Coatings and Thin-Film Technologies最新文献

{"title":"New Materials for Thin Film Solar Cells","authors":"Senthil T.S, Kalaiselvi C.R","doi":"10.5772/INTECHOPEN.81393","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.81393","url":null,"abstract":"Thin film technology has a world-wide reputation in the field of thin film deposition process and also it paves a way for innovative techniques in large scale applications. Modern thin film technology has evolved into a sophisticated way to increase the performance and esthetic value for making new functional devices. One such application is search of new materials for thin film solar cells as it provides the solution for the today’s concern of energy crisis. Depending on the processing technology solar cells are of various types. Among them, silicon wafer solar cells and thin film solar cells are most promising. Thin film technology has made solar cells more feasible to be employed in terms of device design and fabrication. The efficiencies produced by these solar cells still need to be improved. For this many investigations for further improvement from CIGS (copper indium gallium selenide) solar cell to dye sensitized solar cells and perovskite solar cells. Due to toxic nature and environmental impact the use of lead in perovskite solar cells are replaced by tin or some materials which would equalize the achieved efficiency of lead. Hence the developments in search of innovative materials continue its path in thin film solar cells to develop the photovoltaic field by enhancing its efficiency.","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"2000 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-01-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121073528","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Impact of the Glancing Angle Deposition on the Yttria-Stabilized Zirconia Growth and Their Thermal Barrier Coating Properties","authors":"C. Amaya, J. J. Prías-Barragán, J. Caicedo, J. Yáñez-Limón, G. Zambrano","doi":"10.5772/INTECHOPEN.81905","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.81905","url":null,"abstract":"Yttria-stabilized zirconia (YSZ) is the most common material used as a thermal barrier in several engineering applications. The majority of films produced by physical vapor deposition (PVD) techniques use normal incidence and lead to the columnar growth normal to the substrate. The typical columnar structure of sputter-deposited films is largely influenced, among other parameters, by pressure, temperature, thickness, and the ion-to- atom ratio incident at the substrate or substrate bias voltage. Another important experimental parameter used to modify the film properties is the direction of the incident flux of the depositing species with respect to the substrate surface. In this chapter an oblique angle deposition (OAD) approach was used to grow YSZ with tilted columnar structures, to study the impact of this deposition technique on the microstructure, morphology, and, correspondingly, the thermal conductivity of YSZ films, in order to improve the insulator potential of these thin films. Additionally, in the chapter, we present a detailed description of the oblique angle deposition (OAD) technique and double-layer model used for deter- mination of the effective thermal conductivity of YSZ samples grown over thick substrates. The oblique angle deposition is a powerful technique to modify the microstructure of PVD coatings deposited by sputtering in the micro- and nanometer scale, with high reproducibility and repeatability as the period (n) varied. For low values of repetition number (n = 10), the “ zigzag ” structure of 8YSZ coatings can be repeated without any degradation. However, when n increases from 10 to 70, the well-aligned columnar structure with “ zigzag ” microstructure has a columnar diameter refinement and the columns in the nanometer range growth perpendicular to the substrate surface, changing the orientation of porosity in the coatings. From the XRD and TEM analyses, it was established that twins are being produced to improve the thermal insulation properties. In fact, the thermal conductivity study allows to establish that the k value is strongly influenced by the “ zigzag ” microstructure of the PVD coatings, with a decrease of the thermal conductivity in an order of magnitude, when the columns change from normal growth orientation ( α = 0) with respect to the substrate surface to a microstructure in a “ zigzag ” pattern with n = 50 repetitions, showing the potential of growing YSZ thin films in","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128930551","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Electrochemical Evaluation Technologies of Organic Coatings","authors":"F. Meng, Li Liu","doi":"10.5772/INTECHOPEN.79736","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.79736","url":null,"abstract":"Organic coatings are widely utilized to protect metals from corrosion and inevitably suf- fer degradation due to exposure to surroundings. Electrochemical technology is suitable for evaluating the protective performance of organic coatings since it has the advantages in rapidity and in-situ measurement. In this chapter, several electrochemical measurement technologies including open circuit potential (OCP), linear polarization resistance (LPR), electrochemical impedance spectroscopy (EIS) as well as electrochemical noise (EN) are introduced as ideal methods for acquiring mechanistic information about the failure behavior of the painted metal. The research status on measuring configurations, choosing data acquisition parameters and analytical methods are also discussed.","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129896212","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Epitaxial Nitride Thin Film and Heterostructures: From Hard Coating to Solid State Energy Conversion","authors":"S. Acharya, Bivas Saha","doi":"10.5772/INTECHOPEN.79525","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.79525","url":null,"abstract":"Epitaxial nitride thin films and heterostructures are one of the most celebrated class of materials not only due to their utility in fundamental materials science and device physics studies, but also for their numerous industrial applications from hard coating technology to solid-state lighting. Transition metal nitrides such as TiN and others have been utilized for decades in hard coating and tribology applications. The last two decades have also seen the emergence and dominance of GaN for solid-state lighting and power electronic applications. Though TiN, and other wurtzite III-nitride semiconductor such as GaN remain the most important nitride coating materials for a range of applications, several other rocksalt nitride thin film and superlattice heterostructures such as ScN, CrN, and TiN/(Al,Sc)N metal/semiconductor superlattices have attracted significant interests in recent years for applications in thermoelectricity, plasmonics, solar energy conversion, and in high temperature electronic, optoelectronic, and plasmonic devices. In this chapter, we present an up-to-date summary of rocksalt nitride thin film and heterostructure coat- ing materials for their applications in energy transport and conversion research fields. The suitability and usefulness of such nitride coating materials in the most recent scientific and engineering advances related to the energy transport and conversion research fields are highlighted.","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132857052","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Spin-Coating Technique for Fabricating Nickel Zinc Nanoferrite (Ni0.3Zn0.7Fe2O4) Thin Films","authors":"Y. Yusuf, R. Azis, Muhammad Syazwan Mustaffa","doi":"10.5772/INTECHOPEN.80461","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.80461","url":null,"abstract":"Functional nanoferrite thin films are used in various fields of our life. There are many different methods used to fabricate thin films including sputter deposition, flash laser evaporation pulsed laser deposition (PLD), chemical vapor deposition (PVD) and spin-coating process. In each of these methods, it produces an amorphous phase of the deposited film. To produce a crystalline film, an additional high-temperature processing is required. The high-temperature process can lead to considerable constraints in combining the desirable characteristics of a crystalline nanoferrite thin film with those of thermally unstable substrates and other device components. High-temperature thin-film processing is also a considerable cost to manufacturing. This chapter will report a simple procedure of the sol-gel precursor method for fabrication of NiZn nanoferrite (Ni0.3Zn0.7Fe2O4) thin films and spin-coating method in coating a chemical solution. This method generally provides for both low-temperature deposition and crystallization of NiZn nanoferrite thin films.","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122531040","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Ti-Al-N-Based Hard Coatings: Thermodynamical Background, CVD Deposition, and Properties. A Review","authors":"Florent Uny, E. Blanquet, F. Schuster, F. Sanchette","doi":"10.5772/INTECHOPEN.79747","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.79747","url":null,"abstract":"For several decades, the increasing productivity in many industrial domains has led to a significant and ever-increased interest to protective and hard coatings. In this context, titanium-aluminum nitrides were developed and are now widely used in a large range of applications, due to their high hardness, good thermal stability, and oxidation resistance. This chapter reviews the thermodynamical characteristics of the Ti-Al-N system by reporting the progress made in the description of the Ti-Al-N phase diagram and the main mechanical and chemical properties of Ti 1 (cid:1) x Al x N-based coatings. As a metastable phase, the existence of the fcc-Ti 1 (cid:1) x Al x N depends on particular process parameters, allowing stabilizing this desirable solid solution. The influence of process parameters, with a par- ticular interest for chemical vapor deposition (CVD) methods, on morphology and crystallographic structure is then described. The structure of Ti 1 (cid:1) x Al x N thin films depends also on the aluminum content as well as on the annealing temperature, due to the spinodal nature of the Ti-Al-N system. These changes of crystallographic structure can induce an improvement of the hardness, oxidation resistance, and wear behavior of these coatings. The main mechanical and chemical properties of physical vapor deposition (PVD) and CVD Ti 1 (cid:1) x Al x N-based coatings are also described.","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130095319","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Surface Modification of Polystyrene by Nitrogen Plasma Treatment","authors":"Masruroh, D. Santjojo","doi":"10.5772/INTECHOPEN.79716","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.79716","url":null,"abstract":"Polystyrene has been utilized in biomedical purposes, interacting with various biologi- cal molecules. The interactions can be physical adsorption or a long-lasting chemical bonding, depending on the surface characteristic and behaviors. The characteristic can be designed related to the targeted interactions with the molecules by creating certain roughness, morphology, and patterns of the surface. Original characteristics of the mate - rial were usually enhanced by its surface modifications. Plasma treatments have been used to modify the polymer surfaces, resulting in a specifically targeted behavior such as hydrophobicity and molecule selectivity through the physical adsorption. A nitrogen plasma treatment is one of the effective and economical surface modification processes. The nitrogen gas is abundant in the atmosphere and generates nontoxic active plasma species for the polymer surface modification. The plasma treatment effectively changes the hydrophobicity and adsorption of the surface. W ), were utilized in this work, that is, 35, 129, and 280 kDa. This work utilized four different solvents to investigate the relation between the solvent and the effect of the plasma treatments. The solvents, that is, chloroform, toluene, xylene, and tetrahydrofuran, were also obtained from Sigma Aldrich. Each of the solutions was then deposited on a substrate by the spin-coating method. The specific quantity of the solution drop and rotation per minute was optimized and set for all the specimens. The polystyrene films were then heated in an oven after the deposition. The treatment was carried out to dry the excess solvent and to enhance interfacial bonding between the film and the substrate. roughness before treatment. Further results of the plasma treatment on the film produced with various molecular weights revealed that the plasma treatment has more effect on chang ing the surface roughness but less effect on changing the wettability of the larger molecular weight. This indicates that the plasma treatment resulted in the modification of the surface microstructure and morphology beside the surface roughness. The modification was con trolled by the incorporation of the nitrogen from the plasma into the polystyrene’s molecules.","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134269363","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Advances in Scanning Thermal Microscopy Measurements for Thin Films","authors":"Liliana Vera-Londono, O. Caballero‐Calero, J. Pérez-Taborda, M. Martín‐González","doi":"10.5772/INTECHOPEN.79961","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.79961","url":null,"abstract":"The authors acknowledge the financial support of the Intramural INFANTE, and MAT2017-\u000086450-C4-3-R, as well as the service from the MiNa Laboratory at IMN, and funding from CM\u0000(project SpaceTec, S2013/ICE2822), MINECO (project CSIC13-4E-1794), and EU (FEDER, FSE).\u0000O.C.C. acknowledges the funding of the Ramon y Cajal program (MINECO).","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"171 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123260637","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Textured BST Thin Film on Silicon Substrate: Preparation and Its Applications for High Frequency Tunable Devices","authors":"Congchun Zhang, Jianze Huang, Chunsheng Yang, G. Ding","doi":"10.5772/INTECHOPEN.79270","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.79270","url":null,"abstract":"The dielectric properties of Ba 0.5 Sr 0.5 TiO 3 (BST) thin films are sensitive to the relative crystal - lographic orientation of the films. LaNiO 3 (LNO) and MgO were deposited as buffer layer on Si substrate before BST. The effect of buffer layer such as LNO, MgO and MgO/LNO bilayer on the microstructure and dielectric properties of BST were extensively investi - gated. The preferred (100) orientation of LNO by radio frequency (RF) magnetron sput tering was dominated by the substrate temperature and highly (100)-oriented LNO thin films were grown on Si substrates at 300°C. The oriented (100) growth of sputtered BST thin films was strongly affected by the orientation of LNO thin films and the tunability of BST thin film was greatly improved with the insertion of (100)-textured LNO buffer layer. In addition, MgO, as a buffer layer, was deposited by RF magnetron sputtering. The results show that the crystallization of BST was also enhanced by the insertion of MgO buffer layer, which enhances the oriental growth of BST along (100). Also, the tunability of the BST thin films was improved and the dielectric loss greatly decreased. Finally, CPW with BST/MgO multilayer was fabricated and the scattering (S) parameters were tested.","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"4 7","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120984005","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"CdTe Thin Films: Deposition Techniques and Applications","authors":"A. Arce-Plaza, F. Sánchez-Rodríguez, M. Courel-Piedrahita, O. V. Galán, V. Hernández-Calderón, S. Ramírez-Velasco, M. Lopez","doi":"10.5772/INTECHOPEN.79578","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.79578","url":null,"abstract":"The II-IV semiconductor compound, CdTe, has suitable electrical and optical properties as photovoltaic and high-energy radiation sensor material. As an absorber material for thin-film-based solar cells, CdTe holds the potentiality to fabricate high-efficiency solar cells by means of low-cost technologies. This chapter presents a comprehensive review on the CdTe thin-film deposition techniques as well as on the several configurations for the solar cell structures that have led the best efficiency conversion. Current CdTe thin-film deposition techniques include sputtering, close spaced vapor transport (CSVT), chemical spray pyrolysis, and electrodeposition. These techniques have easily been adapted to deposit polycrystalline CdTe films on various flexible and rigid substrates. In regard to the device structure configuration, a variety of partner materials (transparent contact, optical window, buffer layer) were tested, and CdTe film thickness was varied to develop opaque and semitransparent devices by some techniques mentioned above. In this chapter, we will discuss about each technique used for CdTe thin-film deposition as well as its advantages and disadvantages.","PeriodicalId":446337,"journal":{"name":"Coatings and Thin-Film Technologies","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-11-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132765847","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}