Journal of optical microsystems最新文献_第2页

Fourier scatterometry for compensation of tilt and curvature deviations of two-photon polymerization three-dimensional printers 傅里叶散射法补偿双光子聚合三维打印机的倾斜和曲率偏差

Journal of optical microsystems Pub Date : 2023-11-06 DOI: 10.1117/1.jom.3.4.043501

Elias Ellingen, Markus Rohde, Bastian Stahl, Robert Lange

{"title":"Fourier scatterometry for compensation of tilt and curvature deviations of two-photon polymerization three-dimensional printers","authors":"Elias Ellingen, Markus Rohde, Bastian Stahl, Robert Lange","doi":"10.1117/1.jom.3.4.043501","DOIUrl":"https://doi.org/10.1117/1.jom.3.4.043501","url":null,"abstract":"A Fourier scatterometry setup is evaluated to recover the key parameters of optical phase gratings. Based on these parameters, systematic errors in the printing process of two-photon polymerization (TPP) gray-scale lithography three-dimensional printers can be compensated, namely tilt and curvature deviations. The proposed setup is significantly cheaper than a confocal microscope, which is usually used to determine calibration parameters for compensation of the TPP printing process. The grating parameters recovered this way are compared to those obtained with a confocal microscope. A clear correlation between confocal and scatterometric measurements is first shown for structures containing either tilt or curvature. The correlation is also shown for structures containing a mixture of tilt and curvature errors (squared Pearson coefficient r2 = 0.92). This compensation method is demonstrated on a TPP printer: a diffractive optical element printed with correction parameters obtained from Fourier scatterometry shows a significant reduction in noise as compared to the uncompensated system. This verifies the successful reduction of tilt and curvature errors. Further improvements of the method are proposed, which may enable the measurements to become more precise than confocal measurements in the future, since scatterometry is not affected by the diffraction limit.","PeriodicalId":485779,"journal":{"name":"Journal of optical microsystems","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135678857","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Breaking the limits of virtual reality display resolution: the advancements of a 2117-pixels per inch 4K virtual reality liquid crystal display 突破虚拟现实显示分辨率的极限:每英寸2117像素的4K虚拟现实液晶显示器的进步

Journal of optical microsystems Pub Date : 2023-10-11 DOI: 10.1117/1.jom.3.4.041208

Yung-Hsun Wu, Chia-Hao Tsai, Yi-Hsiu Wu, Yi-Shiuan Cherng, Ming-Jou Tai, Potilar Huang, I-An Yao, Chiu-Lien Yang

引用次数: 0

Reflowable liquid crystal geometric phase element for vertical cavity surface emitting laser projector 垂直腔面发射激光投影仪用可回流液晶几何相位元件

Journal of optical microsystems Pub Date : 2023-10-11 DOI: 10.1117/1.jom.3.4.041207

Ming-Syuan Chen, Hung-Shan Chen, Sung-Nan Chen, Chien-Chung Chen, Yi Hung, Guo-Lin Hu, Chia-Ming Chang

引用次数: 0

Impact of magnetic nanoparticles on the stability of blue phase and twist-grain boundary A phases 磁性纳米颗粒对蓝相和扭转晶界A相稳定性的影响

Journal of optical microsystems Pub Date : 2023-10-10 DOI: 10.1117/1.jom.3.4.041206

Apparao Gudimalla, Marta Lavrič, Brigita Rožič, Saso Gyergyek, Samo Kralj, Zdravko Kutnjak

引用次数: 0

Front-lit LCOS for AR displays 用于AR显示器的前置LCOS

Journal of optical microsystems Pub Date : 2023-09-30 DOI: 10.1117/1.jom.3.4.041205

Yuet-Wing Li, Kuan-Yu Chen, Wen-Hsu Chen, Chi-Wen Lin, Chien-Tang Wang, Kuan-Hsu Fan-Chiang, Hung-Chien Kuo, Hsien-Chang Tsai

{"title":"Front-lit LCOS for AR displays","authors":"Yuet-Wing Li, Kuan-Yu Chen, Wen-Hsu Chen, Chi-Wen Lin, Chien-Tang Wang, Kuan-Hsu Fan-Chiang, Hung-Chien Kuo, Hsien-Chang Tsai","doi":"10.1117/1.jom.3.4.041205","DOIUrl":"https://doi.org/10.1117/1.jom.3.4.041205","url":null,"abstract":"Augmented reality (AR) displays are recognized as an important human–machine interface for next-generation computing platforms. They consist of a micro projector and a waveguide combiner. Researchers are looking for a compact and powerful projector to power up the waveguide combiner. The projector itself is comprised of microdisplays [liquid-crystal-on silicon (LCOS), MicroLED, laser beam scanning, and organic light-emitting diode] that generate the virtual image and a collimating optics module that collimates the image toward the waveguide’s entrance aperture. However, the microdisplays mentioned above suffer from different problems, such as being too bulky, having too low brightness, reliabilities issue, or too high power consumption. In particular, projectors using LCOS are too bulky and heavy to fit into an AR glasses form factor. Therefore, we proposed a new illumination system called front-lit for LCOS. In the front-lit system, the conventional polarization beam splitter (PBS) in the LCOS projector is replaced by a polarized waveguide plate with a micro mirror array. The polarized waveguide functions like a PBS. It reflects the s-polarized beam and transmits to the p-polarized beam. Moreover, the polarized waveguide input beam is shaped to a profile with two intensity peaks from a Lambertian profile by our coupling lens, which is located between the LED and waveguide. Having this profile, the polarized waveguide efficiency is improved, and a larger display illumination area is obtained. From our real measurement results, it is proven that the front-lit LCOS significantly reduces the size and weight of the illumination system. It weighs less than 1 g, and the size of the full module is as small as 0.47cc. The color filter front-lit LCOS and color sequential LCOS deliver 30,000 nits / 175 mW and 100,000 nits / 300 mW, respectively. The color sequential front-lit LCOS also provides high image quality with a 500:1 contrast ratio and 140% sRGB color gamut.","PeriodicalId":485779,"journal":{"name":"Journal of optical microsystems","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-09-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136341961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Enabling mass manufacturing of industry-standard optical waveguide combiners 实现工业标准光波导合成器的大规模生产

Journal of optical microsystems Pub Date : 2023-09-23 DOI: 10.1117/1.jom.3.3.033502

Stefan Steiner, Matthias Jotz, Frederik Bachhuber, Brian Bilenberg, Tobias Hedegaard Bro, Alireza Rashed, Murat Deveci, Erhan Ercan, Mariana Ballottin, Jan Matthijs ter Meulen

{"title":"Enabling mass manufacturing of industry-standard optical waveguide combiners","authors":"Stefan Steiner, Matthias Jotz, Frederik Bachhuber, Brian Bilenberg, Tobias Hedegaard Bro, Alireza Rashed, Murat Deveci, Erhan Ercan, Mariana Ballottin, Jan Matthijs ter Meulen","doi":"10.1117/1.jom.3.3.033502","DOIUrl":"https://doi.org/10.1117/1.jom.3.3.033502","url":null,"abstract":"Nanoimprinting of surface-relief grating-based waveguides has the potential to produce one of the industry-leading augmented reality (AR) smart glasses, but there are still many challenges in the design, scaling, and reproducibility of these imprinted waveguides. A promising path toward mass manufacturing of optical waveguide combiners is via large-area nanoimprinting. Here, we present the complete value chain with partners involved throughout the process: from design, mastering, and materials to imprinting and metrology, to prove that this method improves not only the manufacturing throughput but also the waveguide quality. We demonstrate that the replication and image quality are true to the intended design using large area, high refractive index (n = 1.9), square (300 mm × 300 mm) glass substrates with high-refractive index resins (n = 1.9). This is shown to be valid for over 100 replications and for large area nanoimprinting (Gen5, 1100 mm × 1300 mm). Our goal is to demonstrate a viable path toward high-volume and low-cost manufacturing of AR waveguides based on surface relief gratings.","PeriodicalId":485779,"journal":{"name":"Journal of optical microsystems","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135958961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Orientation fluctuation in liquid crystal lenses 液晶透镜的取向波动

Journal of optical microsystems Pub Date : 2023-09-20 DOI: 10.1117/1.jom.3.4.041204

Yi-Hsin Lin, Wei-Cheng Cheng, Hung-Shan Chen, Yu-Jen Wang, Xiao Liang

引用次数: 0

Liquid crystal-enabled tunability of Yagi-Uda antenna resonant properties 液晶使能Yagi-Uda天线谐振特性的可调性

Journal of optical microsystems Pub Date : 2023-09-19 DOI: 10.1117/1.jom.3.4.041203

Ivan Yakovkin, Victor Reshetnyak

引用次数: 0

Enhancing virtual reality with high-resolution light field liquid crystal display technology 利用高分辨率光场液晶显示技术增强虚拟现实

Journal of optical microsystems Pub Date : 2023-09-13 DOI: 10.1117/1.jom.3.4.041202

Yung-Hsun Wu, Chuan-Chung Chang, Yu-Shih Tsou, Yi-Chien Lo, Chia-Hao Tsai, Chih-hung Lu, Chiu-Lien Yang, Fu-Ming Chuang

引用次数: 0

2022 List of Reviewers 2022年评审人员名单

Journal of optical microsystems Pub Date : 2023-01-12 DOI: 10.1117/1.jom.3.1.010102

引用次数: 0