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2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)最新文献

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Breath figure patterns prepared by spraying ultrasonic atomized water droplets 喷雾超声雾化水滴制备呼吸图形
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758275
Pengfei Zhang, Huawei Chen, Liwen Zhang, Tong Ran, Deyuan Zhang
{"title":"Breath figure patterns prepared by spraying ultrasonic atomized water droplets","authors":"Pengfei Zhang, Huawei Chen, Liwen Zhang, Tong Ran, Deyuan Zhang","doi":"10.1109/NEMS.2016.7758275","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758275","url":null,"abstract":"Honeycomb-structured porous films have widely potential applications in chemical sensors, tissue engineering, micro reactors, catalysis and so forth. An enhanced breath figure method with spraying ultrasonic atomized water droplets replacing the water vapor in humidity is proposed to fabricate multi-level and large-area breath figure patterns (BFPs). Well-defined polyphenylene oxide honeycomb films were prepared at a proper spraying time. The pore size and the regularity of the hexagonal arrays could be regulated by changing solution concentration. Especially, honeycomb films with two-level pores were fabricated by spraying atomized water droplets two times. Moreover, large-area BFPs with film area larger than 100 cm2 could be formed on the glass substrate. The large-area BFPs formation capability of the enhanced BFM in this work give new insight into more widely application in surface engineering. For example, slippery surfaces were prepared using the large-area BFPs as the holding structures. And the prepared slippery surfaces showed extremely low critical sliding angles for water, and also demonstrated efficient self-cleaning property.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124861521","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Development of optically controlled field emitter array with integrated gate electrode 集成栅电极光控场发射阵列的研制
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758188
Toya Kera, N. Umeda, K. Iwami
{"title":"Development of optically controlled field emitter array with integrated gate electrode","authors":"Toya Kera, N. Umeda, K. Iwami","doi":"10.1109/NEMS.2016.7758188","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758188","url":null,"abstract":"A field emitter array (FEA) with integrated gate electrode was fabricated on a transparent substrate for optical emission control. An array consisting of about 30000 emitters is arranged in a 3-mm-diameter area on a quartz-glass substrate. I-V characteristics were measured and electron emission regime was confirmed as field emission from Fowler-Nordheim analysis. Emission current was enhanced with laser irradiation at the wavelength of 532 nm, and the threshold voltage for field emission was reduced by 43 %. The maximum current enhancement factor was 4.3×106. The result obtained from this study is expected to be applied for optically-controlled field emitter array and future high throughput electron beam lithography.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116018545","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Research of periodic amorphous carbon composite films for MEMS IR source fabricated by magnetron sputtering 磁控溅射制备MEMS红外源周期性非晶碳复合薄膜的研究
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758269
A. Ming, Weibing Liu, Lingling Li, Xilong Sun, Xu Zheng, Weibing Wang, Qiu-lin Tan, J. Xiong, Dapeng Chen
{"title":"Research of periodic amorphous carbon composite films for MEMS IR source fabricated by magnetron sputtering","authors":"A. Ming, Weibing Liu, Lingling Li, Xilong Sun, Xu Zheng, Weibing Wang, Qiu-lin Tan, J. Xiong, Dapeng Chen","doi":"10.1109/NEMS.2016.7758269","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758269","url":null,"abstract":"In this work, we present a newly titanium-contained periodic amorphous carbon(a-C) composite films by magnetron sputtering process on silicon (100) substrate which has lower intrinsic compressive stress that can be used in electrical modulation pulsed MEMS infrared(IR) source for NDIR gas sensors. The fabrication process, results, performance and results analysis are then carried out.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122487964","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Fabrication of through silicon via with highly phosphorus-doped polycrystalline Si plugs for driving an active-matrix nanocrystalline Si electron emitter array 高掺磷多晶硅插头驱动有源矩阵纳米晶硅电子发射器阵列的通孔制造
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758318
N. Ikegami, Takashi Yoshida, A. Kojima, H. Miyaguchi, M. Muroyama, S. Yoshida, K. Totsu, N. Koshida, M. Esashi
{"title":"Fabrication of through silicon via with highly phosphorus-doped polycrystalline Si plugs for driving an active-matrix nanocrystalline Si electron emitter array","authors":"N. Ikegami, Takashi Yoshida, A. Kojima, H. Miyaguchi, M. Muroyama, S. Yoshida, K. Totsu, N. Koshida, M. Esashi","doi":"10.1109/NEMS.2016.7758318","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758318","url":null,"abstract":"Present advanced-process for the fabrication of through silicon via (TSV) with highly phosphorus-doped n++-polycrystalline Si plugs for driving an active-matrix nanocrystalline Si (nc-Si) electron emitter array was described. The resistance per one TSV was measured to be 150 Ω, and voltage drop at the TSV plug in a normal driving operation was sufficiently small to apply the diode current to the nc-Si layer. Electrons could be effectively injected into the nc-Si layer from the back-side n++-poly-Si through the TSV plugs, and were quasi-ballistically emitted through the surface Ti/Au electrode.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128333106","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enriched semiconducting single wall nanotubes as back contact for CdTe solar cell 富半导体单壁纳米管作为CdTe太阳能电池的背触点
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758210
Bin Li, Hang Zhou, Hui Li, Xiangxin Liu
{"title":"Enriched semiconducting single wall nanotubes as back contact for CdTe solar cell","authors":"Bin Li, Hang Zhou, Hui Li, Xiangxin Liu","doi":"10.1109/NEMS.2016.7758210","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758210","url":null,"abstract":"For CdS/CdTe solar cells with conventional Cu doped CdTe at the back contact, the diffusion of copper into CdS window layer is detrimental to the solar cell performance. In order to obviate this problem, single wall carbon nanotube thin films with enriched semiconducting ratio (95% S-SWNT) are applied to the CdS/CdTe device and their suitability as back contact materials are studied. We achieve solar cells with power conversion efficiency (PCE) of ~9.71% device using SWNT/Au back contact. Furthermore, the device with SWNT/Au electrode shows higher thermal stability when compared to devices with Cu/Au electrodes.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128674665","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Plasma half dicing based on micro-loading effect for ultra-thin LiNbO3 plate wave devices on Si substrate 基于微加载效应的硅衬底超薄LiNbO3板波器件等离子体半切
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758224
Y. Yunoki, M. Kadota, M. Moriyama, Shuji Tanaka
{"title":"Plasma half dicing based on micro-loading effect for ultra-thin LiNbO3 plate wave devices on Si substrate","authors":"Y. Yunoki, M. Kadota, M. Moriyama, Shuji Tanaka","doi":"10.1109/NEMS.2016.7758224","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758224","url":null,"abstract":"Ultra-wide band ladder filters with bandwidth of 41 to 51%, which fully cover the digital TV band, were fabricated using 0-th shear horizontal (SH0) mode plate wave in a (0°, 117.5-120°, 0°) LiNbO3 (LN) ultra-thin plate. A LN/cavity/Si wafer with a number of devices must be separated into chips as they can be mounted on a printed circuit board (PCB). When the wafer is separated using a dicing machine, the wafer must be protected from strong water showers because the LN ultra-thin plate of 0.5 to 0.6 μm thickness on a cavity is fragile. In this study, the authors developed a new separating (plasma half dicing) method using the micro-loading effect instead of the conventional blade dicing. This method enjoys the advantages of dry process, and no additional etching is needed, because the half dicing grooves are fabricated simultaneously with the device cavities. A chip filter mounted on a PCB after separation shows a good frequency characteristic similar to the one measured using a prober system before separation.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123920636","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Parallel actuation and independent addressing of many bubble microrobots 许多气泡微型机器人的并行驱动和独立寻址
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758250
M. A. Rahman, Julian Cheng, A. Ohta
{"title":"Parallel actuation and independent addressing of many bubble microrobots","authors":"M. A. Rahman, Julian Cheng, A. Ohta","doi":"10.1109/NEMS.2016.7758250","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758250","url":null,"abstract":"Twenty-four bubble microrobots were opto-thermally actuated in parallel. The bubble microrobots were independently controlled by a computer-generated holographic (CGH) control system. This work demonstrates the actuation of many microrobots that are capable of performing an assigned task such as micro-assembly with increased throughput. To the best knowledge of the authors, these are the most microrobots independently actuated in parallel to date.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123640500","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Robust multi-parameter sensing probe for water monitoring based on ALD-coated metallic micro-patterns 基于ald涂层金属微图的水监测鲁棒多参数传感探头
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758263
Ferdous Shaun, Massimo Pellegrino, W. Cesar, F. Marty, Zhifei Xu, M. Capo-Chichi, P. Basset, B. Lebental, T. Bourouina
{"title":"Robust multi-parameter sensing probe for water monitoring based on ALD-coated metallic micro-patterns","authors":"Ferdous Shaun, Massimo Pellegrino, W. Cesar, F. Marty, Zhifei Xu, M. Capo-Chichi, P. Basset, B. Lebental, T. Bourouina","doi":"10.1109/NEMS.2016.7758263","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758263","url":null,"abstract":"We report on a multi-sensing probe for water network monitoring enabling simultaneous measurements of water electrical conductivity, flow-rate and temperature. A very simple fabrication process is used where all physical sensors are obtained only from micro-patterning of glass, combining platinum, gold. Further coating using Atomic Layer Deposition (ALD) is achieved for the purpose of reducing both electro-erosion and biofouling, while keeping the sensor's electrical and thermal functionalities. This is critical for long-term reliability of sensors immersed in water. The lateral size of each sensing elements does not exceed a few 100μm. This small footprint allowed implementing a redundancy strategy on the chip, not only for reliability purposes but also to accommodate for different measurement ranges based on scalable designs.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130754358","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Rapid thermal annealing for carbon nanotube thin film transistors by a double-themral-region furnace 碳纳米管薄膜晶体管的双热区炉快速热退火
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758310
Chun Chen, Yanyan Deng, Peijian He, M. Zhang
{"title":"Rapid thermal annealing for carbon nanotube thin film transistors by a double-themral-region furnace","authors":"Chun Chen, Yanyan Deng, Peijian He, M. Zhang","doi":"10.1109/NEMS.2016.7758310","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758310","url":null,"abstract":"Determination of the annealing condition has always been critical and challenging for performance improvement of the carbon-based devices. In this paper, rapid thermal annealing (RTA) in hydrogen followed by rapid cooling down with a double-thermal-region movable furnace for carbon nanotube thin film transistors (CNT-TFTs) has been proved to be an effective method to improve device performance. After the post-treatment by RTA and rapid cooling down, off current of CNT-TFTs was reduced by 10-100 times, on/off current ratio was increased by almost 10 times, and mobility was increased by about 66%. It turns out that RTA treatment under 700 °C for 60 seconds resulted in the most significant improvement for CNT-TFT performance.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131068324","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Lamb wave resonators and resonator filters in periodical poled Z-cut LiTaO3 plate 周期性极化z切LiTaO3板的Lamb波谐振器和谐振器滤波器
2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Pub Date : 2016-04-01 DOI: 10.1109/NEMS.2016.7758302
M. Kadota, T. Ogami, Kansho Yamamoto, Yasuo Cho, Shuji Tanaka
{"title":"Lamb wave resonators and resonator filters in periodical poled Z-cut LiTaO3 plate","authors":"M. Kadota, T. Ogami, Kansho Yamamoto, Yasuo Cho, Shuji Tanaka","doi":"10.1109/NEMS.2016.7758302","DOIUrl":"https://doi.org/10.1109/NEMS.2016.7758302","url":null,"abstract":"An electric field distribution in a top electrode plane/periodical poled (PP) plate/bottom electrode plane looks like a cross-field model (by Smith) of an interdigital transducer (IDT) to generate a surface acoustic wave (SAW). Therefore, this structure has the possibility to generate an acoustic wave. This structure generates a SAW when the plate is thick, and a plate wave when the plate is thin. Although SAW resonators and resonator filters require grating reflectors at both sides of the IDT, previously reported devices composed of PP-plate on thick substrate don't include any grating reflectors, because they don't have electrode fingers. Therefore, their frequency responses are very weak. Proposing and applying effective edge reflections on the PP-plate instead of grating reflectors, authors fabricated Lamb wave resonators and resonator filters in PP Z-LiTaO3 plates. As a result, resonators with impedance ratio of 34 dB and resonator filters with a low loss of 2.4 dB and 3 dB bandwidth of 2.2% were obtained.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"328 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127653470","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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