International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)最新文献_第5页

Convolutional neural networks with coherent nanophotonic circuits 具有相干纳米光子电路的卷积神经网络

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2604731

Xiaofeng Xu, Lianqing Zhu, Wei Zhuang

{"title":"Convolutional neural networks with coherent nanophotonic circuits","authors":"Xiaofeng Xu, Lianqing Zhu, Wei Zhuang","doi":"10.1117/12.2604731","DOIUrl":"https://doi.org/10.1117/12.2604731","url":null,"abstract":"Convolutional neural networks (CNN) has significant advantages in processing image classification and was widely used in image analysis in the fields of autonomous driving, aerospace, and biomedicine. However, image classification and analysis need large matrix multiplication, which imposes many challenges to the realization of high performance and low power consumption of CNNS. Here, a photoelectric hybrid neural network (PHNN) was developed to reduce the CNN’s power consumption. The optical interference unit (OIU) composed of Mach-Zehnder interferometers (MZI) arrays, used as convolution kernel, performs multiplication and accumulation operations. The convolution kernel is split and reorganized effectively to form a new unitary matrix to reduce the number of MZIs. Simultaneously, this method can modularize the OIU, which is beneficial to field-programmable gate array (FPGA) encoding and modulation. FPGA realizes nonlinear calculation, data scheduling and storage, and phase encoding and modulation. Our PHNN has an accuracy rate of 93.3%, which reduces power consumption by 3 times of magnitude compared with traditional electronic products.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133454630","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Multiscale fabrication of integrated photonic chips by electron beam lithography 电子束光刻集成光子芯片的多尺度制造

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2604003

Siyuan Liu, Zhuangzhuang Qu, Yuanyuan Fan, Yan Qi, Lujun Bai, Weihu Zhou, Jianming Lu, Yu Wang, Chunrui Han

{"title":"Multiscale fabrication of integrated photonic chips by electron beam lithography","authors":"Siyuan Liu, Zhuangzhuang Qu, Yuanyuan Fan, Yan Qi, Lujun Bai, Weihu Zhou, Jianming Lu, Yu Wang, Chunrui Han","doi":"10.1117/12.2604003","DOIUrl":"https://doi.org/10.1117/12.2604003","url":null,"abstract":"The readily accessible commercial electron beam lithography (EBL) has high-accuracy and mask-free characteristics which enable fast exploration of novel on-chip devices. However, current EBL technique would be challenging to solve the dilemma between high accuracy and large writing field. Here we report an effective recipe to fabricate such multiscale photonic devices. It is realized by improving the standard procedure of stitching small writing fields with alignment markers. The key is the small patterns stitching and exposure alignment process. We divide the large design structure into several small patterns and take pictures of their corresponding alignment markers by the EBL instrument itself with exactly the same parameters used in the subsequent e-beam exposure. As such, the exposure alignment errors caused by calibration procedures are completely eliminated. We precisely write the divided patterns to desired locations by their surrounding markers and finally achieve gapless and precise stitching within the whole photonic circuit. The protocol is demonstrated by a Mach-Zehnder Interferometer (MZI) structure on a 200nm thick Si3N4 chip, in which nano-scale grating coupler have been clearly developed. Compared with traditional EBL technique, the connection accuracy of a waveguide between adjacent writing fields has been significantly improved to be less than 10 nm even without a laser interferometric stage. Moreover, due to the stitching mechanism, the maximum chip size for exposure becomes limitless and could reach up to the entire wafer. Our technique greatly expands the fabrication size of EBL while maintaining its high resolution and opens more opportunities to the development of integrated photonic circuits.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133395911","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Control and optimization of the stray light in laser projectors 激光投影机杂散光的控制与优化

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2605146

Shuihai Peng, Dayong Zhang, Genjie Yang, Junsheng Yu

引用次数: 0

Displacement sensing based on intensity detection by a SNAP-taper coupling system 基于snap -锥度耦合系统强度检测的位移传感

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2604772

Yongchao Dong, Penghui Sun, Jian Chen, Xueliang Zeng, Han Wang

{"title":"Displacement sensing based on intensity detection by a SNAP-taper coupling system","authors":"Yongchao Dong, Penghui Sun, Jian Chen, Xueliang Zeng, Han Wang","doi":"10.1117/12.2604772","DOIUrl":"https://doi.org/10.1117/12.2604772","url":null,"abstract":"A novel highly sensitive displacement sensing method based on the intensity detection of the resonant spectrum, which arises from a fiber-based surface nanoscale axial photonics (SNAP) resonator, is proposed. By means of dissipative and dispersive coupling mechanisms, the changes of the relative position between the SNAP resonator and fiber taper not only bring the shift in a resonant wavelength, but also lead to the variation of the linewidth and extinction ratio of the whispering gallery mode (WGM) in spectrum. Instead of the wavelength shift, we utilize the extinction ratio changes to realize the displacement sensing, which is robust against lasing and microresonator frequency noise in the detecting system. Using the analytical expression of the transmission spectrum, the extinction ratio as a function of the displacement for different axial modes is obtained. It is proved that a large range and high resolution displacement sensor can be achieved by simultaneously tracking the extinction ratio of multiple axial modes. The fiber-based SNAP resonator can be fabricated into a probe-type sensor, making it potential and a powerful tool for many displacement sensing applications such as microstructure measurements in both aerospace and nano-lithography fields.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"8 Suppl 2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126139854","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Research on surface profile measurement of weak-rigid plate 弱刚性板表面轮廓测量方法研究

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2604750

Guanyu Zhou, Wei Wang, Min Xu

{"title":"Research on surface profile measurement of weak-rigid plate","authors":"Guanyu Zhou, Wei Wang, Min Xu","doi":"10.1117/12.2604750","DOIUrl":"https://doi.org/10.1117/12.2604750","url":null,"abstract":"Weak-rigid components have a wide range of applications in the fields of aerospace, vehicle and ship power. They have the characteristics of high accuracy, poor rigidity, and easy deformation. The uncertainty of their deformation has an important impact on the overall performance and subsequent use of the equipment. Weak-rigid plates are one of the most common types of weak-rigid components. At present, the research on weak-rigid plates mainly focuses on the deformation control of the workpiece during processing, and there are relatively few studies on the measurement of comprehensive parameters. The surface profile parameters of the weak-rigid plate will reflect the performance and processing quality of the weak-rigid plate. In this paper, a comprehensive index measuring device for weak-rigid components based on dispersion confocal sensor and a stress change test system for weak-rigid components based on dynamic interferometer are used to accurately measure the surface profile of weak-rigid plates, which provides a basis for its process parameters and subsequent assembly use. It provides a reference for the subsequent measurement of the surface profile and thickness of weak-rigid curved components.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"43 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122315580","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Broadband high-efficiency reflective metasurfaces for sub-diffraction focusing in the visible 用于亚衍射聚焦的宽带高效反射超表面

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2604462

Xinjian Lu, Yinghui Guo, M. Pu, Xiong Li, Xiaoliang Ma, Ping Gao, Xiangang Luo

引用次数: 0

Structure design and performance analysis of double piezoelectric ceramic drive fast tool servo system 双压电陶瓷驱动快速刀具伺服系统的结构设计与性能分析

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2604485

Tiancong Luo, Xiao-qiang Peng, Chao-liang Guan, Jiahao Yong, Yupeng Xiong

引用次数: 0

Optical surface error analysis and compensation technique based on Zernike polynomial coefficients 基于泽尼克多项式系数的光学表面误差分析与补偿技术

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2604688

Zelong Li, Chao-liang Guan, Yi-fan Dai, Jiahao Yong

{"title":"Optical surface error analysis and compensation technique based on Zernike polynomial coefficients","authors":"Zelong Li, Chao-liang Guan, Yi-fan Dai, Jiahao Yong","doi":"10.1117/12.2604688","DOIUrl":"https://doi.org/10.1117/12.2604688","url":null,"abstract":"Ultra-precision turning technology is widely used in the machining process of optical mirrors. Due to the influence of machine motion error, clamping error, tracking error and other factors, ultra-precision turning often deviates from the ideal position during the actual machining process. Various error factors are coupled with each other, and it is difficult to compensate by establishing an accurate error model at present. This paper proposes an optical surface error compensation method based on zernike polynomials. Firstly, the surface error is reconstructed with Zernike polynomials. Then, by analyzing the frequency distribution of the optical surface error, the error corresponding to a specific Zenick coefficient is selected. Finally, based on the fast tool servo system, the original machining path is corrected according to the error compensation strategy. By compensating a Φ100 mm mirror, the surface accuracy is improved from PV 1.83 μm, RMS 0.47 μm to PV 0.38 μm, RMS 0.04 μm. The experimental results show that the error compensation strategy proposed in this paper can significantly reduce the optical surface error and improve the machining accuracy.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"12071 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129146120","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Study on speckle problem in semiconductor laser display 半导体激光显示中散斑问题的研究

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2604820

Zhihao Quan, Jie Liu, Jian-Cheng Zhong

{"title":"Study on speckle problem in semiconductor laser display","authors":"Zhihao Quan, Jie Liu, Jian-Cheng Zhong","doi":"10.1117/12.2604820","DOIUrl":"https://doi.org/10.1117/12.2604820","url":null,"abstract":"As a new generation of display technology, Laser displays a wide range of color gamut, high brightness, and other characteristics. However, as a highly coherent light source, laser speckle will be generated by the interference phenomenon of the reflected light or transmitted light of different surface elements after the incident on the surface of the object, which will seriously reduce the quality of the display image. Therefore, the suppression of laser speckle and the reduction of speckle contrast are always important problems in laser display technology. Here, we presented a speckle suppression scheme suitable for projector optical systems. Speckle suppression by spectral broadening and speckle suppression by superposition of multiple independent and unrelated speckle patterns are included in the scheme. Then, the feasibility of the scheme was verified by simulation. On this basis, the projector system was built. The speckle suppression scheme was added, and the effect of the scheme on speckle contrast was verified by actual measurement, and the speckle contrast was successfully reduced from 0.129 to 0.041, which was difficult for human eyes to distinguish.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"12074 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129442870","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Chromatic confocal sensor with dual dispersion for extending the measuring range 具有双色散的彩色共焦传感器，可扩展测量范围

International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) Pub Date : 2021-12-13 DOI: 10.1117/12.2604482

Xiaojie Wang, Tao Ma

引用次数: 0