F. Sharov, S. Moxim, D. Hughart, G. Haase, P. Lenahan
{"title":"Early Stage Mechanisms in Time-Dependent Dielectric Breakdown in the Si/SiO2 System.","authors":"F. Sharov, S. Moxim, D. Hughart, G. Haase, P. Lenahan","doi":"10.2172/1903089","DOIUrl":"https://doi.org/10.2172/1903089","url":null,"abstract":"","PeriodicalId":312698,"journal":{"name":"Proposed for presentation at the 52nd IEEE Semiconductor Interface Specialists Conference in , .","volume":"125 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115582583","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}