{"title":"Types of Semiconductors","authors":"","doi":"10.1002/9781119597124.ch3","DOIUrl":"https://doi.org/10.1002/9781119597124.ch3","url":null,"abstract":"Semiconductors are mainly classified into two categories: 1. Intrinsic Semiconductor 2. Extrinsic Semiconductor Intrinsic Semiconductor An intrinsic semiconductor material is chemically very pure and possesses poor conductivity. It has equal numbers of negative carriers (electrons) and positive carriers (holes). Extrinsic Semiconductor Where as an extrinsic semiconductor is an improved intrinsic semiconductor with a small amount of impurities added by a process, known as doping, which alters the electrical properties of the semiconductor and improves its conductivity. Depending on whether the added impurities have “extra” electrons or “missing” electrons determines how the bonding in the crystal lattice is affected as shown in figure, and therefore how the material’s electrical properties change.","PeriodicalId":321967,"journal":{"name":"Semiconductor Basics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-08-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128223899","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Appendix C: List of Acronyms","authors":"A. Engel","doi":"10.1002/9780470618851.app3","DOIUrl":"https://doi.org/10.1002/9780470618851.app3","url":null,"abstract":"","PeriodicalId":321967,"journal":{"name":"Semiconductor Basics","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132613787","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Integrated Circuit Fabrication","authors":"닐슨 러셀, 리우 젱따오, 트란 루안씨., 에릭 프리만","doi":"10.1002/9781119597124.ch10","DOIUrl":"https://doi.org/10.1002/9781119597124.ch10","url":null,"abstract":"How to define the pattern on integrated circuit 100 by using the photolithography comprises a step of defining a plurality of features in first photoresist layer on the first region 102 of the substrate 108. The method comprises the steps of using pitch multiplication to produce at least two features 120 of the lower mask layer 116 for each of the features in the photoresist layer. Feature of the lower masking layer 116 include the looped end 124. The method includes covering the second region 104 of the substrate 108 including the looped end 124 of the lower masking layer 116 in the second photoresist layer (126). The method comprises the steps of etching a pattern of trenches in the substrate (108) further through the features of the lower layer without etching mask in the second region 104. Trenches have a trench width. Photolithography, pitch multiplication, pitch doubling, integrated circuit, looped end","PeriodicalId":321967,"journal":{"name":"Semiconductor Basics","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-02-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123819036","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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