{"title":"Tunnel Field Effect Transistors Based on Two-Dimensional Material Van-der-Waals Heterostructures","authors":"Jiang Cao","doi":"10.5772/intechopen.93143","DOIUrl":"https://doi.org/10.5772/intechopen.93143","url":null,"abstract":"The successful isolation of graphene in 2004 has attracted great interest to search for potential applications of this unique material and other newborn mem-bers of the two-dimensional (2-D) family in electronics, optoelectronics, spintronics and other fields. Compared to graphene, the 2-D transition metal dichalcogenides (TMDs) have the advantage of being semiconductors, which would allow their use for logic devices. In the past decade, significant developments have been made in this area, where opportunities and challenges co-exist. Stacking different 2-D materials significantly increases the already considerable design space, especially when a type-II band alignment is obtained. This chapter will describe the recent progresses in the tunnel field-effect transistors based on 2-D TMD van-der-Waals heterostructure, which is one of the promising candidates for increasingly important low-power mobile computation applications. Due to their small size, such devices are intrinsically dominated by quantum effects. This requires the adoption of a fairly general theory of transport, such as the nonequilibrium Green's functions (NEGF) formalism, which is a method having been more-and-more used for the simulation of electron transport in nanostructures in recent years.","PeriodicalId":134829,"journal":{"name":"Integrated Circuits/Microchips","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127440170","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Tackling the Problem of Dangerous Radiation Levels with Organic Field-Effect Transistors","authors":"I. Valitova, Z. Yi, Jonathan Sayago","doi":"10.5772/intechopen.92808","DOIUrl":"https://doi.org/10.5772/intechopen.92808","url":null,"abstract":"Accurate, quantitative measurements of ionizing radiation, commonly employed in medical diagnostic and therapeutic applications are essential prerequi-sites to minimize exposure risks. Common examples of radiation detectors include ionization chambers, thermoluminescent dosimeters, and various semiconductor detectors. Semiconductor dosimeters such as p/n type silicon diodes and MOSFETs have found widespread adoption due to their high sensitivity and easy processing. A significant limitation of these devices, however, is their lack of tissue equivalence. The high atomic number (relative to soft tissue) of silicon causes these devices to over-respond to photon beams that include a significant low energy component, for example, 1–10 kV, due to an enhanced photoelectric interaction coefficient. Organic field effect transistors (OFETs) are capable of providing tissue equivalent response to ionizing radiation in order to monitor more accurately the risk of exposure in medical treatments. This chapter presents the possibility to use different types of OFETs as ionizing and X-ray radiation dosimeters in medical applications.","PeriodicalId":134829,"journal":{"name":"Integrated Circuits/Microchips","volume":"76 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121038995","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Computationally Efficient Hybrid Interpolation and Baseline Restoration of the Brain-PET Pulses","authors":"S. Qaisar","doi":"10.5772/intechopen.92193","DOIUrl":"https://doi.org/10.5772/intechopen.92193","url":null,"abstract":"The design and component level architectures of a novel offset compensated digital baseline restorer (BLR) and an original hybrid interpolator are described. It allows diminishing the effect of modifications occurring during the readout of Positron Emission Tomography (PET) pulses. Without treatment, such artifacts can result in a reduction in the scanner’s performance, such as its sensitivity and resolution. The BLR recompenses the offset of PET pulses. Afterward, the pertinent parts of these pulses are located. Onward, the located portion of the signal is resampled by using a hybrid interpolator. This is constructed by cascading an optimized weighted least-square interpolator (WLSI) and a Simplified Linear Interpolator (SLI). The regulation processes for the WLSI coefficients and evaluation of the BLR and the interpolator modules are presented. The proposed hybrid interpolator’s computational complexity is compared with classic counterparts. These modules are implemented in Very High-Speed Integrated Circuits Hardware Description Language (VHDL) and synthesized on a Field Programmable Gate Array (FPGA). The functionality of the system is validated with an experimental setup. Results reveal notable computational gain along with adequate dynamic restitution of the bipolar offsets besides a useful and accurate improvement of the temporal resolution relative to the computationally complex conventional equivalents.","PeriodicalId":134829,"journal":{"name":"Integrated Circuits/Microchips","volume":"82 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-05-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128421408","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Area-Efficient Spin-Orbit Torque Magnetic Random-Access Memory","authors":"Karim Ali","doi":"10.5772/intechopen.92120","DOIUrl":"https://doi.org/10.5772/intechopen.92120","url":null,"abstract":"Spin-orbit torque magnetic random-access memory (SOT-MRAM) has shown promising potential to realize reliable, high-speed and energy-efficient on-chip memory. However, conventional SOT-MRAM requires two access transistors per cell. This limits the use of conventional SOT-MRAM in high-density memories. Thus, various architectures in the literature have been proposed to improve the area efficiency of the SOT-MRAM. In this chapter, these proposals are divided into two categories: non-diode-based SOT-MRAM and diode-based SOT-MRAM cells. The non-diode-based proposals may result in a 1-bit effective area saving up to 50% compared to the conventional SOT-MRAM, whereas the diode-based designs may result in 1-bit effective area-saving of up to 75%. However, the area saving may be accompanied by higher energy and reliability issue penalties. Therefore, here, the various proposals in the literature are presented, highlighting the pros and cons of each design. Moreover, the technology requirements to realize these proposals are discussed. Finally, the various designs are evaluated from both cell and system level perspectives.","PeriodicalId":134829,"journal":{"name":"Integrated Circuits/Microchips","volume":"267 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133781722","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Ultra-Low-Voltage IC Design Methods","authors":"D. Arbet, L. Nagy, V. Stopjaková","doi":"10.5772/intechopen.91958","DOIUrl":"https://doi.org/10.5772/intechopen.91958","url":null,"abstract":"The emerging nanoscale technologies inherently offer transistors working with low voltage levels and are optimized for low-power operation. However, these technologies lack quality electronic components vital for reliable analog and/or mixed-signal design (e.g., resistor, capacitor, etc.) as they are predominantly used in high-performance digital designs. Moreover, the voltage headroom, ESD properties, the maximum current densities, parasitic effects, process fluctuations, aging effects, and many other parameters are superior in verified-by-time CMOS processes using planar transistors. This is the main reason, why low-voltage, low-power high-performance analog and mixed-signal circuits are still being designed in mature process nodes. In the proposed chapter, we bring an overview of main challenges and design techniques effectively applicable for ultra-low-voltage and low-power analog integrated circuits in nanoscale technologies. New design challenges and limitations linked with a low value of the supply voltage, the process fluctuation, device mismatch, and other effects are discussed. In the later part of the chapter, conventional and unconventional design techniques (bulk-driven approach, floating-gate, dynamic threshold, etc.) to design analog integrated circuits towards ultra-low-voltage systems and applications are described. Examples of ultra-low-voltage analog ICs blocks (an operational amplifier, a voltage comparator, a charge pump, etc.) designed in a standard CMOS technology using the unconventional design approach are presented.","PeriodicalId":134829,"journal":{"name":"Integrated Circuits/Microchips","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116451204","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Crystal Polymorph Control for High-Performance Organic Field-Effect Transistors","authors":"Z. Fan, Hao‐Li Zhang","doi":"10.5772/intechopen.91905","DOIUrl":"https://doi.org/10.5772/intechopen.91905","url":null,"abstract":"Organic molecules are assembled together by weak non-covalent intermolecular interactions in solid state. Multiple crystalline packing states (crystal polymorphism) have commonly existed in the active layer for organic field-effect transistors (OFETs). Different polymorphs, even with the slightest changes in their molecular packing, can differ the charge transport mobility by orders of magnitude. Therefore, accessing new polymorphs can serve as a novel design strategy for attaining high device performance. Here, we review the state of the art in this emerging field of crystal polymorph control. We firstly introduce the role of polymorphism and the methods of polymorph control in organic semiconductors. Then we review the latest studies on the performance of polymorphs in OFET devices. Finally, we discuss the advantages and challenges for polymorphism as a platform for the study of the relationship between molecular packing and charge transport.","PeriodicalId":134829,"journal":{"name":"Integrated Circuits/Microchips","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129057145","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"High Capacitance Dielectrics for Low Voltage Operated OFETs","authors":"N. Mohammadian, L. Majewski","doi":"10.5772/intechopen.91772","DOIUrl":"https://doi.org/10.5772/intechopen.91772","url":null,"abstract":"Low-voltage, organic field-effect transistors (OFETs) have a high potential to be key components of low-cost, flexible, and large-area electronics. However, to be able to employ OFETs in the next generation of the electronic devices, the reduction of their operational voltage is urgently needed. Ideally, to be power efficient, OFETs are operated with gate voltages as low as possible. To fulfill this requirement, low values of transistor threshold voltage ( V t ) and subthreshold swing ( SS ) are essential. Ideally, V t should be around 0 V and SS close to 60 mV/dec, which is the theoretical limit of subthreshold swing at 300 K. This is a very challenging task as it requires the gate dielectric thickness to be reduced below 10 nm. Here, the most promising strategies toward high capacitance dielectrics for low voltage operated OFETs are covered and discussed.","PeriodicalId":134829,"journal":{"name":"Integrated Circuits/Microchips","volume":"46 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123917765","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}