F. Sharov, S. Moxim, D. Hughart, G. Haase, P. Lenahan
{"title":"Early Stage Mechanisms in Time-Dependent Dielectric Breakdown in the Si/SiO2 System.","authors":"F. Sharov, S. Moxim, D. Hughart, G. Haase, P. Lenahan","doi":"10.2172/1903089","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":312698,"journal":{"name":"Proposed for presentation at the 52nd IEEE Semiconductor Interface Specialists Conference in , .","volume":"125 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proposed for presentation at the 52nd IEEE Semiconductor Interface Specialists Conference in , .","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2172/1903089","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}