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Soft X-Ray Projection Lithography最新文献

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Computational Analysis of Debris Formation in SXPL Laser-Plasma Sources SXPL激光等离子体源中碎片形成的计算分析
Soft X-Ray Projection Lithography Pub Date : 1993-08-01 DOI: 10.1364/sxray.1993.tud.12
T. Trucano, D. Grady, R. Olson, A. Farnsworth
{"title":"Computational Analysis of Debris Formation in SXPL Laser-Plasma Sources","authors":"T. Trucano, D. Grady, R. Olson, A. Farnsworth","doi":"10.1364/sxray.1993.tud.12","DOIUrl":"https://doi.org/10.1364/sxray.1993.tud.12","url":null,"abstract":"Laser generated extreme ultraviolet sources applicable to soft x-ray projection lithography (SXPL) are undermined by target debris formation. This debris, in the form of vapor and condensed ejecta, can coat and damage the optical systems that direct and focus the emitted radiation for the lithographic application [1]. The purpose of this paper is to present ongoing work to develop a computational methodology for understanding and predicting the debris formation process in these laser sources.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124154296","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Point Diffraction Interferometry at Soft X-ray Wavelengths 软x射线波长的点衍射干涉测量
Soft X-Ray Projection Lithography Pub Date : 1993-07-01 DOI: 10.1364/sxray.1993.tuc.1
G. Sommargren, R. Hostetler
{"title":"Point Diffraction Interferometry at Soft X-ray Wavelengths","authors":"G. Sommargren, R. Hostetler","doi":"10.1364/sxray.1993.tuc.1","DOIUrl":"https://doi.org/10.1364/sxray.1993.tuc.1","url":null,"abstract":"To achieve the image performance necessary for soft x-ray projection lithography, interferometric testing at the design wavelength is required to accurately characterize the wavefront of the imaging system. The wavefront depends not only on the surface figure of the individual optics and on their relative alignment, but also on aperture dependent phase shifts induced by the resonant multilayer coatings on the optical surfaces. This paper describes the design and lithographic fabrication of an array of point diffraction interferometers on a Si3N4 membrane that has been over-coated with a spatially graded absorbing film to provide fringe contrast control. Experimental results using a visible light analogue (larger pinholes and different absorption gradient) will be presented.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"50 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125278830","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
X-ray characterization of a three-element condenser system for soft x-ray projection lithography 软x射线投影光刻用三元聚光镜系统的x射线特性
Soft X-Ray Projection Lithography Pub Date : 1993-06-16 DOI: 10.1364/sxray.1993.mb.3
D. Gaines, G. Sommargren, S. Vernon, R. E. English
{"title":"X-ray characterization of a three-element condenser system for soft x-ray projection lithography","authors":"D. Gaines, G. Sommargren, S. Vernon, R. E. English","doi":"10.1364/sxray.1993.mb.3","DOIUrl":"https://doi.org/10.1364/sxray.1993.mb.3","url":null,"abstract":"A three-element condenser system has been designed and fabricated for use in a soft x-ray projection lithography facility at Lawrence Livermore National Laboratory. The design uses Kohler illumination to transport x-rays generated by a laser-produced plasma onto an x-ray reflection mask. The condenser optics are coated with molybdenum silicon multilayers to provide peak reflectance at an operating wavelength of approximately 13.0 nm.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131296520","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Substrate Recovery of Mo-Si Multilayer Coated Optics Mo-Si多层镀膜光学的衬底回收
Soft X-Ray Projection Lithography Pub Date : 1993-06-01 DOI: 10.1364/sxray.1993.mc.2
D. Stearns, S. Baker
{"title":"Substrate Recovery of Mo-Si Multilayer Coated Optics","authors":"D. Stearns, S. Baker","doi":"10.1364/sxray.1993.mc.2","DOIUrl":"https://doi.org/10.1364/sxray.1993.mc.2","url":null,"abstract":"Multilayer coated optics in a soft x-ray projection lithography system are subject to environmental effects that can degrade their performance such as corrosion, contamination and excessive radiation exposure. When the damage is limited to the multilayer coatings it is cost effective to recycle the optics by removing the damaged coatings and recoating the substrates. The main challenge is to develop a substrate recovery process that completely removes the coating without compromising the figure and surface finish requirements of the original substrate. Typical requirements for the precision imaging optics are a surface finish of less than 1 Å root-mean-square (RMS) and peak-to-valley figure error of less than 10 Å.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116738338","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Tarnishing and Restoration of Mo/Si Multilayer X-ray Mirrors Mo/Si多层x射线镜的抛光与修复
Soft X-Ray Projection Lithography Pub Date : 1900-01-01 DOI: 10.1364/sxray.1993.wb.3
J. Underwood, E. Gullikson, K. Nguyen
{"title":"Tarnishing and Restoration of Mo/Si Multilayer X-ray Mirrors","authors":"J. Underwood, E. Gullikson, K. Nguyen","doi":"10.1364/sxray.1993.wb.3","DOIUrl":"https://doi.org/10.1364/sxray.1993.wb.3","url":null,"abstract":"Multilayer x-ray mirrors of molybdenum and silicon operating at normal incidence at wavelengths just longward of the Si LII,III absorption edges, are a key component in the development of soft x-ray projection lithography. In this application high reflectivity is essential. Because the achievement and maintenance of high reflectivity surfaces is vital to the success of soft x-ray projection lithography, it is important to know if Mo/Si multilayers show \"aging\" effects, e.g. decreasing reflectivity with time. Since, in a series of measurements of such mirrors at x-ray wavelengths, we had found evidence of such decay, a series of systematic experiments was carried out.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"80 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121168116","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A New Surface Imaging Resist Technology for Soft-X-Ray Projection Lithography 软x射线投影光刻的表面成像抗蚀剂新技术
Soft X-Ray Projection Lithography Pub Date : 1900-01-01 DOI: 10.1364/sxray.1993.tua.5
A. MacDowell, O. Wood, J. Calvert, T. Koloski
{"title":"A New Surface Imaging Resist Technology for Soft-X-Ray Projection Lithography","authors":"A. MacDowell, O. Wood, J. Calvert, T. Koloski","doi":"10.1364/sxray.1993.tua.5","DOIUrl":"https://doi.org/10.1364/sxray.1993.tua.5","url":null,"abstract":"Sub-quarter-micron features have been produced in a number of organic\u0000 resists using soft-x-ray projection lithography (SXPL) at 14 nm,\u0000 including a demonstration of 0.05 um lines and spaces in poly\u0000 (methylmethacrylate) (PMMA).1 Unfortunately, the opacity of\u0000 conventional resists in the soft-x-ray region requires that the resist\u0000 thickness be reduced to less than 200 nm;2 in practice, 70\u0000 nm thick layers are often used. Such thin layers lead to several\u0000 problems. First, spincoating pinhole-free layers becomes increasingly\u0000 difficult at thicknesses below 100 nm. Second, the etch resistance of\u0000 thin organic layers may not be sufficient for subsequent pattern\u0000 transfer operations. Third, they are too thin to function as\u0000 planarizing layers over preexisting substrate topography. One solution\u0000 has been to use a trilevel resist composed of a thin top PMMA imaging\u0000 layer, an intermediate layer of germanium for etch resistance, and a\u0000 thick hardbaked photoresist for planarization. While the trilevel\u0000 approach has been successfully demonstrated for producing high\u0000 resolution features with SXPL at 14 nm,3 the complexity of\u0000 this process makes it problematic for rapid acceptance in a production\u0000 environment. An alternative approach, which circumvents the resist\u0000 opacity issue, involves the use of so-called surfaceimaging\u0000 resists.4 In a surface imaging resist, radiation-induced\u0000 changes in a thin imaging layer lead to conversion of the exposed\u0000 region to an etch resistant material.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"80 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121776417","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Simulation of Soft-X-Ray Images from a 1:1 Ring-Field Optic 1:1环场光学软x射线图像的模拟
Soft X-Ray Projection Lithography Pub Date : 1900-01-01 DOI: 10.1364/sxray.1993.ma.2
O. Wood, R. D'Souza, M. Himel, J. Bjorkholm, K. Early, L. Fetter, R. Freeman, L. Szeto, D. Tennant, D. Taylor, T. Jewell, D. Lee, A. Neureuther, D. Newmark, A. MacDowell, L. Eichner, W. Waskiewicz, D. White, D. Windt, D. M. Williamson, F. Zernike
{"title":"Simulation of Soft-X-Ray Images from a 1:1 Ring-Field Optic","authors":"O. Wood, R. D'Souza, M. Himel, J. Bjorkholm, K. Early, L. Fetter, R. Freeman, L. Szeto, D. Tennant, D. Taylor, T. Jewell, D. Lee, A. Neureuther, D. Newmark, A. MacDowell, L. Eichner, W. Waskiewicz, D. White, D. Windt, D. M. Williamson, F. Zernike","doi":"10.1364/sxray.1993.ma.2","DOIUrl":"https://doi.org/10.1364/sxray.1993.ma.2","url":null,"abstract":"Using a recently extended version of the two-dimensional aerial image simulator, SPLAT 1 , we show that annular illumination of a soft-x-ray 1:1 ring-field camera at 13 nm increases image contrast for features with spatial frequencies immediately above the coherent cutoff and that surface figure errors are responsible for the asymmetric, spatially-shifted images that have been observed experimentally.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132826951","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Soft X-ray Projection Imaging using 32:1 Schwarzschild Optics 使用32:1史瓦西光学的软x射线投影成像
Soft X-Ray Projection Lithography Pub Date : 1900-01-01 DOI: 10.1364/sxray.1993.tua.4
H. Nagata, M. Ohtani, K. Murakami, T. Oshino, Y. Maejima, Toshihiko Tanaka, Takeo Watanabe, Y. Yamashita, Nobufusi Atoda
{"title":"Soft X-ray Projection Imaging using 32:1 Schwarzschild Optics","authors":"H. Nagata, M. Ohtani, K. Murakami, T. Oshino, Y. Maejima, Toshihiko Tanaka, Takeo Watanabe, Y. Yamashita, Nobufusi Atoda","doi":"10.1364/sxray.1993.tua.4","DOIUrl":"https://doi.org/10.1364/sxray.1993.tua.4","url":null,"abstract":"X-ray projection lithography is expected as a candidate for VLSI production in the near future. To get a resolution of 0.1μm and wide exposure area simultaneously, reduction systems with aspherical mirrors are required1,2), but the machining precision required to fabricate aspherical surfaces has not been achieved. Thus reduction systems with spherical airrors3-5) are preferable in current study of mounting and alignment of optical elements and resist process.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126047014","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Use of Zone Plate Arrays in Projection X-Ray Lithography 带板阵列在投影x射线光刻中的应用
Soft X-Ray Projection Lithography Pub Date : 1900-01-01 DOI: 10.1364/sxray.1993.wc.2
M. Feldman
{"title":"The Use of Zone Plate Arrays in Projection X-Ray Lithography","authors":"M. Feldman","doi":"10.1364/sxray.1993.wc.2","DOIUrl":"https://doi.org/10.1364/sxray.1993.wc.2","url":null,"abstract":"Projection X-ray lithography has demonstrated the ability to print very fine features, (1,2) but the technical requirements of useful versions of the proposed systems are beyond the present state of the art. However, X-ray projection lithography using zone plates as the imaging elements is well within the state of art (3,4). We discuss two systems: a simple 1:1 imaging system utilizing existing X-ray masks, and a more mechanically complex reduction system.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"77 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114152773","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Soft-x-ray projection lithography using two arrays of phase zone plates 使用两个相带板阵列的软x射线投影光刻
Soft X-Ray Projection Lithography Pub Date : 1900-01-01 DOI: 10.1364/sxray.1993.wc.1
S. Hector, Henry I. Smith
{"title":"Soft-x-ray projection lithography using two arrays of phase zone plates","authors":"S. Hector, Henry I. Smith","doi":"10.1364/sxray.1993.wc.1","DOIUrl":"https://doi.org/10.1364/sxray.1993.wc.1","url":null,"abstract":"At feature sizes below 70nm, the mask-to-sample gap in proximity x-ray\u0000 lithography must be less than 5μm, which, although this is not\u0000 a problem in research, it may be undesirable in manufacturing. Thus,\u0000 for sub-70nm features, one is persuaded to consider the feasibility of\u0000 x-ray projection systems.","PeriodicalId":342175,"journal":{"name":"Soft X-Ray Projection Lithography","volume":"272 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116068432","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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