UV and Higher Energy Photonics: From Materials to Applications 2019最新文献

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-30 DOI: 10.1117/12.2552594

引用次数: 0

UV plasmonics for biosensing applications (Conference Presentation) 紫外等离子体用于生物传感(会议报告)

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-09 DOI: 10.1117/12.2529840

Yunshan Wang

引用次数: 0

Photo-ablation lithographic technique at 172 nm based upon flat excimer lamps (Conference Presentation) 基于平面准分子灯的172nm光消融光刻技术(会议报告)

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-09 DOI: 10.1117/12.2529538

A. Mironov, D. Sievers, Jinhong Kim, Sung-Jin Park, J. Eden

{"title":"Photo-ablation lithographic technique at 172 nm based upon flat excimer lamps (Conference Presentation)","authors":"A. Mironov, D. Sievers, Jinhong Kim, Sung-Jin Park, J. Eden","doi":"10.1117/12.2529538","DOIUrl":"https://doi.org/10.1117/12.2529538","url":null,"abstract":"Photolithographic techniques capable of producing sub-micron scale features typically involve laser or electron beam sources and chemical development of an exposed photoresist. We report here a novel, low cost photolithographic process utilizing flat, efficient lamps emitting at 172 nm. Recently developed 10 cm x 10 cm lamps, for example, produce more than 25 W of average power at 172 nm which enables the precise and fast patterning of most polymers, including those normally employed as e-beam resists and photoresists. Recent experiments demonstrate that PMMA films less than 100 nm in thickness are patterned in less than 20 s through a contact mask with high contrast resolution of 500 nm features. The ultimate resolution limit is expected to be ≤ 300 nm for a contact method. Electroplating technique was further used to deposit 500 nm gold features on a silicon substrate. The reported process does not require a photoresist development step and is performed in nitrogen atmosphere at atmospheric pressure which make it fast and affordable for fabrication facilities that have no access to high-tech photolithography equipment. Samples as large as 76 mm (3”) in diameter may be exposed with a single lamp in one step and areas of 1 m2 and above may be processed with tiled arrays of lamps.\u0000Patterning of bulk polymers (acrylic sheets, for example) through a photomask and subsequent formation of sub-micron features has also been demonstrated.","PeriodicalId":306038,"journal":{"name":"UV and Higher Energy Photonics: From Materials to Applications 2019","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123081625","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Changes in electronic states of PEG by forming alkali metal complex (Conference Presentation) 碱金属络合物形成对聚乙二醇电子态的影响(会议报告)

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-09 DOI: 10.1117/12.2529245

Nami Ueno, Y. Morisawa, Tomonari Wakabayashi

引用次数: 0

UV surface plasmon resonance modification by graphene Pi plasmon resonance (Conference Presentation) 石墨烯π等离子体共振修饰紫外表面等离子体共振(会议报告)

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-09 DOI: 10.1117/12.2529825

Xueling Cheng, Sourangsu Banerji, Jieying Mao, S. Arezoomandan, Ting Zhang, S. Blair, B. Sensale‐Rodriguez, Yunshan Wang

引用次数: 0

Spectroscopic analysis of single wide-gap semiconductor nanoparticle (Conference Presentation) 单宽间隙半导体纳米颗粒的光谱分析(会议报告)

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-09 DOI: 10.1117/12.2527971

Y. Saito, T. Kondo, M. Hanazawa, Kenta Hirose, R. Kojima, Takeru Yumoto

{"title":"Spectroscopic analysis of single wide-gap semiconductor nanoparticle (Conference Presentation)","authors":"Y. Saito, T. Kondo, M. Hanazawa, Kenta Hirose, R. Kojima, Takeru Yumoto","doi":"10.1117/12.2527971","DOIUrl":"https://doi.org/10.1117/12.2527971","url":null,"abstract":"Wide-band gap semiconductor nanoparticles has been the focus of interest recently, due to their validity for energy creations, decomposition of harmful substances, boosting useful chemical reactions etc. In this work, we will evaluate optical characteristics of a single semiconductor nanoparticle via broadband-UV Rayleigh scattering spectroscopy and photoluminescence (PL) spectroscopy. Rayleigh scattering spectroscopy reveal the bandgap energies while PL spectroscopy provide the information on exciton generation efficiencies as well as existence of surface defects. In our microscopy setup, a broadband white light source (LDLS) was collimated and obliquely illuminated on the sample to realize dark-field illumination to distinguish the position of individual particles in the microscopic image. Scattering from a single nanocrystal was collected by an reflection-type objective lens (NA0.5) and introduced to a spectrometer and detected by an EMCCD camera. The spectrometer was designed specifically for UV-DUV broadband spectroscopy and imaging. For photoluminescence (PL) measurements, we introduce 320 nm (CW) laser for excitation. The sample is enclosed in a temperature-controlled cell ranging from room temperature to 77K. We especially focus on titanium dioxide (TiO2), a typical photocatalyst, and tangusten trioxide (WO3) which is one of the candidate for decomposition of water into oxygen and hydrogen by a visible or longer wavelength light. The band structure of nano-particles is changed when the size is smaller than several tens of nanometers, due to crystallinity and quantum size effects. PL of single zinc oxide (ZnO) nanoparticles were also measured together with the temperature effects. The spectra obtained from a single nanoparticle is different from aggregates both for exciton PL and defects PL.","PeriodicalId":306038,"journal":{"name":"UV and Higher Energy Photonics: From Materials to Applications 2019","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121623181","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Efficient TiO2 photocatalysis with UV plasmonic nanostructures (Conference Presentation) 紫外等离子体纳米结构的高效TiO2光催化(会议报告)

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-09 DOI: 10.1117/12.2528708

Mitsuhiro Honda, Kohki Hizumi, Y. Saito, Yo Ichikawa

引用次数: 0

Extreme ultraviolet laser ablation mass spectrometry: probes chemical composition at the nanoscale (Conference Presentation) 极紫外激光烧蚀质谱:纳米级化学成分探测(会议报告)

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-09 DOI: 10.1117/12.2529814

C. Menoni

引用次数: 0

Deep UV resonance Raman spectroscopy for standoff explosive detection (Conference Presentation) 用于对峙爆炸物探测的深紫外共振拉曼光谱(会议报告)

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-09 DOI: 10.1117/12.2529476

S. Bykov, Kyle T. Hufziger, R. Roppel, Dipak Rout, Ivan G. Pallares, R. Jakubek, S. Asher

引用次数: 0

Perspective on nanosystems for UV-plasmonics: from their reactivity to applications (Conference Presentation) 紫外等离子体纳米系统的前景:从反应性到应用(会议报告)

UV and Higher Energy Photonics: From Materials to Applications 2019 Pub Date : 2019-09-09 DOI: 10.1117/12.2529269

M. Losurdo

引用次数: 0