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Stability of thin-film resistors embedded in printed circuit boards 嵌入印刷电路板的薄膜电阻器的稳定性
2011 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2011-07-08 DOI: 10.1109/STYSW.2011.6155861
P. Winiarski, A. Dziedzic
{"title":"Stability of thin-film resistors embedded in printed circuit boards","authors":"P. Winiarski, A. Dziedzic","doi":"10.1109/STYSW.2011.6155861","DOIUrl":"https://doi.org/10.1109/STYSW.2011.6155861","url":null,"abstract":"Long-term stability of embedded passives is very important issue. To determine this matter an aging process can be used, where test samples are exposed to environmental conditions. Objective of this research was analyzing reliability of thin-film resistors based on Ohmega-Ply® technology. Resistive material was a nickel-phosphorus (Ni-P) alloy (with sheet resistance 25 ¿/sq or 100 ¿/sq) on FR-4 substrate. A number of variables were considered in this study (sheet resistance, geometry of resistor, type of cladding, laser trimming, pulse stress and environmental conditions). Two different accelerated ageing processes ¿ Ex-Situ (samples exposed to elevated temperature and/or relative humidity but resistance measurements made at room temperature) and In-Situ (resistance of test samples performed directly at the ageing conditions) were carried out to perform long-term behavior analysis. The results revealed a significant influence of thickness of resistor, type of cladding and temperature on stability of investigated structures. Signification of other factors was negligible.","PeriodicalId":261643,"journal":{"name":"2011 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2011-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131937441","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Optimization of 2D slab photonic crystal geometry for gas sensing 用于气体传感的二维平板光子晶体几何结构优化
2011 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2011-07-08 DOI: 10.1109/STYSW.2011.6155863
A. Zakrzewski, M. Wielichowski, S. Patela
{"title":"Optimization of 2D slab photonic crystal geometry for gas sensing","authors":"A. Zakrzewski, M. Wielichowski, S. Patela","doi":"10.1109/STYSW.2011.6155863","DOIUrl":"https://doi.org/10.1109/STYSW.2011.6155863","url":null,"abstract":"The two-dimensional (2D) slab photonic crystal (PhC) geometry is optimized for the application of the PhC as a near-infrared spectroscopic gas sensor's active element. Sensor operation in the slow-light regime is assumed. The 2D theoretical model is based on the finite-difference time-domain (FDTD) propagation of the electromagnetic field. Linear-defect 2D photonic crystal structures are considered. Optimization is performed according to the following criteria: maximum light coupling efficiency, maximum light extraction efficiency, and maximum light-gas overlap. In the simulations, output signal collection is performed by means of either an output strip waveguide. Antireflection sections suited for individual PhC geometry types, are applied to prevent excessive reflections resulting from the high group velocity of light propagating in the slow-light regime within the PhC. Configurations with and without antireflection sections are compared. Triangular-lattice 2D PhC types are: line-defect crystals and line-defect crystals featuring an additional row of holes that improve the light-gas overlap.","PeriodicalId":261643,"journal":{"name":"2011 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2011-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130977530","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
The selection of gas chemistry in reactive ion etching of AlGaN/GaN heterostructures 反应离子蚀刻AlGaN/GaN异质结构时气体化学的选择
2011 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2011-07-08 DOI: 10.1109/STYSW.2011.6155839
J. Gryglewicz, W. Oleszkiewicz, R. Paszkiewicz
{"title":"The selection of gas chemistry in reactive ion etching of AlGaN/GaN heterostructures","authors":"J. Gryglewicz, W. Oleszkiewicz, R. Paszkiewicz","doi":"10.1109/STYSW.2011.6155839","DOIUrl":"https://doi.org/10.1109/STYSW.2011.6155839","url":null,"abstract":"In this study, we discuss a scope of different gas mixtures intended for reactive ion etching of AlxGa1¿xN/GaN heterostructures in relation to percentage composition of aluminum. The results of etching process are strongly dependent on the process parameters and gas mixture applied. The selected mixture of BCl3/Cl2/Ar provides a good stability of plasma and quality of etched heterostructure mesas. The test structures of AlGaN/GaN for the RIE process were grown on a c-plane sapphire in a vertical flow LP-MOVPE (low pressure Metalorganic Vapour Phase Epitaxy) system. The surface morphology and topography of mesa structures were studied using atomic force microscope working in tapping mode and scanning electron microscope. The results of etching process for intended process parameters as well as the correlation between the gas mixture, parameters and obtained mesa structures are discussed in this article.","PeriodicalId":261643,"journal":{"name":"2011 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2011-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116598651","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Organizing committee 组织委员会
2011 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 1900-01-01 DOI: 10.1109/haptics.2016.7463139
Kelcy Allwein
{"title":"Organizing committee","authors":"Kelcy Allwein","doi":"10.1109/haptics.2016.7463139","DOIUrl":"https://doi.org/10.1109/haptics.2016.7463139","url":null,"abstract":"Kelcy Allwein, Defense Intelligence Agency, Kelcy.Allwein@dia.mil Elisabeth Andre, University of Augsburg, andre@informatik.uni-augsburg.de Thom Blum, Muscle Fish, a division of Audible Magic thom@musclefish.com Shih-Fu Chang, Columbia University, sfchang@ee.columbia.edu Bruce Croft, University of Massachusetts, croft@cs.umass.edu Alex Hauptmann, Carnegie Mellon University, alex+@cs.cmu.edu Mark Maybury (chair) The MITRE Corporation, maybury@mitre.org Andy Merlino, Pixel Forensics, amerlino@pixelforensics.com Ram Nevatia, University of Southern California, nevatia@iris.usc.edu Prem Natarajan, BBN, prem@bbn.com Kirby Plessas, Open Source Works, kirbyp@open-source-works.org David Palmer, Virage, dpalmer@virage.com Mubarak Shah, University of Central Florida, shah@cs.ucf.edu Rohini K. Shrihari, SUNY Buffalo, rohini@cedar.buffalo.edu Oliviero Stock, Istituto per la Ricerca Scientifica e Tecnologica, stock@fbk.eu John Smith, IBM T. J. Watson Research Center, jsmith@us.ibm.com Rick Steinheiser, DNI/Open Source Center, RickS@rccb.osis.gov Sharon Walter (co-chair) AFRL, Rome NY, Sharon.Walter@rl.af.mil","PeriodicalId":261643,"journal":{"name":"2011 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"61 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127104522","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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