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Journal of The Korean Institute of Electrical and Electronic Material Engineers最新文献

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Process Development for Enhancement of High Temperature Thermoelectric Properties in a p-Type Skutterudite 提高p型方钨矿高温热电性能的工艺开发
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.6.495
Peng Liu, C. Nou, Soon-Mok Choi
{"title":"Process Development for Enhancement of High Temperature Thermoelectric Properties in a p-Type Skutterudite","authors":"Peng Liu, C. Nou, Soon-Mok Choi","doi":"10.4313/JKEM.2020.33.6.495","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.6.495","url":null,"abstract":"","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86793213","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Room Temperature Na/S Batteries Using a Thick Film of Na β ″-Alumina Composite Electrolyte and Gel-Type Sulfur Cathode 使用厚膜Na β″-氧化铝复合电解质和凝胶型硫阴极的室温Na/S电池
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.5.411
Jinsil Lee, Hakgyoon Yu, Younki Lee, Jae‐Kwang Kim, JongHoonJoo
{"title":"Room Temperature Na/S Batteries Using a Thick Film of Na β ″-Alumina Composite Electrolyte and Gel-Type Sulfur Cathode","authors":"Jinsil Lee, Hakgyoon Yu, Younki Lee, Jae‐Kwang Kim, JongHoonJoo","doi":"10.4313/JKEM.2020.33.5.411","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.5.411","url":null,"abstract":"","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77426906","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Surface Performance of Housing Materials and Profiles in AC Tracking Wheel Tests 交流履带轮试验中外壳材料和型材的表面性能
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.2.135
Seung-Hyun Kim, Y. Noh, Jong-Hun Cheong, Han-Goo Cho
{"title":"Surface Performance of Housing Materials and Profiles in AC Tracking Wheel Tests","authors":"Seung-Hyun Kim, Y. Noh, Jong-Hun Cheong, Han-Goo Cho","doi":"10.4313/JKEM.2020.33.2.135","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.2.135","url":null,"abstract":"","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80882627","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electrocaloric Effect in Heterolayered K(Ta,Nb)O 3 /Pb(Zr,Ti)O 3 Thin Films Fabricated by Spin-Coating Method 旋涂法制备K(Ta,Nb) o3 /Pb(Zr,Ti) o3薄膜的热效应
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.6.465
YoungJun Yang, J. Yuk, Jiwon Kim, Yi Sam-Haeng, J. Park, Young-Gon Kim, Lee Sung‐Gap
{"title":"Electrocaloric Effect in Heterolayered K(Ta,Nb)O 3 /Pb(Zr,Ti)O 3 Thin Films Fabricated by Spin-Coating Method","authors":"YoungJun Yang, J. Yuk, Jiwon Kim, Yi Sam-Haeng, J. Park, Young-Gon Kim, Lee Sung‐Gap","doi":"10.4313/JKEM.2020.33.6.465","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.6.465","url":null,"abstract":"","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88640741","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Luminescent Properties and Anti-Counterfeiting Applications of SrWO4:RE3+ (RE＝Dy, Sm, Dy/Sm) Phosphors Doped with Several Activator Ions 几种活化离子掺杂SrWO4:RE3+ (RE=Dy, Sm, Dy/Sm)荧光粉的发光性能及防伪应用
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.5.393
So-Jin Yoon, Cho, Shinho
{"title":"Luminescent Properties and Anti-Counterfeiting Applications of SrWO4:RE3+ (RE＝Dy, Sm, Dy/Sm) Phosphors Doped with Several Activator Ions","authors":"So-Jin Yoon, Cho, Shinho","doi":"10.4313/JKEM.2020.33.5.393","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.5.393","url":null,"abstract":"","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88770803","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Statistical Analysis to the VLF Tanδ Criteria for Aging Diagnosis in Power Cables 电力电缆VLF Tanδ老化诊断标准的统计分析
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.1.1
Woosung Jung, Seong Min Kim, Lim, Jangseob, Jin Lee
{"title":"A Statistical Analysis to the VLF Tanδ Criteria for Aging Diagnosis in Power Cables","authors":"Woosung Jung, Seong Min Kim, Lim, Jangseob, Jin Lee","doi":"10.4313/JKEM.2020.33.1.1","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.1.1","url":null,"abstract":"In this study, the objective is to improve the criteria used for statistical comparison of the VLF tanδ (TD) database and failure rate according to water-tree degradation in underground distribution power cables. The aging condition of the KEPCO criteria is divided into 6 levels using the Weibull distribution, and the “failure imminent” condition is quantified by using the statistical end-point of the lifetime parameter of the VLF big-data group obtained from KEPCO. Moreover, new criteria with a 2-dimensional combination of TD, DTD, and a statistical normalized factor are suggested. These criteria exhibit high reproducibility for the detection of cables in an imminent failure state. Consequently, it is expected that the adoption of the extended VLF-2019 criteria will reduce the asset management cost of cable replacement compared to the VLF-2012 criteria of KEPCO.","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88699889","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis of the Output Characteristics of IGZO TFT with Double Gate Structure 双栅结构IGZO TFT输出特性分析
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.4.281
Ji Won Kim, Kee-Woo Park, Kim, Yongsang, J. Jeon
{"title":"Analysis of the Output Characteristics of IGZO TFT with Double Gate Structure","authors":"Ji Won Kim, Kee-Woo Park, Kim, Yongsang, J. Jeon","doi":"10.4313/JKEM.2020.33.4.281","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.4.281","url":null,"abstract":"","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77739190","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Study of Electrical and Structural Performance of Aluminum Thin Film Deposited by Sputtering Method 溅射法沉积铝薄膜的电学和结构性能研究
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.2.114
Doyoung Kim
{"title":"The Study of Electrical and Structural Performance of Aluminum Thin Film Deposited by Sputtering Method","authors":"Doyoung Kim","doi":"10.4313/JKEM.2020.33.2.114","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.2.114","url":null,"abstract":"In this study, we performed the deposition of Al thin film using a DC magnetron sputtering method. To evaluate electrical and structural properties, the growth conditions were changed in terms of two functions, namely, sputtering power ranging from 41.6 to 216 W and film growth rate ranging from 5.35 to 26.39 nm/min. The growth rate and the microstructure were characterized by a scanning electron microscopy and X-ray diffraction analysis. The plane of crystalline growth showed that the preferential (111) direction and defects due to the grain boundary increased with DC power. The resistivity of the Al film over 50 nm showed a constant value by horizontal grain growth. Our results can be applicable for the preparation of nano-templates for anodic aluminum oxide.","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77269629","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Characteristics of Ga2O3/4H-SiC Heterojunction Diode with Annealing Process 退火工艺制备Ga2O3/4H-SiC异质结二极管的特性
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.2.155
Young-Jae Lee, Koo, Sang-Mo
{"title":"Characteristics of Ga2O3/4H-SiC Heterojunction Diode with Annealing Process","authors":"Young-Jae Lee, Koo, Sang-Mo","doi":"10.4313/JKEM.2020.33.2.155","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.2.155","url":null,"abstract":"","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76129506","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Study on the Fabrication of Multi-Walled Nanotubes (MWCNT) Based Thin Film and Chemical Sensor Operation Characteristics 基于多壁纳米管(MWCNT)薄膜的制备及化学传感器工作特性研究
Journal of The Korean Institute of Electrical and Electronic Material Engineers Pub Date : 2020-01-01 DOI: 10.4313/JKEM.2020.33.3.181
Jaeha Noh, Junseck Choi, Dongwan Ko, J. Seo, Lee Sang Tae, Jung Jung‐Yeul, Jiho Chang
{"title":"A Study on the Fabrication of Multi-Walled Nanotubes (MWCNT) Based Thin Film and Chemical Sensor Operation Characteristics","authors":"Jaeha Noh, Junseck Choi, Dongwan Ko, J. Seo, Lee Sang Tae, Jung Jung‐Yeul, Jiho Chang","doi":"10.4313/JKEM.2020.33.3.181","DOIUrl":"https://doi.org/10.4313/JKEM.2020.33.3.181","url":null,"abstract":"","PeriodicalId":17325,"journal":{"name":"Journal of The Korean Institute of Electrical and Electronic Material Engineers","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76934163","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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