Applied Optics and Photonics China最新文献_第4页

Visual aiming and positioning system based on diffraction effect 基于衍射效应的视觉瞄准和定位系统

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.2692331

Fusheng Li, Zheng-mao Xie

引用次数: 0

Optical computing for neural ordinary differential equations 神经常微分方程的光学计算

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.3005767

Yun Zhao, Hang Chen, Min Lin, Haiou Zhang, Tao Yan, Xing Lin, Ruqi Huang, Qionghai Dai

{"title":"Optical computing for neural ordinary differential equations","authors":"Yun Zhao, Hang Chen, Min Lin, Haiou Zhang, Tao Yan, Xing Lin, Ruqi Huang, Qionghai Dai","doi":"10.1117/12.3005767","DOIUrl":"https://doi.org/10.1117/12.3005767","url":null,"abstract":"Increasing the layer number can improve the model performance of on-chip optical neural networks (ONNs). However, this results in larger integrated photonic chip areas due to the successive cascading of network hidden layers. We introduce a novel architecture for optical computing based on neural ordinary differential equations (ODEs) that employing optical ODE solvers to parameterize the continuous dynamics of hidden layers. The architecture comprises ONNs followed by a photonic integrator and an optical feedback loop, which can be configured to represent residual neural networks (ResNets) and implement the function of recurrent neural networks with effectively reduced chip area occupancy. For the interference-based optoelectronic nonlinear hidden layer, we demonstrate that the single hidden layer architecture can achieve approximately the same accuracy as the two-layer optical ResNets in image classification tasks. Furthermore, the architecture improves the model classification accuracy for the diffraction-based all-optical linear hidden layer. We also utilize the time-dependent dynamics property of architecture for trajectory prediction with high accuracy.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":" 84","pages":"129660P - 129660P-5"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138995192","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Research on collaborative positioning technology based on distributed optoelectronic system 基于分布式光电系统的协同定位技术研究

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.2692747

Qinglin Zhao, Yu Liu, Fulun Peng, Xinsheng Guo, Zhidong Liu, Yawei Wang, Ting Ji, Lei Li

{"title":"Research on collaborative positioning technology based on distributed optoelectronic system","authors":"Qinglin Zhao, Yu Liu, Fulun Peng, Xinsheng Guo, Zhidong Liu, Yawei Wang, Ting Ji, Lei Li","doi":"10.1117/12.2692747","DOIUrl":"https://doi.org/10.1117/12.2692747","url":null,"abstract":"In the distributed optoelectronic system, when the optoelectronic reconnaissance equipments cooperates to locate the target, it needs to use the azimuth and elevation information of the optoelectronic reconnaissance equipments, which usually has measurement errors. This paper proposes a distributed optoelectronic system collaborative positioning model with measurement errors, and analyzes the influence of the measurement errors of azimuth and elevation on the target positioning error, At the same time, the influence of the baseline between the optoelectronic reconnaissance equipment on the target positioning error is analyzed. the influence of the included angle between and the positioning lines on the target positioning error is analyzed. The modeling analysis shows that the smaller the measurement error of azimuth and elevation angle are, the smaller the target positioning error is; The longer the baseline is, the smaller the target positioning error is; The closer the included angle of the positioning line is to 4/π, the smaller the target positioning error is. It provides a basis for the selection of angle measuring sensors in the distributed optoelectronic system and the layout of optoelectronic reconnaissance equipment in the distributed optoelectronic system.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":"142 4","pages":"1296305 - 1296305-13"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138995390","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Analysis and implementation of multi-cooperative target location algorithm based on distance measurement 基于距离测量的多合作目标定位算法的分析与实现

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.3006994

Shixiong Luo, Chuangang Xu, Jiangpeng Song

引用次数: 0

A new method of multi-target tracking in wide-area for dealing with the threat of small celestial bodies in space 应对空间小天体威胁的广域多目标跟踪新方法

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.3007852

Fei Yu, Shuai Hou, Dan Hou, Han Zhang, Nihui Xie, Liu Yang, ChunHui Liao

引用次数: 0

Commercialization analysis of on-orbit servicing for spacecraft 航天器在轨服务商业化分析

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.3006811

Xiao Zhang, Yuqiang Liu, Zongbo He, Chunlin Tan

{"title":"Commercialization analysis of on-orbit servicing for spacecraft","authors":"Xiao Zhang, Yuqiang Liu, Zongbo He, Chunlin Tan","doi":"10.1117/12.3006811","DOIUrl":"https://doi.org/10.1117/12.3006811","url":null,"abstract":"As an emerging space industry, it is necessary to consider whether there are economic feasibility and endogenous power to achieve sustainable development. Based on the analysis of the characteristics of existing commercial on-orbit servicing (OOS) projects and OOS application scenarios, the market scale of OOS and the economic value of typical services are analyzed by using industry data and net present value method. Furthermore, value drives of OOS are analyzed and multiple OOS business models are put forward from the perspective of enterprise value creation and transmission, with their applicable situations, implementation methods and application scenarios defined. Finally, suggestions on the development of OOS industrialization are carried out from the aspect of industry ecosystem construction. The results show that on orbit services in GEO area is large-scale and economically feasible, and flexibility is the core value driving factor of OOS; the key to sustainable development of OOS industry is to incorporate the flexibility elements of maintainability and OOS capability into solutions for future space systems. The results could provide guidance and reference significance for the development of the OOS industry and for relevant markets entities to formulate domestic and foreign market development strategies.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":"64 s295","pages":"129590P - 129590P-15"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138965254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

High-efficiency and high-precision replication manufacturing of large-aperture multi-level diffractive lenses 高效率、高精度复制制造大孔径多层次衍射透镜

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.3007883

Junyan Li, Shaobo Ge, Weiguo Liu

{"title":"High-efficiency and high-precision replication manufacturing of large-aperture multi-level diffractive lenses","authors":"Junyan Li, Shaobo Ge, Weiguo Liu","doi":"10.1117/12.3007883","DOIUrl":"https://doi.org/10.1117/12.3007883","url":null,"abstract":"To address the need for efficient and large-scale fabrication of multi-level diffractive lenses (MDL) for focusing and imaging applications, this study investigates the limitations of small aperture, high cost, and low efficiency in existing MDL fabrication processes. By analyzing the advantages and characteristics of various techniques in the micro-nano structure fabrication process, we propose an MDL fabrication method that combines grayscale photolithography and nanoimprint lithography. Experimental results demonstrate that the proposed method enables precise fabrication of MDL microstructures with a 10% error margin, exhibiting excellent structure control capabilities and fabrication accuracy. Notably, compared to traditional processing methods, the fabrication time for MDLs has been reduced from 5 hours to 10 minutes per piece using the method suggested in this study. By integrating nanoimprint lithography and grayscale photolithography, we successfully achieve high-efficiency and high-precision replication manufacturing of large-aperture MDLs. In conclusion, this research offers a high-efficiency and high-precision replication manufacturing method for the mass production of MDLs, potentially promoting the industrialization of MDLs in optical application fields.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":" 7","pages":"129631I - 129631I-10"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138994737","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Diffusion of electron clouds in high-speed ultraviolet photonic imaging detectors 高速紫外线光子成像探测器中的电子云扩散

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.3007806

Jinyao Duan, Jinkun Zheng, Yang Yang, Yuchao Song, Anpeng Lai, Bo Wang, Weiwei Cao, Yonglin Bai

{"title":"Diffusion of electron clouds in high-speed ultraviolet photonic imaging detectors","authors":"Jinyao Duan, Jinkun Zheng, Yang Yang, Yuchao Song, Anpeng Lai, Bo Wang, Weiwei Cao, Yonglin Bai","doi":"10.1117/12.3007806","DOIUrl":"https://doi.org/10.1117/12.3007806","url":null,"abstract":"In this paper, we mainly study the problem of electron cloud diffusion in high-speed ultraviolet photonic imaging detectors. In this paper, the size of the electron cloud transmitted by the microchannel plate and the anode in the high-speed ultraviolet photon imaging detector is studied by simulation, including the bias angle, pore diameter, voltage (U) and distance between MCP and anode (l) on the electron cloud received by the anode. the diffusion radius of the electron cloud increases with the increase of the bias angle, and the voltage (U) and the distance (l) between the MCP and the anode on the electron cloud received by the anode. The research shows that the diffusion radius of the electron cloud increases with the increase of the bias angle, the diffusion radius of the electron cloud. When U is larger, the energy of electron cloud is also higher. When the voltage increases to 1900V, the electron movement speed increases linearly with the increase of U. Moreover, the diffusion distance of the electron cloud radius increases with the increase of the transmission distance l. When the distance is 2 mm, a maximum electron diffusion radius is obtained. When the bias angle is 10°, the pore diameter is 10um, the voltage is 2000V, and the distance l is 0.5mm, the diffusion ratio of the electron cloud is 5.5.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":"131 5","pages":"129590Z - 129590Z-7"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138965097","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Optical true time delay technique with bidirectional consistency based on unidirectional optical amplifier 基于单向光放大器的双向一致性光学真时延技术

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.3007618

Ang Liu, Shen Dong, Yuqi Tan, Xingwei Ye, Junxiang Xiao

{"title":"Optical true time delay technique with bidirectional consistency based on unidirectional optical amplifier","authors":"Ang Liu, Shen Dong, Yuqi Tan, Xingwei Ye, Junxiang Xiao","doi":"10.1117/12.3007618","DOIUrl":"https://doi.org/10.1117/12.3007618","url":null,"abstract":"The insertion loss of the optical true time delay line is mainly composed of optical waveguide transmission loss, optical switch loss and input-output coupling loss. When the insertion loss is large, the optical power needs to be compensated by the optical amplifier. In order to realize bidirectional optical amplification of true time delay line and ensure high consistency of bidirectional link performance, a new scheme of optical delay line based on unidirectional optical amplifier multiplexing is proposed. Different from the traditional bidirectional delay line that requires one optical amplifier in each of the uplink and downlink, the scheme proposed in this paper reuses the same optical amplifier in the two-way links. As a consequence, the number of devices employed is halved, and the pressures on circuit layout, power consumption and heat dissipation are also reduced. Furthermore, it solves the problem of large performance differences in insertion loss, gain, and optical noise, etc. caused by the opposite experience of optical bidirectional transmission in traditional links. In addition, the scheme in this paper also avoids the problem of performance degradation that may be caused by the use of bidirectional optical amplifiers and other devices with high complexity. In a typical circuit of two-stage cascaded optical delay line, the optical amplifier is placed between the two stages. Through the scheme of unidirectional optical amplifier multiplexing, the bidirectional differences of insertion loss, gain of the optical amplifier and the optical noise are reduced by about 4dB.","PeriodicalId":298662,"journal":{"name":"Applied Optics and Photonics China","volume":" 7","pages":"129661Q - 129661Q-5"},"PeriodicalIF":0.0,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138963395","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Large curvature concave metallic mesh with high optical transmittance and strong electromagnetic interference shielding efficiency 大曲率凹面金属网具有高透光率和强电磁干扰屏蔽效率

Applied Optics and Photonics China Pub Date : 2023-12-18 DOI: 10.1117/12.3008076

Haijuan Cheng, Xufeng Zhu, Yonghua Yang, Rukun Dong, Qiuxu Ru, Weisheng Yang, Rujie Li

引用次数: 0