2022 IEEE International Conference on Plasma Science (ICOPS)最新文献_第2页

Voltage Waveform Tailoring in Plasma Etching of Dielectrics to Mitigate Surface Charging Effects 等离子体蚀刻介质中电压波形裁剪以减轻表面充电效应

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/ICOPS45751.2022.9813200

F. Krüger, M. Kushner, H. Lee, S. Nam

{"title":"Voltage Waveform Tailoring in Plasma Etching of Dielectrics to Mitigate Surface Charging Effects","authors":"F. Krüger, M. Kushner, H. Lee, S. Nam","doi":"10.1109/ICOPS45751.2022.9813200","DOIUrl":"https://doi.org/10.1109/ICOPS45751.2022.9813200","url":null,"abstract":"Shrinking feature sizes and increasingly large aspect ratios (HAR) in plasma etching pose major challenges to high volume manufacturing of nanoscale semiconductor devices. When plasma etching dielectric materials, electrostatic charging in the feature and the resulting deflection of electrons and ions can be a source of feature distortion and reduction in etch rate. Disparate intra-feature charging results from the ion angular distribution into the feature typically being narrower than the angular distribution of electrons. Voltage waveform tailoring (VWT) allows for significant control of the ion and electron energy and angular distribution which can partially mitigate intra feature charging. In this talk, we will discuss results from a computational investigation of the plasma etching of HAR features in SiO 2 using VWT. The system is a dual-frequency capacitively coupled plasma sustained in fluorocarbon gas mixtures and operated at 40 mTorr. The gas phase simulations were performed using the Hybrid Plasma Equipment Model (HPEM). The applied waveform consists of 5 harmonics with a base frequency of 1 MHz. Using HPEMs reactive fluxes to the wafer, the etching of a HAR via in SiO 2 was simulated using the Monte Carlo Feature Profile Model (MCFPM). The resulting features were evaluated with respect to surface charge distribution, feature deformation and etch rate.","PeriodicalId":175964,"journal":{"name":"2022 IEEE International Conference on Plasma Science (ICOPS)","volume":"56 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114383533","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Effect of Grating Lattice Vector on Smith-Purcell Radiation 光栅晶格矢量对Smith-Purcell辐射的影响

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/icops45751.2022.9813330

Z.W. Zhang, C. Du, Fan‐Hong Li, J. Zhu

引用次数: 0

Comparison of Round and Knife-Edge-Like Cathodes on Gas-Puff Single-Liner Implosions 圆形阴极与刀口阴极在充气单管内爆中的比较

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/ICOPS45751.2022.9813160

M. Escalona, J. Valenzuela, O. Loch, I. Gallegos, F. Veloso

{"title":"Comparison of Round and Knife-Edge-Like Cathodes on Gas-Puff Single-Liner Implosions","authors":"M. Escalona, J. Valenzuela, O. Loch, I. Gallegos, F. Veloso","doi":"10.1109/ICOPS45751.2022.9813160","DOIUrl":"https://doi.org/10.1109/ICOPS45751.2022.9813160","url":null,"abstract":"Preionization is believed to play an important role on the implosion of gas-puff Z-pinches. Some experiments have used an external preionization source, e.g., UV light or electron beam. In contrast, other experiments rely completely on overvoltage breakdown by the own generator’s voltage pulse. But the problem with this approach is that it might not produce reliable results because self-breakdown is mainly a stochastic process. In order to study reproducibility, we performed systematic studies on self-breakdown using two different cathode geometries: i) a smooth, round cathode to provide a homogenous electric field ii) a sharp, knife-edge-like geometry to enhance the electric field locally and eventually electron emission. The experiments were carried out on the Llampudken current generator, which provides a current pulse of ~400kA amplitude and 200ns rise time (10%-90%). We implemented gated XUV imaging, laser probing, filtered diodes and time-integrated X-ray imaging to obtain information about the implosion as well as the stagnation phase for the two cathode geometries. Preliminary analysis shows that erosion of the knife-edge cathode may be a serious problem, and on the contrary, the round cathode may have far more reliable results. Data is currently analyzed and further details will be shown and discussed.","PeriodicalId":175964,"journal":{"name":"2022 IEEE International Conference on Plasma Science (ICOPS)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128464698","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Trap-Limited Space-Charge Limited Current in 2D Thin Film Dielectric 二维薄膜电介质中的限阱空间-电荷限流

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/ICOPS45751.2022.9813170

C. Y. Kee, Y. Ang, L. Ang

{"title":"Trap-Limited Space-Charge Limited Current in 2D Thin Film Dielectric","authors":"C. Y. Kee, Y. Ang, L. Ang","doi":"10.1109/ICOPS45751.2022.9813170","DOIUrl":"https://doi.org/10.1109/ICOPS45751.2022.9813170","url":null,"abstract":"Due to the lack of intrinsic charge in insulator or dielectric, significant charge injection from electrode into the solid is required and the transport is known as space charge limited current (SCLC) in solid. By measuring the current-voltage characteristics, one can estimate the mobility of the charge injection. For 1D model transport, it is a well-known technique for both trap-free [1] and trap-filled [2] solids. For a thin film setting, it is more complicated that requires numerical solution even for a trap-free solid [3] . Such thin film setting can even approach the limit of monolayer of 2D materials [4] . In this paper, we consider a trap-filled solid and formulate a SCLC model for different contact geometries relevant to 2D thin film. By solving the Cauchy-type singular integral equation, our results show that the calculated results are different from traditional models. Using our model, we can estimate the mobility for a given trap distribution and geometrical setting. The developed SCLC model developed here shall offer a practical tool for more accurate estimation of carrier mobility of ultrathin dielectric slab used in various applications of high current transport in nanodiodes [5] including electrical contact and dielectric breakdown.","PeriodicalId":175964,"journal":{"name":"2022 IEEE International Conference on Plasma Science (ICOPS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128675979","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Shock Structure in a Collisional, Magnetised Laboratory Plasma 碰撞磁化实验室等离子体中的激波结构

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/ICOPS45751.2022.9812992

D. Russell, G. Burdiak, J. Carroll-Nellenback, J. Halliday, J. Hare, S. Merlini, L. Suttle, V. Valenzuela-Villaseca, S. Eardly, J. Fullalove, G. Rowland, R. Smith, A. Frank, P. Hartigan, A. Velikovich, S. Lebedev

{"title":"Shock Structure in a Collisional, Magnetised Laboratory Plasma","authors":"D. Russell, G. Burdiak, J. Carroll-Nellenback, J. Halliday, J. Hare, S. Merlini, L. Suttle, V. Valenzuela-Villaseca, S. Eardly, J. Fullalove, G. Rowland, R. Smith, A. Frank, P. Hartigan, A. Velikovich, S. Lebedev","doi":"10.1109/ICOPS45751.2022.9812992","DOIUrl":"https://doi.org/10.1109/ICOPS45751.2022.9812992","url":null,"abstract":"Shocks are ubiquitous in astrophysical, space and laboratory plasmas and are typical of systems in which high velocity flows interact. We present results from a laboratory study of shock structure in a collisional HED plasma. Supersonic, super-Alfvénic plasma flows (n e ~ 1×10 18 cm -3 , B ~ 2 T, v = 50 - 100 kms -1 ,T ~ 10 eV) are produced by current driven ablation at the MAGPIE pulsed power facility and shocks are studied by placing obstacles into these flows. The plasma flows are highly collisional, with (m.f.p << resistive/thermal diffusion lengths << system size). This hierarchy of scales leads to shocks in which a combination of dissipation mechanisms may determine the shock structure. Laser probing diagnostics, including interferometry, optical Thomson scattering and Faraday rotation polarimetry provide detailed measurements of plasma parameters in both the upstream and downstream plasmas. We investigate the effects of different dissipation mechanisms as well as the effect of radiative cooling on shock structure.","PeriodicalId":175964,"journal":{"name":"2022 IEEE International Conference on Plasma Science (ICOPS)","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129640355","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Torsion density related to electrode and crystal size 扭转密度与电极和晶体尺寸有关

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/icops45751.2022.9812955

P. Adamson, C. M. Carmichael, G. Griffin, J. Martinez Ortiz, L. Matthews, T. Hyde

{"title":"Torsion density related to electrode and crystal size","authors":"P. Adamson, C. M. Carmichael, G. Griffin, J. Martinez Ortiz, L. Matthews, T. Hyde","doi":"10.1109/icops45751.2022.9812955","DOIUrl":"https://doi.org/10.1109/icops45751.2022.9812955","url":null,"abstract":"Complex plasma systems form monolayer dust crystal structures by balancing electric and gravitational forces to precisely levitate particles of the same size and mass. Ion wake fields are the source of nonreciprocal vertical force interactions which can form torsions in such a system. Torsions are a non-Hamiltonian feature, consisting of two dust particles which vertically leave the plane of the crystal and begin to oscillate horizontally within a force cage formed by the remaining lattice of the crystal. Torsions provide an excellent means for studying the energy transfer mechanism of ion wakefields. Many questions remain about what effects lead to the development of torsions and whether there is a pattern to torsion placement within the crystal. An important next step is to determine whether the presence of a single torsion increases or decreases the ease of subsequent torsion formation nearby in the lattice. Employing a modified GEC rf reference cell with a much larger electrode than previously studied we have formed torsions using various sizes of electrodes and dust crystals. In this talk we will explore the data collected from this system to answer this question.","PeriodicalId":175964,"journal":{"name":"2022 IEEE International Conference on Plasma Science (ICOPS)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130404654","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Alpha Particle Behavior in Shear Flow Stabilized Z Pinches 剪切流稳定Z束中的α粒子行为

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/ICOPS45751.2022.9813296

P. Stoltz, E. Meier, I. Datta, M. Quinley, B. Levitt, U. Shumlak

引用次数: 0

Continuous Disinfection of Airborne Pathogens Using Far UV-C KRCL* Microplasma Lamp for Personal Protection 远紫外- c KRCL*微等离子体灯对空气病原体的持续消毒

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/icops45751.2022.9813323

S. Park

引用次数: 0

Vlasov Simulation with Farsight Vlasov模拟与远见

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/ICOPS45751.2022.9813337

R. Sandberg, R. Krasny, A. Thomas

引用次数: 0

Laser-Induced Fluorescence Measurement of Water Vapor and OH Density Distributions Near Droplets in a Plasma 等离子体液滴附近水蒸汽和氢氧根密度分布的激光诱导荧光测量

2022 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2022-05-22 DOI: 10.1109/icops45751.2022.9813142

J. Wang, G. Nayak, P. Bruggeman

{"title":"Laser-Induced Fluorescence Measurement of Water Vapor and OH Density Distributions Near Droplets in a Plasma","authors":"J. Wang, G. Nayak, P. Bruggeman","doi":"10.1109/icops45751.2022.9813142","DOIUrl":"https://doi.org/10.1109/icops45751.2022.9813142","url":null,"abstract":"Atmospheric pressure plasma treatment of water has great potential for the decomposition of hazardous materials and wastewater treatment. The use of droplets enables a significant increase in decomposition efficiency due to the large surface to volume ratio compared to bulk liquid 1 . The OH radicals are key enablers of water treatment and their transport from the gas phase to the liquid can be the limiting factor in conversion for low OH radical densities. The OH production in plasmas containing droplets is, however, complicated by droplet evaporation leading to possibly strong gradients in both water vapor and OH radical densities around the droplet in the plasma. In this contribution, we report on measurements of the water vapor and OH distributions near the droplet in an atmospheric pressure diffuse RF glow plasma in helium by laser induced fluorescence. Water vapor concentrations as high as 10 4 ppm were found near the droplet and a strong correlation with the droplet residence time in the plasma was found. The corresponding OH densities near the droplet were found to be in the range of 5×10 13 cm -3 and 2×10 15 cm -3 . This density spans concentrations that suggest transitioning from a flux limited decomposition in the droplet to a solution phase diffusion limited regime which will be discussed in detail.","PeriodicalId":175964,"journal":{"name":"2022 IEEE International Conference on Plasma Science (ICOPS)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121195763","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0