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The Anneal Temperature Effect on the BTO and NZFO Flims and Their Capacitance - Inductance Integrated Device 退火温度对BTO和NZFO薄膜及其电容电感集成器件的影响
Semiconductor Science and Information Devices Pub Date : 2019-10-31 DOI: 10.30564/ssid.v1i1.606
Zhen-zhu Zheng, Yuhao Shi, Xinyu Liang, Chunqing Wang
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引用次数: 0
A Foreword from the Editor-in-Chief 总编辑的前言
Semiconductor Science and Information Devices Pub Date : 2019-10-31 DOI: 10.30564/ssid.v1i1.1330
K. Vasudevan
{"title":"A Foreword from the Editor-in-Chief","authors":"K. Vasudevan","doi":"10.30564/ssid.v1i1.1330","DOIUrl":"https://doi.org/10.30564/ssid.v1i1.1330","url":null,"abstract":"Welcome to the inaugral issue of Semiconductor Science and Information Devices.","PeriodicalId":315789,"journal":{"name":"Semiconductor Science and Information Devices","volume":"os-53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127790370","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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