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Advances in Patterning Materials and Processes XXXV最新文献

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Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly 利用石墨外延定向自组装的切割形状，实现20纳米以下金属尖端到尖端的设计计算能力
Advances in Patterning Materials and Processes XXXV Pub Date : 2018-09-06 DOI: 10.1117/12.2297344
B. Meliorisz, K. Lai, U. Welling, H. Stock, S. Marokkey, T. Muelders, Jing Sha, Chi-Chun Liu, C. Chi, Jing Guo, C. Osborn, J. Morillo, W. Demmerle, D. Dunn
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