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Electronic Device Architectures for the Nano-CMOS Era最新文献

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Single Electron Devices and Applications 单电子器件及其应用
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.1142/9789814241298_0010
J. Gautier, X. Jehl, Marc Sanquert
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引用次数: 3
Devices Structures and Carrier Transport Properties of Advanced CMOS Using High Mobility Channels 采用高迁移率通道的先进CMOS器件结构和载流子输运特性
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.1201/9780429086335-3
S. Takagi, T. Tezuka, T. Irisawa, S. Nakaharai, T. Numata, K. Usuda, N. Sugiyama, Masato Shichijot, R. Nakane, S. Sugahara
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引用次数: 0
Spin Electronics 自旋电子
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.1142/9789814241298_0013
Lee Kyung-jin, Lim Sang Ho
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引用次数: 0
Fabrication of Source and Drain — Ultra Shallow Junction 源漏极浅结的制造
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.1142/9789814241298_0005
B. Mizuno
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引用次数: 0
The Longer Term: Quantum Information Processing and Communication 长期:量子信息处理和通信
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.1142/9789814241298_0014
Jorrand Philippe
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引用次数: 0
Technologies and Key Design Issues for Memory Devices 存储设备的技术和关键设计问题
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.1142/9789814241298_0007
Kinam Kim, G. Jeong
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引用次数: 0
New Interconnect Schemes: End of Copper, Optical Interconnects? 新的互连方案:铜缆、光互连的终结?
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.1142/9789814241298_0006
S. Laval, L. Vivien, E. Cassan, D. Marris-Morini, J. Fédéli
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引用次数: 0
Advanced CMOS Devices on Bulk and SOI: Physics, Modeling and Characterization 基于块体和SOI的先进CMOS器件:物理、建模和表征
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.1142/9789814241298_0002
T. Poiroux, G. Carval
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引用次数: 1
High-K Gate Dielectrics 高k门电介质
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.4032/9789814241298
D. Misra, H. Iwai, H. Wong
{"title":"High-K Gate Dielectrics","authors":"D. Misra, H. Iwai, H. Wong","doi":"10.4032/9789814241298","DOIUrl":"https://doi.org/10.4032/9789814241298","url":null,"abstract":"","PeriodicalId":404862,"journal":{"name":"Electronic Device Architectures for the Nano-CMOS Era","volume":"74 1-4","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120906680","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
FeRAM and MRAM Technologies FeRAM和MRAM技术
Electronic Device Architectures for the Nano-CMOS Era Pub Date : 2019-05-08 DOI: 10.1201/B11128-11
Y. Arimoto
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引用次数: 0
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