2017 IEEE International Conference on Plasma Science (ICOPS)最新文献_第3页

TWT Support Road Coating by MPCVD 用MPCVD制造的行波管支撑路面涂层

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-21 DOI: 10.1109/PLASMA.2017.8496187

F. Bozduman, Necati Haytural, A. Gulec, O. N. Asan, L. Oksuz

引用次数: 0

Extending the volume and processing area of atmospheric pressure plasma jets 扩大了大气压等离子体射流的体积和处理范围

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-02 DOI: 10.1109/PLASMA.2017.8496050

S. Walton, E. Gillman, D. Boris, M. Helle, S. Hernández, T. Petrova, G. Petrov

{"title":"Extending the volume and processing area of atmospheric pressure plasma jets","authors":"S. Walton, E. Gillman, D. Boris, M. Helle, S. Hernández, T. Petrova, G. Petrov","doi":"10.1109/PLASMA.2017.8496050","DOIUrl":"https://doi.org/10.1109/PLASMA.2017.8496050","url":null,"abstract":"Atmospheric pressure plasmas have certain advantage in materials synthesis and processing that are not available with other approaches including low-pressure plasmas. In particular, the breadth of reactions afforded by non-equilibrium, low temperature plasmas is unique; plasmas produced in full density air allows one to extend the application space to systems and materials that are not vacuum compatible. Non-equilibrium, atmospheric pressure plasma jet devices are well-suited for such applications given their relatively simple design and modest power requirements. However, their size tends to limit their utility to small scale processes and treatments. In this work, we describe approaches to extend the volume of non-equilibrium, atmospheric pressure plasma jets and thus, surface area that can be treated. In particular, we consider geometric and gas flow solutions to increase volume. We use high-speed cameras, optical emission spectroscopy (OES), current and voltage measurements, and simulations to characterize the results and understand the potential for and/or limitations to scale-up. This work is supported by the Naval Research Laboratory base program.","PeriodicalId":145705,"journal":{"name":"2017 IEEE International Conference on Plasma Science (ICOPS)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-05-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122859863","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Disinfection Of Reverse Osmosis Water By Atmospheric Plasma Rich In Oh Radical 富Oh自由基常压等离子体对反渗透水的消毒

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/plasma.2017.8496093

A. Dória, Gislene S. Liberato, F. R. Figueira, C. A. Carvalho, J. B. S. Lima, R. Pessoa, S. Khouri

{"title":"Disinfection Of Reverse Osmosis Water By Atmospheric Plasma Rich In Oh Radical","authors":"A. Dória, Gislene S. Liberato, F. R. Figueira, C. A. Carvalho, J. B. S. Lima, R. Pessoa, S. Khouri","doi":"10.1109/plasma.2017.8496093","DOIUrl":"https://doi.org/10.1109/plasma.2017.8496093","url":null,"abstract":"Reverse osmosis water is one of the main components of hemodialysis treatment and its chemical and microbiological qualities are vital to avoid additional risks to the patient. A study conducted in the United States between 2009-2011 showed a mortality rate of patients in the first 180 days of dialysis, due to infections, of around 9.6% 1. The technology of non-thermal plasmas, operated under atmospheric pressure, is gaining a potential approach in the eradication and control of bacterial and fungal contamination 2. The aim of this work is to evaluate the efficiency of different atmospheric plasma jet on the disinfection of reverse osmosis water contaminated with standard strains ATCC (American Type Culture Collection) of Escherichia coli(10798), Proteus Mirabilis(35659) and Klebsiella pneumoniae(31488). In the methodology, were prepared bacterial inoculums with reverse osmosis water on the 0.5 of Mac Farland scale. The samples were divided into three groups: (A) control; (B) treated with 5L / min plasma of Argon and water vapor; (C) treated with 5L / min plasma of Argon and hydrogen peroxide. Treatments were performed in triplicate for 10 minutes and at a distance of 1 cm between the nozzle and the liquid surface. A gliding arc discharge reactor was used to generate the plasma jet. For the analysis of the plasma, we used the optical emission spectroscopy (OES) technique, in order to characterize its chemistry. The two plasma compositions used were efficient in the disinfection of the reverse osmosis water contaminated with the different microorganisms, reaching 99.9% reduction of CFU / mL. OES spectra show an increase of 2 orders of magnitude in the OH intensity.","PeriodicalId":145705,"journal":{"name":"2017 IEEE International Conference on Plasma Science (ICOPS)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123067366","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Species Dynamics In Prompt Cyclical Hydrogen Discharges 快速循环氢放电中的物种动力学

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/plasma.2017.8496195

R. Terry

引用次数: 0

Rayleigh Microwave Scattering for Diagnostics of Atmospheric-Pressure Microplasmas* 瑞利微波散射在大气压微等离子体诊断中的应用*

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496026

A. Shashurin

引用次数: 0

Kinetic simulation of breakdown time variation for gaps filled with dielectric particles 介电粒子填充间隙击穿时间变化的动力学模拟

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496186

C. Moore, A. Fierro, R. Jorgenson, H. Hjalmarson, A. Jindal, M. Hopkins, P. Clem, L. Biedermann

引用次数: 0

A study on the effect of atmospheric-pressure plasma treatment on the hydrophilicity of polyamide-imide fabric mats * 常压等离子体处理对聚酰胺-亚胺织物垫材亲水性影响的研究*

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/plasma.2017.8496276

H. Cho, K. Rhee

引用次数: 0

Thermo- And Photo-Oxidation In A Liquid Treatment System Using Submerged Plasma 浸没等离子体液体处理系统中的热和光氧化

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/plasma.2017.8496252

D. Milelli, F. Lemont, M. Marchand

引用次数: 0

Advanced Pic-Mcc Simulation for an Intermediate-Pressure Capacitively Coupled Plasma for Deposition Process 用于沉积过程的中压电容耦合等离子体的高级Pic-Mcc模拟

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496109

Jin Seok Kim, H. Lee, H. J. Kim

{"title":"Advanced Pic-Mcc Simulation for an Intermediate-Pressure Capacitively Coupled Plasma for Deposition Process","authors":"Jin Seok Kim, H. Lee, H. J. Kim","doi":"10.1109/PLASMA.2017.8496109","DOIUrl":"https://doi.org/10.1109/PLASMA.2017.8496109","url":null,"abstract":"A particle-in-cell (PIC) simulation has been usually utilized for observing plasma kinetics in low pressure [1]because of long simulation time as PIC uses a huge amount of computational particles to treat collisions with neutral gas using Monte Carlo collision (MCC) method. In order to simulate high or intermediate pressure discharges, there are three limitations which slow down the total computation time: (1) many simulation particles are needed as plasma density increases. (2) a very short time step is required in MCC process. (3) many collisional reactions should be included. To overcome these limitations, we approach in three ways: (1) parallelization of PIC simulation with Graphics Processing Units (GPUs), (2) improvement of MCC method, (3) and combination with a fluid model for heavy particle collisions. In this presentation, ion transport phenomena are investigated at the wafer edge in a capacitively coupled plasma (CCP) reactor under an intermediate pressure of a few Torr. The effects of waferfocus ring gap, focus ring height, and the dielectric constant are investigated on the neutral and the ion fluxes and the ion energy and angle distribution (IAEDF), and compared with the preceded results [2–3]for the effect of the wafer-focus ring property.","PeriodicalId":145705,"journal":{"name":"2017 IEEE International Conference on Plasma Science (ICOPS)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116561835","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Low Voltage Folded Waveguide Multiple Beam Mini-Twts: Design and Modeling 低电压折叠波导多波束微型twts:设计与建模

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496175

A. Vlasov, J. Rodgers, J. Pasour, I. Chernyavskiy, S. Cooke, B. Levush, T. Antonsen, D. Chernin, K. Nguyen

引用次数: 0