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Cover Picture: Contrib. Plasma Phys. 05/2025 封面图片：投稿。等离子体物理。05/2025
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-06-18 DOI: 10.1002/ctpp.202590009
{"title":"Cover Picture: Contrib. Plasma Phys. 05/2025","authors":"","doi":"10.1002/ctpp.202590009","DOIUrl":"https://doi.org/10.1002/ctpp.202590009","url":null,"abstract":"<p>Spatial distribution of particles hitting the collector probes based on different simulations for the DIII-Dcase: (a) 40 million, (b) 80 million, (c) 160 million. Fig.18 of the paper by Dhyanjyoti D. Nath et al. https://doi.org/10.1002/ctpp.202400073\u0000 \u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"65 5","pages":""},"PeriodicalIF":1.3,"publicationDate":"2025-06-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/ctpp.202590009","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144315283","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Issue Information: Contrib. Plasma Phys. 05/2025 发行信息：投稿。等离子体物理。05/2025
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-06-18 DOI: 10.1002/ctpp.202590010
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引用次数: 0
Effect of the Gas Pressure, Charging Voltage, and Anode Length on the Neon Soft X-Ray Emission From Plasma Foci—Measurements and Simulation 气体压力、充电电压和阳极长度对等离子体焦点氖软x射线发射的影响——测量与模拟
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-05-10 DOI: 10.1002/ctpp.70003
R. Albahri, Y. Abou-Ali, M. Akel
{"title":"Effect of the Gas Pressure, Charging Voltage, and Anode Length on the Neon Soft X-Ray Emission From Plasma Foci—Measurements and Simulation","authors":"R. Albahri,&nbsp;Y. Abou-Ali,&nbsp;M. Akel","doi":"10.1002/ctpp.70003","DOIUrl":"https://doi.org/10.1002/ctpp.70003","url":null,"abstract":"<div>\u0000 \u0000 <p>Using the Lee model code, numerical experiments were performed to compute the soft x-ray (SXR) yield as a function of the initial neon pressure for seven different energy plasma focus devices (NX2, INTI, UNU/ICTP, APF, NX1, PF7, PF24). In addition, the effect of operation voltage for four plasma focus devices (APF, NX2, UNU/ICTP, NX1) and the anode length for two plasma focus devices (NX1, NX2) on the soft x-ray yield (<i>Y</i><sub>sxr</sub>) versus pressure was studied and discussed. At experimental pressure, the computed current waveform was well fitted to the measured total current waveform for each device. Furthermore, the maximum discharge current, pinch current, axial and radial velocities, average pinch temperatures and densities, and pinch dimensions around the optimum pressure for the maximum <i>Y</i><sub>sxr</sub> were computed for the seven mentioned devices. The computed values obtained are within the temperature window required to generate H-like (1022 eV) and He-like (922 eV) plasmas. The computed <i>Y</i><sub>sxr</sub> are in good agreement with part of the experimental results. Moreover, experimental and computed values of the end axial speed (<i>v</i><sub>a</sub>), final inward shock speed (<i>v</i><sub>s</sub>), the speed factor (<i>SF</i>) and the current per cm of anode radius (<i>ID</i>) were compared for part of the considered devices.</p>\u0000 </div>","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"65 5","pages":""},"PeriodicalIF":1.3,"publicationDate":"2025-05-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144315348","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Cover Picture: Contrib. Plasma Phys. 04/2025 封面图片：投稿。等离子体物理。04/2025
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-04-25 DOI: 10.1002/ctpp.202590007
{"title":"Cover Picture: Contrib. Plasma Phys. 04/2025","authors":"","doi":"10.1002/ctpp.202590007","DOIUrl":"https://doi.org/10.1002/ctpp.202590007","url":null,"abstract":"<p>Simulated trajectories of electrons bombarding the mask line, as well as incoming electrons from the surface above at different temperatures in the front view. The number of incident electrons in each panel is 25. The red dash indicates the profile of the mask line. Fig. 2 of the paper by Peng Zhang et al. https://doi.org/10.1002/ctpp.202400118\u0000 \u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"65 4","pages":""},"PeriodicalIF":1.3,"publicationDate":"2025-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/ctpp.202590007","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143871618","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Issue Information: Contrib. Plasma Phys. 04/2025 发行信息：投稿。等离子体物理。04/2025
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-04-25 DOI: 10.1002/ctpp.202590008
{"title":"Issue Information: Contrib. Plasma Phys. 04/2025","authors":"","doi":"10.1002/ctpp.202590008","DOIUrl":"https://doi.org/10.1002/ctpp.202590008","url":null,"abstract":"","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"65 4","pages":""},"PeriodicalIF":1.3,"publicationDate":"2025-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/ctpp.202590008","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143871546","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Cover Picture: Contrib. Plasma Phys. 03/2025 封面图片：Contrib.Plasma Phys.
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-03-09 DOI: 10.1002/ctpp.202590005
{"title":"Cover Picture: Contrib. Plasma Phys. 03/2025","authors":"","doi":"10.1002/ctpp.202590005","DOIUrl":"https://doi.org/10.1002/ctpp.202590005","url":null,"abstract":"<p>Diagram of beam distribution of the magnetic trap at 50 ns with different beam incidence velocities. Green points represent protons, red points represent electrons and blue lines represent magnetic induction lines. Part of Fig. 6 of the paper by Fang-Ping Wang et al. https://doi.org/10.1002/ctpp.202400040\u0000 \u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"65 3","pages":""},"PeriodicalIF":1.3,"publicationDate":"2025-03-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/ctpp.202590005","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143581364","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Issue Information: Contrib. Plasma Phys. 03/2025 发行信息：投稿。等离子体物理。3/2025
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-03-09 DOI: 10.1002/ctpp.202590006
{"title":"Issue Information: Contrib. Plasma Phys. 03/2025","authors":"","doi":"10.1002/ctpp.202590006","DOIUrl":"https://doi.org/10.1002/ctpp.202590006","url":null,"abstract":"","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"65 3","pages":""},"PeriodicalIF":1.3,"publicationDate":"2025-03-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/ctpp.202590006","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143581496","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Prototyping of Si and III–V Compounds by Plasma Chemistry Using Dry Film Photoresist Mask 干膜光刻胶掩模制备Si和III-V化合物的等离子体化学原型
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-03-07 DOI: 10.1002/ctpp.202400050
Etienne Herth, David Bouville, Samson Edmond
{"title":"Prototyping of Si and III–V Compounds by Plasma Chemistry Using Dry Film Photoresist Mask","authors":"Etienne Herth,&nbsp;David Bouville,&nbsp;Samson Edmond","doi":"10.1002/ctpp.202400050","DOIUrl":"https://doi.org/10.1002/ctpp.202400050","url":null,"abstract":"<div>\u0000 \u0000 <p>Fast and reliable plasma chemistry plays a crucial role in the fabrication of micro- and nanoscale structures in numerous applications. In this work, we demonstrated that fast and optimal etch chemistry using an inductively coupled plasma (ICP) system in combination with a simple and cost-effective dry film photoresist (DFR) as a mask transfer. The results show that the proposed DFR, which simultaneously removes the edge bead and air bubbles, can be successfully used in chlorinated and fluorinated chemistries, resulting in fast etching rates and good selectivity from 5:1 to 16:1 for GaAs and from 30:1 to 150:1 for silicon substrates. This solution offers the promise of drastically cutting down microfabrication time and minimizing contamination. It could pave the way for a novel, rapid manufacturing process that is applicable in various fields, regardless of the size or shape of the substrate.</p>\u0000 </div>","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"65 5","pages":""},"PeriodicalIF":1.3,"publicationDate":"2025-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144315229","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Instability of DA Mode in Ionospheric Dusty Plasmas 电离层尘埃等离子体中DA模式的不稳定性
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-02-25 DOI: 10.1002/ctpp.202400123
Md. Khairul Islam, Md. Sirajum Munir, Md. Afzal Hossain Talukder, M. A. Malek, Md. Salahuddin
{"title":"Instability of DA Mode in Ionospheric Dusty Plasmas","authors":"Md. Khairul Islam,&nbsp;Md. Sirajum Munir,&nbsp;Md. Afzal Hossain Talukder,&nbsp;M. A. Malek,&nbsp;Md. Salahuddin","doi":"10.1002/ctpp.202400123","DOIUrl":"https://doi.org/10.1002/ctpp.202400123","url":null,"abstract":"<div>\u0000 \u0000 <p>Irradiation effect on the different plasma modes in various dusty plasma conditions was studied theoretically. We revisit our investigation on the instability of the electrostatic dust acoustic (DA) mode elaborately in the case of ionospheric dusty plasmas. In this investigation, it is found that the growth rate of DA mode increases two orders more due to the photoelectric effect than that of the streaming effect. A detailed description of the dust charge fluctuation model in the irradiated dusty plasmas, the derivation of the DA mode, and discussions on the numerical analysis of the obtained results make the paper easy to understand. The present theory should be applied specially in understanding the formation of radar echoes in the presence of solar radiation.</p>\u0000 </div>","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"65 5","pages":""},"PeriodicalIF":1.3,"publicationDate":"2025-02-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144315252","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Issue Information: Contrib. Plasma Phys. 02/2025 发行信息：投稿。等离子体物理学报。02/2025
IF 1.3 4区 物理与天体物理
Contributions to Plasma Physics Pub Date : 2025-02-18 DOI: 10.1002/ctpp.202590004
{"title":"Issue Information: Contrib. Plasma Phys. 02/2025","authors":"","doi":"10.1002/ctpp.202590004","DOIUrl":"https://doi.org/10.1002/ctpp.202590004","url":null,"abstract":"","PeriodicalId":10700,"journal":{"name":"Contributions to Plasma Physics","volume":"65 2","pages":""},"PeriodicalIF":1.3,"publicationDate":"2025-02-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/ctpp.202590004","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143431757","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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