L. Stanek, Raymond Clay, III, K. Beckwith, M. Wood, C. Dharma-wardana, Michael Murillo
{"title":"Effective Pair Potentials for Dense Plasma Applications.","authors":"L. Stanek, Raymond Clay, III, K. Beckwith, M. Wood, C. Dharma-wardana, Michael Murillo","doi":"10.2172/1836178","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":360732,"journal":{"name":"Proposed for presentation at the International Conference on Plasma Sciences held December 6-10, 2020.","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proposed for presentation at the International Conference on Plasma Sciences held December 6-10, 2020.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2172/1836178","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}