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The Chemical Physics of Solid Surfaces最新文献

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Dynamics of precursors in activated dissociative chemisorption systems 活化解离化学吸附系统中前体的动力学
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/S1571-0785(03)11005-X
S. McClure, M. Reichman, D. C. Seets, P. D. Nolan, G. Sitz, C. Mullins
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引用次数: 5
H2 dissociation dynamics on metals: where do we stand? 金属上的H2解离动力学:进展如何?
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/S1571-0785(03)11002-4
G. Darling, S. Holloway
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引用次数: 3
Chapter 12 - Adsorbate-Induced Restructuring of f.c.c. {100} Surfaces 第12章-氟氯化碳{100}表面的吸附诱导重组
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-81924-6.50017-5
D. P. Woodruff
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引用次数: 2
Adsorption and Schottky Barrier Formation on Compound Semiconductor Surfaces 化合物半导体表面的吸附和肖特基势垒形成
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-42782-3.50009-1
L. Brillson, G. Margaritondo
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引用次数: 3
Chapter 10 Chemical and spectroscopic studies of ultrathin oxide films 第十章超薄氧化膜的化学和光谱学研究
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/S1571-0785(97)80013-2
S. Street, D. Goodman
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引用次数: 9
Chapter 12 Intrinsic stress of epitaxial thin films and surface layers 第十二章外延薄膜和表面层的本征应力
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/S1571-0785(97)80015-6
R. Koch
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引用次数: 10
Surface Chemistry of Dry Etching Processes 干式蚀刻工艺的表面化学
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-42782-3.50015-7
T. Mayer, M. Ameen, D. Vitkavage
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引用次数: 0
Adsorption and Reaction of Metals on Elemental Semiconductors 金属在元素半导体上的吸附与反应
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-42782-3.50011-X
L. Braicovich
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引用次数: 4
Molecular Beam Epitaxy of Silicon and Related Materials 硅及相关材料的分子束外延
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-42782-3.50013-3
R. Kubiak, E. Parker
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引用次数: 0
Chapter 8 Monolayer films of unreactive metals on semiconductors 第8章半导体上非活性金属的单层薄膜
The Chemical Physics of Solid Surfaces Pub Date : 1900-01-01 DOI: 10.1016/S1571-0785(97)80011-9
G. L. Lay
{"title":"Chapter 8 Monolayer films of unreactive metals on semiconductors","authors":"G. L. Lay","doi":"10.1016/S1571-0785(97)80011-9","DOIUrl":"https://doi.org/10.1016/S1571-0785(97)80011-9","url":null,"abstract":"","PeriodicalId":374098,"journal":{"name":"The Chemical Physics of Solid Surfaces","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129162273","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
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