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Bulbo utilizado como método de encapsulamento para dispositivos OLEDs Bulb used as encapsulation method for OLED devices 作为OLED设备封装方法的灯泡
Revista Brasileira de Aplicações de Vácuo Pub Date : 2018-07-21 DOI: 10.17563/RBAV.V37I2.1082
Emerson Roberto dos Santos, Ana Carolina Fioravant Eilert da Silva, Eric Tsuneki Yoshiura Ono, S. Yoshida, M. Oide, Elvo Calixto Burini Junior, R. Onmori, W. Hui
{"title":"Bulbo utilizado como método de encapsulamento para dispositivos OLEDs Bulb used as encapsulation method for OLED devices","authors":"Emerson Roberto dos Santos, Ana Carolina Fioravant Eilert da Silva, Eric Tsuneki Yoshiura Ono, S. Yoshida, M. Oide, Elvo Calixto Burini Junior, R. Onmori, W. Hui","doi":"10.17563/RBAV.V37I2.1082","DOIUrl":"https://doi.org/10.17563/RBAV.V37I2.1082","url":null,"abstract":"Dispositivos OLEDS (diodos orgânicos emissores de luz) foram montados com copolimeros PFTB (emissao vermelha) e PFPF (emissao azul). Esses copolimeros foram sintetizados em laboratorio por reacao de acoplamento de Suzuki. Para avaliar o desempenho de cada copolimero, dispositivos OLEDs com arquitetura: vidro/ITO/PEDOT:PSS/COPOLIMERO (de emissao vermelha ou azul)/AZO/Al foram testados fora e dentro de um bulbo em atmosfera de nitrogenio. Esse bulbo foi montado a partir de um frasco e na tampa foram encaixadas e coladas uma placa de circuito impresso com contatos eletricos e duas valvulas para entrada e saida de gas nitrogenio (utilizado para purgar do ar atmosferico). Os resultados revelaram que o bulbo utilizado como encapsulamento apresentou diferenca no comportamento dos dispositivos OLEDs levando a aumento significativo nos desempenhos, como maior tempo de vida e menor nivel de degradacao.","PeriodicalId":237166,"journal":{"name":"Revista Brasileira de Aplicações de Vácuo","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122562881","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Low cost spinner developed for deposition of thin films used in OLED devices 用于OLED器件中薄膜沉积的低成本旋转器
Revista Brasileira de Aplicações de Vácuo Pub Date : 2018-07-21 DOI: 10.17563/RBAV.V37I2.1071
E. R. Santos, Christine Miwa Takahashi, H. G. Takimoto, S. Yoshida, M. Oide, Elvo Calixto Burini Junior, R. Onmori, W. Hui
{"title":"Low cost spinner developed for deposition of thin films used in OLED devices","authors":"E. R. Santos, Christine Miwa Takahashi, H. G. Takimoto, S. Yoshida, M. Oide, Elvo Calixto Burini Junior, R. Onmori, W. Hui","doi":"10.17563/RBAV.V37I2.1071","DOIUrl":"https://doi.org/10.17563/RBAV.V37I2.1071","url":null,"abstract":"This work aims the development of a compact spinner to be used inside the glove-box chamber to deposition of polymeric thin films used in the build of OLED devices. Initially, ten fans extracted of microcomputers were tested with commercial multi-voltage power supply. Four fans were selected based on the standard deviation of speed. A variable power supply was also built in order to get a more detailed response in terms of electrical current and speed in function of applied voltage. The fan that showed less variation of speed with applied voltage was selected for deposition tests using polymeric photoresist solution on the ITO (indium tin oxide) coated glass. This polymer was deposited by spin-coating at different speeds: 1000, 2000, 3000 and 4000 rpm and dried for the thicknesses measurement revealing good uniformity. Finally, three OLED devices were assembled with 2000 and 3000 rpm and the layers were dried under the same conditions. In the structure of the devices were used the materials deposited layer-by-layer:glass/ITO/PEDOT:PSS/ Polyfluorene (PFpf)/Al. The OLED devices revealed blue light electroluminescence. The I-V curves showed better performance for OLED devices mounted at 2000 rpm with higher current density and similar appearance to the diode curve.","PeriodicalId":237166,"journal":{"name":"Revista Brasileira de Aplicações de Vácuo","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115576350","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Shifts in average energy of deposited atoms by magnetron sputtering through modifications in anode geometry: a simulation study 磁控溅射沉积原子平均能量的变化通过阳极几何形状的改变:模拟研究
Revista Brasileira de Aplicações de Vácuo Pub Date : 2018-07-21 DOI: 10.17563/RBAV.V37I2.1101
Júlia Karnopp, J. Sagás
{"title":"Shifts in average energy of deposited atoms by magnetron sputtering through modifications in anode geometry: a simulation study","authors":"Júlia Karnopp, J. Sagás","doi":"10.17563/RBAV.V37I2.1101","DOIUrl":"https://doi.org/10.17563/RBAV.V37I2.1101","url":null,"abstract":"The deposition of titanium and gadolinium films by magnetron sputtering was simulated by using software SiMTra. The main goal is to analyze the average energy of deposited atoms as a function of argon pressure at different anode geometries. Two different anode configurations were used: a grid inserted between the target and the substrate, in the so-called grid-assisted magnetron sputtering, and a disk with different apertures. In the case of grid anode, simulations were also performed with a shutter in front of the substrate. The presence of the grid increases the average energy of atoms arriving at the substrate for pressures in the range between 1.0 and 8.0 Pa. The disk anode also changes the average energy, but such effect depends on the size of aperture.","PeriodicalId":237166,"journal":{"name":"Revista Brasileira de Aplicações de Vácuo","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122058330","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Influência da geometria do pino da ferramenta de soldagem nas propriedades mecânicas e tensões residuais de juntas soldadas de ligas de alumínio 5052-O pelo processo FSW 焊接工具销钉几何形状对5052-O铝合金FSW焊接接头力学性能和残余应力的影响
Revista Brasileira de Aplicações de Vácuo Pub Date : 2018-07-21 DOI: 10.17563/rbav.v37i2.1094
Eduardo Bruno Souza de Oliveira, Déborah Brito Colaço, Mattheus Apolinário Ribeiro, Jefferson Segundo de Lima, T. Maciel, Raphael Henrique Falcão de Melo
{"title":"Influência da geometria do pino da ferramenta de soldagem nas propriedades mecânicas e tensões residuais de juntas soldadas de ligas de alumínio 5052-O pelo processo FSW","authors":"Eduardo Bruno Souza de Oliveira, Déborah Brito Colaço, Mattheus Apolinário Ribeiro, Jefferson Segundo de Lima, T. Maciel, Raphael Henrique Falcão de Melo","doi":"10.17563/rbav.v37i2.1094","DOIUrl":"https://doi.org/10.17563/rbav.v37i2.1094","url":null,"abstract":"Ligas de aluminio possuem excelentes caracteristicas e propriedades mecânicas. No entanto, a soldagem desses materiais atraves de processos convencionais ao arco eletrico resulta em uma degradacao excessiva destas propriedades, afetando diretamente sua vida util. Neste contexto, os processos de soldagem por friccao tem recebido atencao nos ultimos anos, principalmente devido a minimizacao do aporte de calor \u0000fornecido durante o processo, nao atingindo o ponto de fusao do material. Este trabalho tem por objetivo analisar diferentes perfis de pino da ferramenta de soldagem por FSW e sua influencia nas propriedades mecânicas das juntas soldadas. Para tanto, 12 geometrias de ferramentas foram projetadas, fabricadas e testadas. Ensaios mecânicos de dobramento de raiz a 60°, tracao uniaxial, determinacao do perfil de dureza e de tensoes residuais das juntas soldadas foram empregados para caracterizacao eanalise das propriedades. Observou-se uniformidade tanto nos perfis de dureza como nos de tensoes residuais. Os ensaios de \u0000tracao uniaxial e dobramento de raiz indicaram que a ferramenta 1, com pino em formato de tronco de cone e com rosca, obteve valores de resistencia mecânica inferiores as demais, sendo as ferramentas 4 e 9, cilindricas com e sem rosca, respectivamente, as que proporcionaram as melhores propriedades mecânicas.","PeriodicalId":237166,"journal":{"name":"Revista Brasileira de Aplicações de Vácuo","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127813242","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Extraction, characterization and quantification of resveratrol from the inemaking pomace: emphasis on the vacuum drying process 白酒渣中白藜芦醇的提取、表征及定量研究:重点介绍真空干燥工艺
Revista Brasileira de Aplicações de Vácuo Pub Date : 2018-07-21 DOI: 10.17563/RBAV.V37I2.1095
S. Botti, Antônio Odair Santos, Inaldo Dias, F. T. Degasperi, S. P. Irazusta
{"title":"Extraction, characterization and quantification of resveratrol from the inemaking pomace: emphasis on the vacuum drying process","authors":"S. Botti, Antônio Odair Santos, Inaldo Dias, F. T. Degasperi, S. P. Irazusta","doi":"10.17563/RBAV.V37I2.1095","DOIUrl":"https://doi.org/10.17563/RBAV.V37I2.1095","url":null,"abstract":"The main residue of the winemaking process is the grape pomace, which is rich in bioactive compounds such as resveratrol, known by its therapeutic and cosmetic value as well as its natural antioxidant characteristics. The present work aimed to study methods of preservation and extraction of resveratrol envisaging a sustainable use of winemaking disposal residues. This work carried out a comparative analysis of bagasse drying methods, using thermal process dewatering and freeze drying or lyophilization, using a vacuum process, both prior to the extraction process of resveratrol. The analytical characterization of the extract,by Fourier Transform Infrared and High Performance/Pressure Liquid Chromatograph allowed, respectively, the identification and quantification of resveratrol, indicating the freeze-drying of pomace as the best way of preserving its content in the sample.","PeriodicalId":237166,"journal":{"name":"Revista Brasileira de Aplicações de Vácuo","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130633678","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Influence of the plasma nitriding conditions on the chemical and morphological characteristics of TiN coatings deposited on silicon 等离子体氮化条件对硅基TiN镀层化学和形态特征的影响
Revista Brasileira de Aplicações de Vácuo Pub Date : 2018-07-21 DOI: 10.17563/RBAV.V37I2.1083
João Valério de Souza Neto, Ricardo Silva de Freitas, B. C. Neto, Francisco Eroni Paz dos Santos, P. Nascente, D. A. Tallarico, V. Mastelaro, Rômulo Ribeiro Magalhães de Souza
{"title":"Influence of the plasma nitriding conditions on the chemical and morphological characteristics of TiN coatings deposited on silicon","authors":"João Valério de Souza Neto, Ricardo Silva de Freitas, B. C. Neto, Francisco Eroni Paz dos Santos, P. Nascente, D. A. Tallarico, V. Mastelaro, Rômulo Ribeiro Magalhães de Souza","doi":"10.17563/RBAV.V37I2.1083","DOIUrl":"https://doi.org/10.17563/RBAV.V37I2.1083","url":null,"abstract":"Titanium nitride (TiN) coatings were grown on silicon substrates by cathodic cage plasma deposition (CCPD). TiN coatings present interesting properties, such as high hardness, chemical and thermal stabilities, good thermal and electrical conductivities, and corrosion resistance, making them suitable for several technologically important applications. The influence of parameters such as plasma nitriding atmosphere, temperature, and time on the chemical and morphological characteristics of the deposited coatings was investigated by means of Raman spectroscopy, scanning electron microscopy, energy dispersive spectroscopy, and X-ray photoelectron spectroscopy. The results obtained by these characterization techniques revealed that the TiN coatings produced by CCPD presented high quality.","PeriodicalId":237166,"journal":{"name":"Revista Brasileira de Aplicações de Vácuo","volume":"55 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126016142","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Confinamento de elétrons em um sistema de plasma de tela ativa e geração de potencial flutuante extremo no interior da gaiola catódica 有源屏幕等离子体系统中的电子约束和阴极笼内极端浮动电位的产生
Revista Brasileira de Aplicações de Vácuo Pub Date : 2018-07-21 DOI: 10.17563/RBAV.V37I2.1098
Felipe Hilário Corrêa, Daniela Becker, L. Fontana
{"title":"Confinamento de elétrons em um sistema de plasma de tela ativa e geração de potencial flutuante extremo no interior da gaiola catódica","authors":"Felipe Hilário Corrêa, Daniela Becker, L. Fontana","doi":"10.17563/RBAV.V37I2.1098","DOIUrl":"https://doi.org/10.17563/RBAV.V37I2.1098","url":null,"abstract":"Neste trabalho foram realizadas medidas de potencial flutuante no espaco interno de gaiolas catodicas, com plasma de argonio, em funcao do percentual de area aberta da grade. O modulo do potencial flutuante apresenta valores da ordem de 101 V em gaiolas com alta porcentagem de area aberta (~70%), por outro lado, observa-se que o modulo de potencial flutuante e da ordem 102 V (proximo do potencial do catodo) para gaiolas feitas de grades com malha mais fechada (~40% de area aberta). Quando a malha da grade e suficientemente fechada, os eletrons sao confinados no espaco interno da gaiola e sua densidade aumenta ate atingir o potencial do catodo (grade). Quando a malha e suficientemente aberta, ocorre a formacao de catodo oco aberto – COA – que conecta o interior da grade com o plasma e derruba o modulo do potencial flutuante para valores semelhantes ao da regiao luminescente do plasma. Foram realizadas medidas do potencial flutuante em funcao da tensao no catodo e da pressao do gas de trabalho para grades com diferentes percentuais de area aberta.","PeriodicalId":237166,"journal":{"name":"Revista Brasileira de Aplicações de Vácuo","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133184920","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
O simples como inovação 简单如创新
Revista Brasileira de Aplicações de Vácuo Pub Date : 2018-07-21 DOI: 10.17563/rbav.v37i2.1108
M. D. Silva
{"title":"O simples como inovação","authors":"M. D. Silva","doi":"10.17563/rbav.v37i2.1108","DOIUrl":"https://doi.org/10.17563/rbav.v37i2.1108","url":null,"abstract":"E se usarmos a navalha de Occam para analisar nossas realizacoes tecnologicas recentes? Pode-se argumentar contra, uma vez que o reducionismo e incompativel com inovacoes disruptivas – nossa atual tendencia, pois, “para todo problema complexo, existe sempre uma solucao simples, elegante e completamente errada”. Por outro lado, ate o nosso mais simples gadget do dia a dia parece “gritar” que a simplicidade – no uso, na concepcao, no formato, etc. – e o caminho. Estamos acostumados com a ideia de que a teoria mais simples e a mais elegante e, provavelmente, a mais correta, ou, no minimo, mais adequada. Mas estamos igualmente submersos num mundo complexo e multifacetado.","PeriodicalId":237166,"journal":{"name":"Revista Brasileira de Aplicações de Vácuo","volume":"123-124 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131708555","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of a methodology for measuring the evolution of duplex stainless-steel low-temperature plasma nitrided phases expansion using confocal laser scanning microscopy 用共聚焦激光扫描显微镜测量双相不锈钢低温等离子体氮化相膨胀演变的方法的发展
Revista Brasileira de Aplicações de Vácuo Pub Date : 1900-01-01 DOI: 10.17563/rbav.v40.1194
C. E. L. Feitosa, R. Cardoso, S. F. Brunatto
{"title":"Development of a methodology for measuring the evolution of duplex stainless-steel low-temperature plasma nitrided phases expansion using confocal laser scanning microscopy","authors":"C. E. L. Feitosa, R. Cardoso, S. F. Brunatto","doi":"10.17563/rbav.v40.1194","DOIUrl":"https://doi.org/10.17563/rbav.v40.1194","url":null,"abstract":"Samples of duplex stainless steel SAF 2507 were low-temperature plasma nitrided to characterize separately, on the surface, the behavior of its ferrite and austenite phases in relation to two competing processes, that is, one caused by enrichment by nitrogen, resulting in possible expansion, and the other caused by the removal of superficial atoms via sputtering, which may lead to the retraction of the studied phases. Since these phases have different different compositions and crystalline structures, of which the diffusivity and solubility of nitrogen in them are dependent, a different response for each type of phase can be expected. In this article, an innovative methodology has been developed to quantify and clarify which effects are predominant in the course of nitriding for each of these phases. The results indicate that phase expansion prevails over sputtering.","PeriodicalId":237166,"journal":{"name":"Revista Brasileira de Aplicações de Vácuo","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114925636","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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