Physics in Technology最新文献

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An american's view of ESPRIT 一个美国人对ESPRIT的看法
Physics in Technology Pub Date : 1987-03-01 DOI: 10.1088/0305-4624/18/2/303
J. F. Blackburn
{"title":"An american's view of ESPRIT","authors":"J. F. Blackburn","doi":"10.1088/0305-4624/18/2/303","DOIUrl":"https://doi.org/10.1088/0305-4624/18/2/303","url":null,"abstract":"ESPRIT (the European Strategic Programme for Research and Development in Information Technology) is undoubtedly the most comprehensive international research effort in this field ever undertaken in Europe. This article examines the goal, the effort involved in its achievement and the ultimate impact of the work in Europe and elsewhere from the viewpoint of a non-European.","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1987-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127737992","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
UK performance in basic solid state physics 英国在基础固态物理方面的表现
Physics in Technology Pub Date : 1987-03-01 DOI: 10.1088/0305-4624/18/2/304
P. Collins, M. Hart, D. M. Hicks
{"title":"UK performance in basic solid state physics","authors":"P. Collins, M. Hart, D. M. Hicks","doi":"10.1088/0305-4624/18/2/304","DOIUrl":"https://doi.org/10.1088/0305-4624/18/2/304","url":null,"abstract":"Concern is growing about the health of UK basic research. There is also growing interest in the scope for quantitative indicators in science policy decisions. A Royal Society study has applied quantitative techniques to evaluate national performance in basic solid state physics.","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1987-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114197989","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Medical electro-optics: measurements in the human microcirculation 医学电光学:人体微循环的测量
Physics in Technology Pub Date : 1987-03-01 DOI: 10.1088/0305-4624/18/2/305
Deric P. Jones
{"title":"Medical electro-optics: measurements in the human microcirculation","authors":"Deric P. Jones","doi":"10.1088/0305-4624/18/2/305","DOIUrl":"https://doi.org/10.1088/0305-4624/18/2/305","url":null,"abstract":"New electro-optical techniques make possible the non-invasive estimate of nutrient bloodflow in the human microcirculation.","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1987-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132348894","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 29
Wind-assisted ship propulsion 风助船舶推进
Physics in Technology Pub Date : 1987-03-01 DOI: 10.1088/0305-4624/18/2/301
B. R. Clayton
{"title":"Wind-assisted ship propulsion","authors":"B. R. Clayton","doi":"10.1088/0305-4624/18/2/301","DOIUrl":"https://doi.org/10.1088/0305-4624/18/2/301","url":null,"abstract":"The erratic fluctuations in price and supply of oil over the past decade have led to a reappraisal of wind assistance for ship propulsion as a means of saving fuel. This article reviews the devices currently considered as potentially viable and other factors that have recently been appreciated.","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1987-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114467906","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Explosions in knowledge 知识爆炸
Physics in Technology Pub Date : 1987-03-01 DOI: 10.1088/0305-4624/18/2/406
A. Abrahamsen
{"title":"Explosions in knowledge","authors":"A. Abrahamsen","doi":"10.1088/0305-4624/18/2/406","DOIUrl":"https://doi.org/10.1088/0305-4624/18/2/406","url":null,"abstract":"Report on Gas and dust explosions, The Institute of Physics, 28 October 1986, Fire Research Station, Borehamwood, Herts, UK.","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"507 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1987-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133210716","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
History of SIRA SIRA的历史
Physics in Technology Pub Date : 1986-11-01 DOI: 10.1088/0305-4624/17/6/404
T. P. Flanagan
{"title":"History of SIRA","authors":"T. P. Flanagan","doi":"10.1088/0305-4624/17/6/404","DOIUrl":"https://doi.org/10.1088/0305-4624/17/6/404","url":null,"abstract":"The Scientific Instrument Research Association was the first in Britain. Nearly seventy years of measurement and instrumentation R and D have placed the much-changed Sira at the forefront of a most important sector of UK technological industry.","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1986-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123428435","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Tribology in particular 尤其是摩擦学
Physics in Technology Pub Date : 1986-11-01 DOI: 10.1088/0305-4624/17/6/407
M. Adams, B. Briscoe
{"title":"Tribology in particular","authors":"M. Adams, B. Briscoe","doi":"10.1088/0305-4624/17/6/407","DOIUrl":"https://doi.org/10.1088/0305-4624/17/6/407","url":null,"abstract":"Report on Tribology in powder conveying and processing, IoP Tribology Group in collaboration with the I Chem E (Particle Technology Subject Group), I Mech E, RSC (Faraday Division) and the Plastics and Rubber Institute.","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1986-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114975177","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Modelling physical processes in silicon integrated circuit fabrication 硅集成电路制造中的物理过程建模
Physics in Technology Pub Date : 1986-11-01 DOI: 10.1088/0305-4624/17/6/I03
D. Godfrey
{"title":"Modelling physical processes in silicon integrated circuit fabrication","authors":"D. Godfrey","doi":"10.1088/0305-4624/17/6/I03","DOIUrl":"https://doi.org/10.1088/0305-4624/17/6/I03","url":null,"abstract":"The dimensions of silicon integrated circuits are continually being reduced, with critical features now as small as 1 mu m. Accurate modelling of the physical processes of ion implantation, diffusion and oxidation can significantly reduce the level of experimentation and are essential to silicon process development","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1986-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131231353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
MOS device modelling for silicon integrated circuits 用于硅集成电路的MOS器件建模
Physics in Technology Pub Date : 1986-11-01 DOI: 10.1088/0305-4624/17/6/I02
P. Mole
{"title":"MOS device modelling for silicon integrated circuits","authors":"P. Mole","doi":"10.1088/0305-4624/17/6/I02","DOIUrl":"https://doi.org/10.1088/0305-4624/17/6/I02","url":null,"abstract":"The integrated circuit industry relies heavily on physically based device modelling for both the design of circuits and the development of manufacturing processes. The physical background for this modelling is presented and the latest developments discussed","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1986-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132797820","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Rapid isothermal processing of silicon wafers 硅片的快速等温加工
Physics in Technology Pub Date : 1986-11-01 DOI: 10.1088/0305-4624/17/6/I01
S. S. Gill
{"title":"Rapid isothermal processing of silicon wafers","authors":"S. S. Gill","doi":"10.1088/0305-4624/17/6/I01","DOIUrl":"https://doi.org/10.1088/0305-4624/17/6/I01","url":null,"abstract":"The reduction in the size of semiconductor devices has not only increased their speed and the number that can be fitted on a chip but has also led to the need for very accurately controlled thermal processing of the semiconductor wafers. Conventional furnaces are used as standard in IC processing but now, however, alternative rapid isothermal processing technologies are gaining prominence. An introduction to isothermal processing is presented together with an overview of commercially available systems","PeriodicalId":368078,"journal":{"name":"Physics in Technology","volume":"125 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1986-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133882585","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
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