ICTACT Journal on Microelectronics最新文献

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CURRENT CONTROLLED TRANSCONDUCTANCE AMPLIFIER (CCTA) USING ADVANCED DESIGN SYSTEM 采用先进设计系统的电流控制跨导放大器
ICTACT Journal on Microelectronics Pub Date : 2020-01-01 DOI: 10.21917/ijme.2020.0145
M. A. Deshmukh, U. Kshirsagar
{"title":"CURRENT CONTROLLED TRANSCONDUCTANCE AMPLIFIER (CCTA) USING ADVANCED DESIGN SYSTEM","authors":"M. A. Deshmukh, U. Kshirsagar","doi":"10.21917/ijme.2020.0145","DOIUrl":"https://doi.org/10.21917/ijme.2020.0145","url":null,"abstract":"Complementary Metal Oxide Semiconductor (CMOS) is a technology used to produce integrated circuit. CMOS circuits are found in several types of electronic components, including microprocessors, batteries and digital camera image sensors. The MOS in CMOS refers to the transistor in a CMOS component called MOSFETs (metal oxide semiconductor field-effect transistors). In the project we are going to design novel CCCCTA, developed in CMOS technology using Advanced Design System (ADS). Current conveyors are unity gain active building block having high linearity, wide dynamic range and provide higher gain-bandwidth product. The current conveyors operate at low voltage supplies and consume less power. It has high input impedance, low output impedance, high CMRR and high slew rate. The current mode circuits such as Current conveyors have emerged as an important class of circuits in the field of analog electronics. The new structured CCCCTA the balanced differential-pair structure is used instead of the trans-linear structure as in the original CCCCTA and our proposed block are the requirements of bias current which is used to control the parasitic resistance at the input current port and the number of MOSFETs.","PeriodicalId":33160,"journal":{"name":"ICTACT Journal on Microelectronics","volume":" ","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"48341157","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
DESIGN AND ANALYSIS OF InP AND GaAs DOUBLE GATE MOSFET TRANSISTORS FOR LOW POWER APPLICATIONS 用于低功率应用的InP和GaAs双栅极MOSFET晶体管的设计与分析
ICTACT Journal on Microelectronics Pub Date : 2020-01-01 DOI: 10.21917/ijme.2020.0151
A. S. Geege, P. Vimala, T. S. Arun Samuel, N. Arumugam
{"title":"DESIGN AND ANALYSIS OF InP AND GaAs DOUBLE GATE MOSFET TRANSISTORS FOR LOW POWER APPLICATIONS","authors":"A. S. Geege, P. Vimala, T. S. Arun Samuel, N. Arumugam","doi":"10.21917/ijme.2020.0151","DOIUrl":"https://doi.org/10.21917/ijme.2020.0151","url":null,"abstract":"This paper deals with a novel Double Gate MOSFET (DG MOSFET) which is constructed by the unification of III group materials (Indium, Gallium) and V group materials (Phosphide, Arsenide) is analyzed. Due to its short channel effect immunization, leakage current reduction and higher scaling potential, DG MOSFET as one of the most comforting devices for low power applications. In this work, we investigated the effect of DG MOSFET based on Indium Phosphide (InP) and Gallium Arsenide (GaAs) on optimal performance and drain current characteristics by replacing traditional DG MOSFET based on silicon. The transistor’s channel length is set to 20 nm. Both devices have been modeled using the NanoHub simulator and characteristics has been examined using Matlab. The descriptive analysis of characteristics has been performed through the corresponding plot structures - energy band structure, I D vs V GS characteristics, I D vs V GS characteristics, transconductance. From the results provided, it has been found that the DG MOSFET device based on InP offers ON current 10 -3 A is better than the DG MOSFET device based on Silicon and Gallium Arsenide (GaAs).","PeriodicalId":33160,"journal":{"name":"ICTACT Journal on Microelectronics","volume":"1 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"44238633","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
DESIGN AND ANALYSIS OF QUAD BAND ANTENNA FOR WIRELESS SYSTEMS 无线系统四波段天线的设计与分析
ICTACT Journal on Microelectronics Pub Date : 2020-01-01 DOI: 10.21917/ijme.2020.0149
Kuldeep Galav, M. Meena
{"title":"DESIGN AND ANALYSIS OF QUAD BAND ANTENNA FOR WIRELESS SYSTEMS","authors":"Kuldeep Galav, M. Meena","doi":"10.21917/ijme.2020.0149","DOIUrl":"https://doi.org/10.21917/ijme.2020.0149","url":null,"abstract":"In this topic we are going to design a compact size antenna which is used for different band using a single antenna. The term compact means the size of antenna is very less, which is 24×30mm2. In this antenna designing we are using partial ground plane and is fabricated on Roger RTduroid 5880 with thickness of 0.79mm. In this antenna we have three inverted L shaped stub and a stub of combination of inverted L shape and T shape. This antenna resonates at three frequencies 2.54/3.51/4.38/5.3GHz. So the operating range of antenna covers these frequencies so main use of this antenna is in Wi-MAX (wide interoperability for microwave access) and WLAN (wireless local area network) and radio altimeter, satellite communication, cordless telephones and weather radar systems. All the parameters and details are examined in following points.","PeriodicalId":33160,"journal":{"name":"ICTACT Journal on Microelectronics","volume":" ","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"46767874","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
PROCESS FOR IMPLEMENTATION OF TRANSMISSION LINE ON STANDARD SILICON SUBSTRATE AND ITS CHARACTERIZATION AT KA-BAND 在标准硅衬底上实现传输线的工艺及其在ka波段的特性
ICTACT Journal on Microelectronics Pub Date : 2020-01-01 DOI: 10.21917/ijme.2020.0150
K. Singh, A. V. Nirmal
{"title":"PROCESS FOR IMPLEMENTATION OF TRANSMISSION LINE ON STANDARD SILICON SUBSTRATE AND ITS CHARACTERIZATION AT KA-BAND","authors":"K. Singh, A. V. Nirmal","doi":"10.21917/ijme.2020.0150","DOIUrl":"https://doi.org/10.21917/ijme.2020.0150","url":null,"abstract":"Planar transmission line on silicon substrate imposes certain challenges at higher frequencies and measurement of the same employing wafer probing techniques needs accurate characterization. Wafer measurement provides information related with the device performance which in turn helps to minimize parasitic related with package and assembly. Wafer probing at higher frequencies imposes certain challenges more so ever on silicon substrate. Silicon substrate due to semiconductor in nature is a lossy medium for radio frequencies and standard wafer is not suitable for the realization of RF circuits. Present article demonstrate realization of planar transmission line on high resistivity silicon substrate by employing thick oxide layer. Both simulated and measured results are presented in this article and the CPW line fabricated with the proposed process results in ~1dB loss with better than 12dB return loss at Ka-band. Measurement techniques for the line characterization are detailed in this article along with transmission line characterization at Ka-band.","PeriodicalId":33160,"journal":{"name":"ICTACT Journal on Microelectronics","volume":" ","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"48674756","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
FPGA IMPLEMENTATION OF CALIB_IO, WAVE AND CLOCK GENERATION MODULES FOR GRAIN SORTING MACHINE 粮食分拣机calibio、波形和时钟生成模块的FPGA实现
ICTACT Journal on Microelectronics Pub Date : 2020-01-01 DOI: 10.21917/ijme.2020.0147
S. Sujitha, N. Augustia
{"title":"FPGA IMPLEMENTATION OF CALIB_IO, WAVE AND CLOCK GENERATION MODULES FOR GRAIN SORTING MACHINE","authors":"S. Sujitha, N. Augustia","doi":"10.21917/ijme.2020.0147","DOIUrl":"https://doi.org/10.21917/ijme.2020.0147","url":null,"abstract":"The color sorting machines inspect grains by means of sensors and remove contaminants by a short burst of compressed air by using the color difference. Grain Sorting machines are successfully being used in the rice milling industry for long time. The color sorters are used in the grain cleaning to remove unwanted materials like dust particles, black tip, burnt, other discolored grains and other inner contaminants. Today’s advanced color sensors are robust, compact, requires less maintenance and consumes very little energy. Hence, these color sensors can be considered for inclusion in any modern grain cleaning plant. This paper aims to develop Calib_IO, Wave Generation and Clock Generation modules for grain sorting machine to remove unwanted materials like dust particles, black tip, burnt, other discolored grains and other inner contaminants and to increase its processing speed. Clock generation module is designed using Quartus II software and is implemented in Cyclone IV E (FPGA KIT) that incorporates compact color sensors for sorting grains.","PeriodicalId":33160,"journal":{"name":"ICTACT Journal on Microelectronics","volume":" ","pages":""},"PeriodicalIF":0.0,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"45945387","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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