L. Stanek, Raymond Clay, III, K. Beckwith, M. Wood, C. Dharma-wardana, Michael Murillo
{"title":"Effective Pair Potentials for Dense Plasma Applications.","authors":"L. Stanek, Raymond Clay, III, K. Beckwith, M. Wood, C. Dharma-wardana, Michael Murillo","doi":"10.2172/1836178","DOIUrl":"https://doi.org/10.2172/1836178","url":null,"abstract":"","PeriodicalId":360732,"journal":{"name":"Proposed for presentation at the International Conference on Plasma Sciences held December 6-10, 2020.","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114693427","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}