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Test structures for residual stress monitoring in the integrated CMOS-MEMS process development CMOS-MEMS集成工艺开发中残余应力监测的测试结构
International Conference on Synthesis, Modeling, Analysis and Simulation Methods and Applications to Circuit Design Pub Date : 2016-06-27 DOI: 10.1109/SMACD.2016.7520745
C. Álvarez, M. L. Aranda, A. Torres-Jácome, W. C. Arriaga
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引用次数: 2
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