors has not been studied as extensively and most current methods require a camera and involve feature extraction from a known projected pattern. In this work we present a novel calibration technique for DLP Projector systems based on phase shifting profilometry projection onto a printed calibration target. In contrast to most current methods, the one presented here does not rely on an initial camera calibration, and so does not carry over the error into projector calibration. A radial interpolation scheme is used to convert features coordinates into projector space, thereby allowing for a very accurate procedure. This allows for highly accurate determination of parameters including lens distortion. Our implementation acquires printed planar calibration scenes in less than 1s. This makes our method both fast and convenient. We evaluate our method in terms of reprojection errors and structured light image reconstruction quality.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"97 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132738164","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 19
Fiber inline Michelson interferometer fabricated by CO2 laser irradiation for refractive index sensing 用CO2激光辐照制备折射率传感用光纤内联迈克尔逊干涉仪
Hongbin Wu, Lei Yuan, Longjiang Zhao, Zhitao Cao, Peng Wang
{"title":"Fiber inline Michelson interferometer fabricated by CO2 laser irradiation for refractive index sensing","authors":"Hongbin Wu, Lei Yuan, Longjiang Zhao, Zhitao Cao, Peng Wang","doi":"10.1117/12.2040114","DOIUrl":"https://doi.org/10.1117/12.2040114","url":null,"abstract":"A compact Michelson interferometer (MI) in a single-mode fiber (SMF) is successfully formed by CO2 laser irradiation to measure refractive index (RI) values. The fiber inline MI mainly consists of two parts: one is the waist region in fiber formed by CO2 laser irradiation and the other one is the fiber tip end facet with pure gold sputter coating. Based on the MI theory, the interference signal is generate between the core mode and the cladding mode excited by the core mode at the waist region. Reflective spectra at two different interference lengths of 5mm and 15mm are given and the calculated lengths based on theory are well verified. After the measurements of matching liquids with seven different refractive indices, the RI sensitivity of the MI sample is tested of -197.3±19.1nm/RIU (refractive index unit), which suggests well potential application in RI sensing.","PeriodicalId":395835,"journal":{"name":"Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components","volume":"74 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132959841","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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