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Critical thickness of epitaxial thin films using Finite Element Method 用有限元法计算外延薄膜的临界厚度
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714177
T. Wcislo, M. Dąbrowska-szata, L. Gelczuk
{"title":"Critical thickness of epitaxial thin films using Finite Element Method","authors":"T. Wcislo, M. Dąbrowska-szata, L. Gelczuk","doi":"10.1109/STYSW.2010.5714177","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714177","url":null,"abstract":"In the paper, finite element methodology applied to critical thickness calculation has been presented. Semiconductor heterostructures have been applied to many electronic and optoelectronic devices. The performance and properties of epitaxial semiconductor thin film depend on the defects structure and stress-state of the film. During epitaxial growth first few layers are coherent with a substrate crystalline structure. As film thickness increases, growing stress causes nucleation of dislocations. This partially relaxes the strain due to lattice mismatch. A thickness at which this occurs is defined as a critical thickness. Calculation of critical thickness for the nucleation has been a subject of considerable study since the pioneering work of Frank and Van der Merve. Finite Element Method (FEM) is used to simulate the strained epitaxial layer and the substrate. Finally, approach to calculate the critical thickness on the basis of energy balance approach is presented.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128436703","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fullerene based materials for ultra-low-k application 超低k应用的富勒烯基材料
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714165
K. Broczkowska, Jolanta Klocek, D. Friedrich, K. Henkel, K. Kolanek, A. Urbanowicz, D. Schmeißer, Mirosław Miller, E. Zschech
{"title":"Fullerene based materials for ultra-low-k application","authors":"K. Broczkowska, Jolanta Klocek, D. Friedrich, K. Henkel, K. Kolanek, A. Urbanowicz, D. Schmeißer, Mirosław Miller, E. Zschech","doi":"10.1109/STYSW.2010.5714165","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714165","url":null,"abstract":"Fullerene-based materials are considered to be a candidate for ultra-low-k material applications. We have incorporated fullerene C60 into a siloxane material by means of the sol-gel method. Thickness of obtained film was investigated by atomic force microscope, dielectric constant was measured by the capacitance-voltage characterization (CV). Interactions between the components within the films were investigated by using X-ray photoelectron spectroscopy and near edge X-ray absorption fine structure spectroscopy. We found that the ratio of carbon, oxygen and silicon atoms within obtained film equals 2.7∶1.9∶1. The microscopic and CV investigations show that the sample's composition is inhomogenous although the fullerene's concentration within the material is low. However, dielectric constant is in the range of 2.3 to 2.5.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"81 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130638399","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Hardness of nanocrystalline TiO2 thin films doped with terbium 掺铽纳米TiO2薄膜的硬度
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714178
D. Wojcieszak, D. Kaczmarek, J. Domaradzki, E. Prociów, F. Placido, S. Lapp, M. Mazur
{"title":"Hardness of nanocrystalline TiO2 thin films doped with terbium","authors":"D. Wojcieszak, D. Kaczmarek, J. Domaradzki, E. Prociów, F. Placido, S. Lapp, M. Mazur","doi":"10.1109/STYSW.2010.5714178","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714178","url":null,"abstract":"In this work influence of terbium dopant on hardness of nanocrystalline TiO2 thin films have been investigated. Thin films were manufactured by high energy reactive magnetron sputtering process. The structure of TiO2-matrix was modified by doping with 0.4 at. % of Tb. Undoped matrix had directly after deposition TiO2-rutile structure with 8.7 nm crystallites in size, while doping with Tb results in anatase structure with 11.7 nm crystallite sizes. Hardness of undoped nanocrystalline matrix was 14.3 GPa, which is two-times higher as-compared to standard TiO2 coatings. Incorporation of terbium into the matrix results in hardness decrease down to 10.7 GPa, what was directly connected with smaller density of the anatase as-compared to rutile structure.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"303 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124327179","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Synthesis of zinc oxide nanospheres 氧化锌纳米球的合成
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714157
H. Tetrycz, M. Byrczek, O. Rac
{"title":"Synthesis of zinc oxide nanospheres","authors":"H. Tetrycz, M. Byrczek, O. Rac","doi":"10.1109/STYSW.2010.5714157","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714157","url":null,"abstract":"We present a method for the synthesis of monodispersive ZnO colloidal spheres. The colloidal spheres are made from the solution of zinc acetate and polyethylene glycol (PEG) in the temperature 135°C. The obtained structures were investigated with scanning electron microscope (SEM) and transmission electron microscope. The structures received in the process are spheres with diameter 300 nm-1 µm. ZnO nanospheres have plenty of possibilities of application, for example in gas sensors or as a self-assembled material in photonic crystals.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"120 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122408572","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A short introduction of the POF usability lab at Harz University 简要介绍哈茨大学的POF可用性实验室
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714164
Ulrich Fischer-Hirchert, Jens-Uwe Just, C. Reinboth
{"title":"A short introduction of the POF usability lab at Harz University","authors":"Ulrich Fischer-Hirchert, Jens-Uwe Just, C. Reinboth","doi":"10.1109/STYSW.2010.5714164","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714164","url":null,"abstract":"Polymer optical fibers (POF) can be used for a large number of applications, most notably for data transmission. Although POF are used for a lot of medical as well as scientific applications, the technology is - as of yet - almost unknown to the contemporary consumer market.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"06 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131055823","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of antistatic properties of spectacle lenses with antireflective coatings 抗反射涂层眼镜镜片的抗静电性能研究
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714169
M. Mazur, J. Domaradzki, D. Kaczmarek, K. Sieradzka, Jolanta Huk, Marta Karnicka, Lukasz Bielinski
{"title":"Investigation of antistatic properties of spectacle lenses with antireflective coatings","authors":"M. Mazur, J. Domaradzki, D. Kaczmarek, K. Sieradzka, Jolanta Huk, Marta Karnicka, Lukasz Bielinski","doi":"10.1109/STYSW.2010.5714169","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714169","url":null,"abstract":"Static electricity arises when two materials in contact are separated after rubbing and the speed of charge movement on surface is slow. Retained electrostatic charge on the surface of materials can create risks and problems in many areas of industry, for example films and light fabrics cling can attract airborne dust or semiconductor devices may be damaged. Therefore electrostatic dissipative and antistatic additives are used in many applications to avoid risks from static electricity. In case of optical lenses antistatic coatings can be used to avoid accumulation of static charge on their surfaces. Quantity of the charge deposited on samples surface and how quickly deposited charge migrated away from the surface was measured using fast response electrostatic fieldmeter. In this work the antistatic properties of optical lenses coated with different antireflective coatings were investigated and their ability to dissipate static electricity was determined. Static dissipation properties were investigated in relation to corona discharge time changes. It has been shown that increasing corona discharge time affected badly on charge decay time of optical lenses.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129635412","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of droplet size and surface preparation of TiO2 on contact angle determination 二氧化钛液滴尺寸和表面制备对接触角测定的影响
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714179
M. Maciejewski, D. Wojcieszak, M. Mazur, M. Zielinski, D. Kaczmarek, J. Domaradzki, E. Prociów
{"title":"Influence of droplet size and surface preparation of TiO2 on contact angle determination","authors":"M. Maciejewski, D. Wojcieszak, M. Mazur, M. Zielinski, D. Kaczmarek, J. Domaradzki, E. Prociów","doi":"10.1109/STYSW.2010.5714179","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714179","url":null,"abstract":"Nowadays, much attention is paid to thin films surface wettability parameter. Hydrophobic coatings are well used for water repellant materials, while hydrophilic thin films are often used in anti-fogging applications. Titanium dioxide is one of the best materials for thin film coatings applications, due to its electrical, optical, chemical and physical properties such as photocatalysis, high transparency in visible light or high hardness. In this paper, surface wettability of TiO2 thin films was researched. Influence of droplet size and sample preparation method on calculation of contact angle was investigated. It was concluded, that pre- measurement sample handling as well as measurement procedure had huge impact on obtained results.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128660989","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Effect of acidic environment on the shape and size of the 1D nano-and microstructures of zinc oxide 酸性环境对氧化锌一维纳米微结构形状和尺寸的影响
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714167
M. Fiedot, H. Teterycz, P. Halek, M. Malewicz
{"title":"Effect of acidic environment on the shape and size of the 1D nano-and microstructures of zinc oxide","authors":"M. Fiedot, H. Teterycz, P. Halek, M. Malewicz","doi":"10.1109/STYSW.2010.5714167","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714167","url":null,"abstract":"In this paper we presented influence of acidity on nanopowder structure prepared in reaction of precipitation. Zinc oxide was prepared from zinc nitrate and sodium hydroxide with the participation of the microwave field. The investigation revealed that the grain size of zinc oxide and their microstructure significantly depends on the solution pH. The microstructures obtained in the more alkaline reaction conditions have greater the aspect ratio.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128230114","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Application of AFM microscope as a nanolithography tool 原子力显微镜作为纳米光刻工具的应用
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714172
M. Ramiączek-Krasowska, J. Prażmowska, A. Szyszka, R. Paszkiewicz, M. Tlaczala
{"title":"Application of AFM microscope as a nanolithography tool","authors":"M. Ramiączek-Krasowska, J. Prażmowska, A. Szyszka, R. Paszkiewicz, M. Tlaczala","doi":"10.1109/STYSW.2010.5714172","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714172","url":null,"abstract":"The lithography as a basic process determines properties of microelectronic device. The main area of investigation is the resolution of the lithography operation. The resolution of optical lithography is insufficient for creation of gate electrodes in dedicated to high frequency operation transistors. The scaling ability causes increased interest in using of atomic force microscope (AFM) as nanolithography tool. In the paper, the results of the nanoscratching lithography by using AFM are presented. In this method a pattern is created in mechanical interaction of the AFM tip and the samples surface.","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127813910","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Sheet resistance and optical properties of ITO thin films deposited by magnetron sputtering with different O2/Ar flow ratio 不同O2/Ar流量比下磁控溅射ITO薄膜的片电阻和光学性能
2010 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2010-06-25 DOI: 10.1109/STYSW.2010.5714168
M. Mazur, J. Domaradzki, D. Kaczmarek, S. Moh, F. Placido
{"title":"Sheet resistance and optical properties of ITO thin films deposited by magnetron sputtering with different O2/Ar flow ratio","authors":"M. Mazur, J. Domaradzki, D. Kaczmarek, S. Moh, F. Placido","doi":"10.1109/STYSW.2010.5714168","DOIUrl":"https://doi.org/10.1109/STYSW.2010.5714168","url":null,"abstract":"Transparent conducting indium-tin oxide (ITO) thin films play a very important role in the field of optoelectronic devices such as photovoltaic cells and flat panel display devices. ITO films display low electrical resistance and high transmittance in the visible range of the optical spectrum [1].","PeriodicalId":160376,"journal":{"name":"2010 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125625161","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
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