High Capacitance Dielectrics for Low Voltage Operated OFETs

N. Mohammadian, L. Majewski
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引用次数: 1

Abstract

Low-voltage, organic field-effect transistors (OFETs) have a high potential to be key components of low-cost, flexible, and large-area electronics. However, to be able to employ OFETs in the next generation of the electronic devices, the reduction of their operational voltage is urgently needed. Ideally, to be power efficient, OFETs are operated with gate voltages as low as possible. To fulfill this requirement, low values of transistor threshold voltage ( V t ) and subthreshold swing ( SS ) are essential. Ideally, V t should be around 0 V and SS close to 60 mV/dec, which is the theoretical limit of subthreshold swing at 300 K. This is a very challenging task as it requires the gate dielectric thickness to be reduced below 10 nm. Here, the most promising strategies toward high capacitance dielectrics for low voltage operated OFETs are covered and discussed.
低压ofet的高电容介电体
低压、有机场效应晶体管(ofet)具有很高的潜力成为低成本、柔性和大面积电子产品的关键部件。然而,为了能够在下一代电子器件中使用ofet,迫切需要降低其工作电压。理想情况下,为了提高功率效率,ofet在尽可能低的栅极电压下工作。为了满足这一要求,晶体管的低阈值电压(V t)和亚阈值摆幅(SS)是必不可少的。理想情况下,V t应该在0 V左右,SS应该接近60 mV/dec,这是300k时亚阈值摆幅的理论极限。这是一项非常具有挑战性的任务,因为它要求栅极介电厚度减小到10纳米以下。本文讨论了低压操作的ofet中最有前途的高电容介电体策略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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