发布求助
文献互助 智能选刊 最新文献

Electrochemical and Solid State Letters最新文献

筛选
英文 中文
Electroless Deposition of Bismuth Containing Films on Copper and Silver Substrates from KBiI4 Solutions KBiI4溶液在铜和银基底上化学沉积含铋薄膜
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.ESL113444
S. Djokić, K. Prashanthi, T. Thundat
{"title":"Electroless Deposition of Bismuth Containing Films on Copper and Silver Substrates from KBiI4 Solutions","authors":"S. Djokić, K. Prashanthi, T. Thundat","doi":"10.1149/2.ESL113444","DOIUrl":"https://doi.org/10.1149/2.ESL113444","url":null,"abstract":"","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"41 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86507890","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Stress Contributions to Solution Thermodynamics in Li-Si Alloys 应力对Li-Si合金溶液热力学的影响
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.016201ESL
B. Sheldon, S. Soni, Xingcheng Xiao, Y. Qi
{"title":"Stress Contributions to Solution Thermodynamics in Li-Si Alloys","authors":"B. Sheldon, S. Soni, Xingcheng Xiao, Y. Qi","doi":"10.1149/2.016201ESL","DOIUrl":"https://doi.org/10.1149/2.016201ESL","url":null,"abstract":"","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"45 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88298336","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 74
Wafer Cut Effect on Hetero-Epitaxial 3C-SiC Film for MEMS Application 晶圆切割对MEMS异质外延3C-SiC薄膜的影响
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.015206ESL
R. Anzalone, M. Camarda, A. Auditore, N. Piluso, A. Severino, A. Magna, G. D'Arrigo, F. Via
{"title":"Wafer Cut Effect on Hetero-Epitaxial 3C-SiC Film for MEMS Application","authors":"R. Anzalone, M. Camarda, A. Auditore, N. Piluso, A. Severino, A. Magna, G. D'Arrigo, F. Via","doi":"10.1149/2.015206ESL","DOIUrl":"https://doi.org/10.1149/2.015206ESL","url":null,"abstract":"","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"21 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90931652","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Effect of Fluoroethylene Carbonate Additive on Low Temperature Performance of Li-Ion Batteries 碳酸氟乙烯添加剂对锂离子电池低温性能的影响
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.027206ESL
Bingxiao Liu, Bing Li, S. Guan
{"title":"Effect of Fluoroethylene Carbonate Additive on Low Temperature Performance of Li-Ion Batteries","authors":"Bingxiao Liu, Bing Li, S. Guan","doi":"10.1149/2.027206ESL","DOIUrl":"https://doi.org/10.1149/2.027206ESL","url":null,"abstract":"The effects of Fluoroethylene carbonate (FEC) on the low temperature performance of Li-ion batteries were evaluated. By addition of 2 v% FEC into a commercial ternary electrolyte, the initial lithium intercalation capacity (graphite/Li model cell) was remarkably improved by approximately 50% and the voltage plateau of the cell was lowered by about 0.2 V at −20°C. This is maybe attributed to a reduced charge transfer resistance and a lowered SEI film resistance with a richer LiF phase formed on the graphite electrode by Tafel polarization, AC impedance and X-ray photoelectron spectroscopy (XPS) analysis.","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"54 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81638265","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 60
An Investigation of the Different Charge Trapping Mechanisms for SiNx and SiO2 Gate Insulator in a-IGZO TFTs a-IGZO TFTs中SiNx和SiO2栅极绝缘子不同电荷捕获机制的研究
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.003204ESL
Young Wook Lee, Sun‐Jae Kim, Soo‐Yeon Lee, Woo-Geun Lee, Kap‐soo Yoon, Jaewoo Park, M. Han
{"title":"An Investigation of the Different Charge Trapping Mechanisms for SiNx and SiO2 Gate Insulator in a-IGZO TFTs","authors":"Young Wook Lee, Sun‐Jae Kim, Soo‐Yeon Lee, Woo-Geun Lee, Kap‐soo Yoon, Jaewoo Park, M. Han","doi":"10.1149/2.003204ESL","DOIUrl":"https://doi.org/10.1149/2.003204ESL","url":null,"abstract":"","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"33 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82173863","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
Electrochemical Detection of Sodium Borohydride in Alkaline Media by Gold Electrode 碱性介质中硼氢化钠的金电极电化学检测
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.004204ESL
Junbo Hou, M. Ellis, R. Moore
{"title":"Electrochemical Detection of Sodium Borohydride in Alkaline Media by Gold Electrode","authors":"Junbo Hou, M. Ellis, R. Moore","doi":"10.1149/2.004204ESL","DOIUrl":"https://doi.org/10.1149/2.004204ESL","url":null,"abstract":"Direct borohydride fuel cells (DBFC) are emerging as a promising technology for portable power. The characteristics of a gold electrochemical sensor for detecting borohydride concentration were investigated. Although gold is not Faradically efficient for the borohydride oxidation, the peak current obtained from cyclic voltammetry (CV) showed a linear relationship in the investigated range of 0.1 mM–50 mM borohydride concentration with a detect limitation of 50 μM, suggesting the same charge transfer mechanism within the investigated concentration range. Chronoamperometry results demonstrated a fast signal response, and the sensitivity was determined as 1.56 ± 0.13 μA/100 μM based on the present disk electrode. © 2012 The Electrochemical Society. [DOI: 10.1149/2.004204esl] All rights reserved.","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"25 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83253079","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Metal-Support Interaction of Pt Nanoparticles with Ionically and Non-Ionically Conductive Supports for CO Oxidation 金属-载体Pt纳米粒子与离子和非离子导电载体对CO氧化的相互作用
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.024203ESL
R. Isaifan, H. Dole, Emil Obeid, L. Lizarraga, P. Vernoux, E. Baranova
{"title":"Metal-Support Interaction of Pt Nanoparticles with Ionically and Non-Ionically Conductive Supports for CO Oxidation","authors":"R. Isaifan, H. Dole, Emil Obeid, L. Lizarraga, P. Vernoux, E. Baranova","doi":"10.1149/2.024203ESL","DOIUrl":"https://doi.org/10.1149/2.024203ESL","url":null,"abstract":"Platinum nanoparticles of narrow size distribution (~2.5 nm) were synthesized using a modified polyol method and deposited on yttria-stabilized zirconia (Pt/YSZ), carbon (Pt/C) and γ-alumina (Pt/γ-Al2O3) supports, resulting in 1 wt % of Pt loading. Pt/YSZ has the highest catalytic activity toward CO oxidation among the studied catalysts. Decrease in the average particle size of Pt/YSZ led to the increase in CO conversion at low temperatures. Enhanced performances can be explained by the thermally induced O2− backspillover from YSZ over Pt nanoparticles in agreement with the electrochemical promotion mechanism. Observed effect becomes more pronounced with decreasing the particle size.","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"26 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88619271","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 23
Effect of Charge Trapping/Detrapping on Threshold Voltage Shift of IGZO TFTs under AC Bias Stress 交流偏压下电荷捕获/去捕获对IGZO TFTs阈值电压偏移的影响
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.026204ESL
Sun‐Jae Kim, S. Lee, Young‐Wook Lee, Seung‐Hee Kuk, J. Kwon, M. Han
{"title":"Effect of Charge Trapping/Detrapping on Threshold Voltage Shift of IGZO TFTs under AC Bias Stress","authors":"Sun‐Jae Kim, S. Lee, Young‐Wook Lee, Seung‐Hee Kuk, J. Kwon, M. Han","doi":"10.1149/2.026204ESL","DOIUrl":"https://doi.org/10.1149/2.026204ESL","url":null,"abstract":"We have investigated the dependency of alternating current (AC) stress duty ratio on the stability of indium-gallium-zinc-oxide (IGZO) thin-film transistors (TFTs). As the duty ratio increases from 0.25 to 0.75, threshold voltage (VTH) shift under the AC gate bias stress was increased from 4.10 V to 5.01 V, without degradation of subthreshold slope and mobility. The dominant mechanism of VTH shift was considered the charge trapping and VTH shift along with time was well fitted to a stretched-exponential model. The VTH shift was suppressed with a reduction of trap density by employing N2O plasma treatment on the gate insulator.","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"42 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91208851","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 29
Carrier-Suppressing Effect of Mg in Solution-Processed Zn-Sn-O Thin-Film Transistors Mg在溶液处理Zn-Sn-O薄膜晶体管中的载流子抑制作用
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.012203ESL
H. Lim, Y. Rim, Dong Lim Kim, W. Jeong, Hyun Jae Kim
{"title":"Carrier-Suppressing Effect of Mg in Solution-Processed Zn-Sn-O Thin-Film Transistors","authors":"H. Lim, Y. Rim, Dong Lim Kim, W. Jeong, Hyun Jae Kim","doi":"10.1149/2.012203ESL","DOIUrl":"https://doi.org/10.1149/2.012203ESL","url":null,"abstract":"","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"61 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84042864","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 15
Surface Polarity Effects on the Hydride Vapor Phase Epitaxial Growth of GaN on 6H-SiC with a Chrome Nitride Buffer Layer 氮化铬缓冲层对氮化镓在6H-SiC上氢化物气相外延生长的表面极性影响
Electrochemical and Solid State Letters Pub Date : 2012-01-01 DOI: 10.1149/2.014205ESL
J. Park, H. Lee, S. W. Lee, J. Ha, S. Nagata, S. Hong, H. Lee, M. Cho, T. Yao
{"title":"Surface Polarity Effects on the Hydride Vapor Phase Epitaxial Growth of GaN on 6H-SiC with a Chrome Nitride Buffer Layer","authors":"J. Park, H. Lee, S. W. Lee, J. Ha, S. Nagata, S. Hong, H. Lee, M. Cho, T. Yao","doi":"10.1149/2.014205ESL","DOIUrl":"https://doi.org/10.1149/2.014205ESL","url":null,"abstract":"","PeriodicalId":11627,"journal":{"name":"Electrochemical and Solid State Letters","volume":"1 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2012-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87647672","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
首页 上一页
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整，为了账户安全，请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们：info@booksci.cn Book学术提供免费学术资源搜索服务，方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号：481959085
Book学术官方微信