{"title":"XUV Cherenkov and diffraction radiation from femtosecond electron bunch","authors":"D. Sergeeva, A. Tishchenko, M. Strikhanov","doi":"10.1117/12.2182408","DOIUrl":"https://doi.org/10.1117/12.2182408","url":null,"abstract":"Absorption in the medium, i.e. an imaginary part of the dielectric permittivity, can lead to arising of Cherenkov radiation at high frequencies – X-Ray and XUV. In this paper X-Ray Diffraction radiation from a bunch of ultra-relativistic electrons moving near an absorbing target is investigated theoretically. In these conditions the Cherenkov radiation arises even when trajectories of the particles does not cross the target. The spatial distribution of the radiation usually represents the cone with the axis in forward direction with thickness proportional to the imaginary part of dielectric permittivity. In this paper it is shown that taking into account the refraction and reflection of the waves at the surface of the target leads to essential changes in spatial distribution of radiation. We give analytical description of the XUV Cherenkov and diffraction radiation from the bunch of charged particles. We show that the spatial distribution of radiation is not symmetrical in relation to the top face of the target.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"380 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115581971","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Optimization of high average power FEL beam for EUV lithography","authors":"A. Endo","doi":"10.1117/12.2182239","DOIUrl":"https://doi.org/10.1117/12.2182239","url":null,"abstract":"Extreme Ultraviolet Lithography (EUVL) is entering into high volume manufacturing (HVM) stage, with high average power (250W) EUV source from laser produced plasma at 13.5nm. Semiconductor industry road map indicates a scaling of the source technology more than 1kW average power by high repetition rate FEL. This paper discusses on the lowest risk approach to construct a prototype based on superconducting linac and normal conducting undulator, to demonstrate a high average power 13.5nm FEL equipped with optimized optical components and solid state lasers, to study FEL application in EUV lithography.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122910011","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"AOM optimization with ultra stable high power CO2 lasers for fast laser engraving","authors":"M. Bohrer","doi":"10.1117/12.2179040","DOIUrl":"https://doi.org/10.1117/12.2179040","url":null,"abstract":"A new ultra stable CO2 laser in carbon fibre resonator technology with an average power of more than 600W has been developed especially as basis for the use with AOMs. Stability of linear polarisation and beam pointing stability are important issues as well as appropriate shaping of the incident beam. AOMs are tested close to the laser-induced damage threshold with pulses on demand close to one megahertz. Transversal and rotational optimization of the AOMs benefits from the parallel-kinematic principle of a hexapod used for this research.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"9513 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129634240","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Generation of 1.6 ns Q-switched pulses based on Yb:YAG/Cr:YAG microchip laser","authors":"J. Šulc, H. Jelínková, K. Nejezchleb, V. Škoda","doi":"10.1117/12.2178833","DOIUrl":"https://doi.org/10.1117/12.2178833","url":null,"abstract":"The highly-stable Q-switched longitudinally diode-pumped microchip laser, emitting radiation at wavelength 1031 nm, was designed and realized. This laser was based on monolith crystal which combines in one piece an active laser part (YAG crystal doped with Yb3+ ions, 10 at.% Yb/Y, 3mm long) and saturable absorber (YAG crystal doped with Cr3+ ions, 1.36mm long). The diameter of the diffusion bonded monolith was 3 mm. The initial transmission of the Cr:YAG part was 90% @ 1031 nm. The microchip resonator consisted of dielectric mirrors directly deposited on the monolith surfaces. The pump mirror (HT for pump radiation, HR for generated radiation) was placed on the Yb:YAG part. The output coupler with reflection 55% for the generated wavelength was placed on the Cr3+-doped part. Q-switched microchip laser was tested under CW diode pumping. For longitudinal pumping of Yb:YAG part, a fibre coupled (core diameter 100 μm, NA= 0.22) laser diode, operating at wavelength 968 nm, was used. The laser threshold was 3.3W. The laser slope efficiency calculated for output mean power in respect to incident CW pumping was 17%. The wavelength of linearly polarized laser emission was fixed to 1031 nm. The generated transversal intensity beam profile was close to the fundamental Gaussian mode. The generated pulse length was equal to 1.6 ns (FWHM). This value was mostly stable and independent on investigated pumping powers in the range from the threshold up to 9.3W. The single pulse energy was linearly increasing with the pumping power. Close to the laser threshold the generated pulse energy was 45 μJ. For maximum investigated CW pumping 9.3W the pulse energy was stabilized to 74 μJ which corresponds to the Q-switched pulse peak power 46 kW. The corresponding Q-switched pulses repetition rate was 13.6 kHz. The maximum Yb:YAG/Cr:YAG microchip laser mean output power of 1W was reached without observable thermal roll-over.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"63 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129796488","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
B. Rus, P. Bakule, D. Kramer, J. Naylon, J. Thoma, J. T. Green, R. Antipenkov, M. Fibrich, J. Novák, F. Batysta, T. Mazanec, M. Drouin, K. Kasl, R. Baše, D. Peceli, L. Koubiková, P. Trojek, R. Boge, J. Lagron, Š. Vyhlídka, J. Weiss, J. Cupal, J. Hrebicek, P. Hříbek, M. Ďurák, J. Polan, M. Košelja, G. Korn, M. Horáček, J. Horáček, B. Himmel, T. Havlicek, A. Honsa, P. Korouš, M. Laub, C. Haefner, A. Bayramian, T. Spinka, C. Marshall, G. Johnson, S. Telford, J. Horner, B. Deri, T. Metzger, M. Schultze, P. Mason, K. Ertel, A. Lintern, J. Greenhalgh, C. Edwards, C. Hernandez-Gomez, J. Collier, T. Ditmire, E. Gaul, M. Martinez, C. Frederickson, D. Hammond, C. Malato, W. White, J. Houžvička
{"title":"ELI-Beamlines: development of next generation short-pulse laser systems","authors":"B. Rus, P. Bakule, D. Kramer, J. Naylon, J. Thoma, J. T. Green, R. Antipenkov, M. Fibrich, J. Novák, F. Batysta, T. Mazanec, M. Drouin, K. Kasl, R. Baše, D. Peceli, L. Koubiková, P. Trojek, R. Boge, J. Lagron, Š. Vyhlídka, J. Weiss, J. Cupal, J. Hrebicek, P. Hříbek, M. Ďurák, J. Polan, M. Košelja, G. Korn, M. Horáček, J. Horáček, B. Himmel, T. Havlicek, A. Honsa, P. Korouš, M. Laub, C. Haefner, A. Bayramian, T. Spinka, C. Marshall, G. Johnson, S. Telford, J. Horner, B. Deri, T. Metzger, M. Schultze, P. Mason, K. Ertel, A. Lintern, J. Greenhalgh, C. Edwards, C. Hernandez-Gomez, J. Collier, T. Ditmire, E. Gaul, M. Martinez, C. Frederickson, D. Hammond, C. Malato, W. White, J. Houžvička","doi":"10.1117/12.2184996","DOIUrl":"https://doi.org/10.1117/12.2184996","url":null,"abstract":"Overview of the laser systems being built for ELI-Beamlines is presented. The facility will make available high-brightness multi-TW ultrashort laser pulses at kHz repetition rate, PW 10 Hz repetition rate pulses, and kilojoule nanosecond pulses for generation of 10 PW peak power. The lasers will extensively employ the emerging technology of diode-pumped solid-state lasers (DPSSL) to pump OPCPA and Ti:sapphire broadband amplifiers. These systems will provide the user community with cutting-edge laser resources for programmatic research in generation and applications of high-intensity X-ray sources, in particle acceleration, and in dense-plasma and high-field physics.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130362635","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The universal method for optimization of undulator tapering in FEL amplifiers","authors":"E. Schneidmiller, M. Yurkov","doi":"10.1117/12.2181230","DOIUrl":"https://doi.org/10.1117/12.2181230","url":null,"abstract":"Technique of undulator tapering in the post-saturation regime is used at the existing x-ray FELs for increasing the radiation power. There are also discussions on the future of high peak and average power FELs for scientific and industrial applications. Diffraction effects essentially influence on the choice of the tapering strategy. Recent studies resulted in an general law of the undulator tapering for a seeded FEL amplifier. In this paper we extend these results for the case of the Self Amplified Spontaneous Emission (SASE) FEL.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"9512 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129097267","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"High-energy gamma-ray beams from nonlinear Thomson and Compton scattering in the ultra-intense regime","authors":"C. Harvey, M. Marklund, E. Wallin","doi":"10.1117/12.2179769","DOIUrl":"https://doi.org/10.1117/12.2179769","url":null,"abstract":"We consider the Thomson and Compton scattering of high-energy electrons in an intense laser pulse. Our simulations show that energy losses due to radiation reaction cause the emitted radiation to be spread over a broader angular range than the case without these losses included. We explain this in terms of the effect of these energy losses on the particle dynamics. Finally, at ultra-high intensities, i.e. fields with a dimensionless parameter a0~200, the energy of the emission spectrum is significantly reduced by radiation reaction and also the classical and QED results begin to differ. This is found to be due to the classical theory overestimating the energy loss of the electrons. Such findings are relevant to radiation source development involving the next generation of high-intensity laser facilities.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123916017","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Analytical description of lobster eye and similar multi-foil optics","authors":"V. Tichý, R. Hudec, M. Barbera","doi":"10.1117/12.2178678","DOIUrl":"https://doi.org/10.1117/12.2178678","url":null,"abstract":"Analytical equations describing lobster eye optical parameters on dependence on its geometric parameters are presented. The paper partially gives review of main previously known results. At next, the paper gives new results discussing parameters, that were not included to previously published models but may be significant. The results are applicable for a Schmidt as well as for an Angel lobster eye and for some related multi-foil systems.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"188 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124168676","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Jan Szczepanek, M. Michalska, T. Kardaś, C. Radzewicz, Y. Stepanenko
{"title":"Different mode-locking methods in high energy all-normal dispersion Yb femtosecond all-fiber lasers","authors":"Jan Szczepanek, M. Michalska, T. Kardaś, C. Radzewicz, Y. Stepanenko","doi":"10.1117/12.2182273","DOIUrl":"https://doi.org/10.1117/12.2182273","url":null,"abstract":"Ultrafast all-fiber oscillators are currently one of the most rapidly developing laser technologies. Many advantages like: environmental stability, low sensitivity to misalignment, excellent beam quality (intrinsic single transverse mode operation), high energy and an excellent active medium efficiency make them the lasers of choice for a variety of applications. In this paper the designs of all-fiber all-normal dispersion femtosecond lasers are described. Due to large positive chirp, the pulses inside the cavity are highly stretched in time and they can achieve higher energies with the same peak power as shorter pulses. High insensitivity to mechanical perturbations or temperature drift is another highly valued property of presented configurations. Two of reported lasers are extremely stable due to the fact that their cavities are built entirely of polarization maintaining fibers and optical elements. We used highly Yb3+ ions doped fibers as an active medium pumped by a fiber coupled 976 nm laser diode. The central wavelength of our laser oscillators was 1030 nm. Three methods of passive mode-locking in all-fiber cavities were studied. In particular, the designs with Nonlinear Polarization Evolution (NPE), Nonlinear Optical Loop Mirror (NOLM) and Nonlinear Amplifying Loop Mirror (NALM) as artificial saturable absorbers were investigated. The most attention was paid to all-PM-fiber configurations. We present two self-starting, high energy, all-fiber configurations: one delivering pulses with energy of 4.3 nJ and dechirped pulse duration of 150 fs based on the NALM and another with a 6.8 nJ, 390 fs pulses in configuration with the NOLM. The influence of different artificial saturable absorber on output pulse characteristics were studied and analyzed.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"190 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116142219","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Comisso, A. Giglia, M. Nardello, E. Tessarolo, L. Calvillo, M. Sertsu, G. Granozzi, F. Gerlin, L. Brigo, P. Nicolosi
{"title":"Characterization of TiO2 thin films in the EUV and soft X-ray region","authors":"A. Comisso, A. Giglia, M. Nardello, E. Tessarolo, L. Calvillo, M. Sertsu, G. Granozzi, F. Gerlin, L. Brigo, P. Nicolosi","doi":"10.1117/12.2178142","DOIUrl":"https://doi.org/10.1117/12.2178142","url":null,"abstract":"In this work, three TiO2 thin films with thicknesses of 22.7, 48.5 and 102.9 nm were grown on Si (100) substrates by the technique of electron beam evaporation. The films were deposited at a substrate temperature of 150°C with a deposition rate of 0.3 - 0.5 A/sec. The films thicknesses were characterized by spectroscopic ellipsometry and profilometry. The surface roughness was measured by AFM obtaining RMS of less than 0.7nm. Investigations performed by XPS method have shown that stoichiometric TiO2 was obtained on all the samples with no suboxide presences. Reflectance measurements of the samples were performed in EUV and SX spectral regions from 25.5 to 454.2eV using synchrotron radiation. Analyzing the refractive index N=n+ik of TiO2 thin films, optical constants (n,k) in this energy range were both determined by fitting the Fresnel equations with least-square fitting methods.","PeriodicalId":347374,"journal":{"name":"Europe Optics + Optoelectronics","volume":"46 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126406480","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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