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Journal of Wide Bandgap Materials最新文献

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Low-Field Electron Emission from CVD Diamond Films CVD金刚石薄膜的低场电子发射
Journal of Wide Bandgap Materials Pub Date : 1999-07-01 DOI: 10.1106/D0WE-86B2-YW0J-8WKQ
A. Karabutov, V. Konov, S. Pimenov, E. Obraztsova, V. Frolov, V. Pereverzev, A. Smolin
{"title":"Low-Field Electron Emission from CVD Diamond Films","authors":"A. Karabutov, V. Konov, S. Pimenov, E. Obraztsova, V. Frolov, V. Pereverzev, A. Smolin","doi":"10.1106/D0WE-86B2-YW0J-8WKQ","DOIUrl":"https://doi.org/10.1106/D0WE-86B2-YW0J-8WKQ","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117193904","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 15
An EPR Study of Cubic Boron Nitride of Different Compositions 不同成分立方氮化硼的EPR研究
Journal of Wide Bandgap Materials Pub Date : 1999-07-01 DOI: 10.1106/VXXA-LPQ1-62QM-BMQX
E. Shishonok, V. Shipilo, G. P. Popelnuk, P. Gielisse, I. Azarko
{"title":"An EPR Study of Cubic Boron Nitride of Different Compositions","authors":"E. Shishonok, V. Shipilo, G. P. Popelnuk, P. Gielisse, I. Azarko","doi":"10.1106/VXXA-LPQ1-62QM-BMQX","DOIUrl":"https://doi.org/10.1106/VXXA-LPQ1-62QM-BMQX","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"496 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116545326","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Temperature Dependence of Optical Parameters of Gallium Sulphide 硫化镓光学参数的温度依赖性
Journal of Wide Bandgap Materials Pub Date : 1900-01-01 DOI: 10.1106/152451102024667
M. Kępińska, M. Nowak, M. Szalajko, R. Murri
{"title":"Temperature Dependence of Optical Parameters of Gallium Sulphide","authors":"M. Kępińska, M. Nowak, M. Szalajko, R. Murri","doi":"10.1106/152451102024667","DOIUrl":"https://doi.org/10.1106/152451102024667","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"54 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116619588","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
The Influence of Ar-N2 Plasma Conditions on GaN Deposition by rf Sputtering Ar-N2等离子体条件对射频溅射沉积GaN的影响
Journal of Wide Bandgap Materials Pub Date : 1900-01-01 DOI: 10.1106/152451102025936
B. Stańczyk, A. Jagoda
{"title":"The Influence of Ar-N2 Plasma Conditions on GaN Deposition by rf Sputtering","authors":"B. Stańczyk, A. Jagoda","doi":"10.1106/152451102025936","DOIUrl":"https://doi.org/10.1106/152451102025936","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"16 3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130405169","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Summary of recent progress with diamond electrodes in electroanalysis, spectroelectrochemistry and electrocatalysis 金刚石电极在电分析、光谱电化学和电催化方面的最新进展综述
Journal of Wide Bandgap Materials Pub Date : 1900-01-01 DOI: 10.1106/152451102024653
Malgorzata A. Witek, Jian Wang, Jason Stotter, M. Hupert, S. Haymond, Prerna Sonthalia, G. Swain, J. Zak, Qingyun Chen, D. Gruen, J. Butler, K. Kobashi, T. Tachibana
{"title":"Summary of recent progress with diamond electrodes in electroanalysis, spectroelectrochemistry and electrocatalysis","authors":"Malgorzata A. Witek, Jian Wang, Jason Stotter, M. Hupert, S. Haymond, Prerna Sonthalia, G. Swain, J. Zak, Qingyun Chen, D. Gruen, J. Butler, K. Kobashi, T. Tachibana","doi":"10.1106/152451102024653","DOIUrl":"https://doi.org/10.1106/152451102024653","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"136-137 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124008420","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
The Influence of RF Plasma Processes on Nitride (BN, AlN, GaN) Layers 射频等离子体工艺对氮化氮(BN, AlN, GaN)层的影响
Journal of Wide Bandgap Materials Pub Date : 1900-01-01 DOI: 10.1106/152451102024506
M. Galazka, J. Szmidt, A. Werbowy
{"title":"The Influence of RF Plasma Processes on Nitride (BN, AlN, GaN) Layers","authors":"M. Galazka, J. Szmidt, A. Werbowy","doi":"10.1106/152451102024506","DOIUrl":"https://doi.org/10.1106/152451102024506","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122499255","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Characterization of Wide Bandgap Thin Film Growth Using UV-Extended Real Time Spectroscopic Ellipsometry: Applications to Cubic Boron Nitride 利用紫外扩展实时光谱椭偏法表征宽禁带薄膜生长:在立方氮化硼上的应用
Journal of Wide Bandgap Materials Pub Date : 1900-01-01 DOI: 10.1106/152451102024505
J. Zapien, R. Collins, L. Pilione, R. Messier
{"title":"Characterization of Wide Bandgap Thin Film Growth Using UV-Extended Real Time Spectroscopic Ellipsometry: Applications to Cubic Boron Nitride","authors":"J. Zapien, R. Collins, L. Pilione, R. Messier","doi":"10.1106/152451102024505","DOIUrl":"https://doi.org/10.1106/152451102024505","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"132 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134274233","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Temperature Dependence of Optical Energy Gap of Gallium Selenide 硒化镓光学能隙的温度依赖性
Journal of Wide Bandgap Materials Pub Date : 1900-01-01 DOI: 10.1106/152451102024668
M. Kępińska, M. Nowak, Z. Kovalyuk, R. Murri
{"title":"Temperature Dependence of Optical Energy Gap of Gallium Selenide","authors":"M. Kępińska, M. Nowak, Z. Kovalyuk, R. Murri","doi":"10.1106/152451102024668","DOIUrl":"https://doi.org/10.1106/152451102024668","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116793132","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Investigation of the Processes of Crystallization and Sintering of Cubic Boron Nitride and its Physical Properties 立方氮化硼结晶烧结工艺及其物理性能研究
Journal of Wide Bandgap Materials Pub Date : 1900-01-01 DOI: 10.1106/WTJ6-0CL2-PPWH-TLKV
V. Shipilo, L. M. Gameza, N. G. Anichenko, P. Gielisse
{"title":"Investigation of the Processes of Crystallization and Sintering of Cubic Boron Nitride and its Physical Properties","authors":"V. Shipilo, L. M. Gameza, N. G. Anichenko, P. Gielisse","doi":"10.1106/WTJ6-0CL2-PPWH-TLKV","DOIUrl":"https://doi.org/10.1106/WTJ6-0CL2-PPWH-TLKV","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132647220","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Emerging Silicon Carbide Power Device Technologies 新兴碳化硅功率器件技术
Journal of Wide Bandgap Materials Pub Date : 1900-01-01 DOI: 10.1106/HX1N-DL9K-YK3X-UY54
A. Elford, P. Mawby
{"title":"Emerging Silicon Carbide Power Device Technologies","authors":"A. Elford, P. Mawby","doi":"10.1106/HX1N-DL9K-YK3X-UY54","DOIUrl":"https://doi.org/10.1106/HX1N-DL9K-YK3X-UY54","url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125470325","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
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