Laser Chemistry最新文献

Oxide Thin Film Heterostructures on Large Area, with Flexible Doping, Low Dislocation Density, and Abrupt Interfaces: Grown by Pulsed Laser Deposition 具有柔性掺杂、低位错密度和突然界面的大面积氧化薄膜异质结构:脉冲激光沉积生长

Laser Chemistry Pub Date : 2010-12-13 DOI: 10.1155/2010/140976

M. Lorenz, H. Hochmuth, C. Grüner, H. Hilmer, A. Lajn, D. Spemann, M. Brandt, J. Zippel, R. Schmidt‐Grund, H. von Wenckstern, M. Grundmann

引用次数: 25

Carbon Monoxide Oxidation on Nanostructured Pt Thin Films Synthesized by Pulsed Laser Deposition: Insights into the Morphology Effects 一氧化碳氧化对脉冲激光沉积纳米结构铂薄膜的影响

Laser Chemistry Pub Date : 2010-11-04 DOI: 10.1155/2010/143684

Fatma Saidani, D. Rochefort, M. Mohamedi

引用次数: 1

Effect of Potential, Temperature, and Fluoride Ions on the Repassivation Kinetics of Titanium in Phosphate Buffered Saline Solution with the Photon Rupture Method 光子破裂法研究电位、温度和氟离子对钛在磷酸盐缓冲盐溶液中再钝化动力学的影响

Laser Chemistry Pub Date : 2009-07-14 DOI: 10.1155/2009/436065

M. Sakairi, Hiroomi Miyata, T. Kikuchi, Hideaki Takahashi

引用次数: 3

Development, Characterization, and Application of a Versatile Single Particle Detection Apparatus for Time-Integrated and Time-Resolved Fluorescence Measurements—Part I: Theoretical Considerations 开发，表征和应用的多功能单粒子检测仪器的时间集成和时间分辨荧光测量-第一部分:理论考虑

Laser Chemistry Pub Date : 2009-06-14 DOI: 10.1155/2009/295765

Xihong Wu, N. Omenetto, J. Winefordner

{"title":"Development, Characterization, and Application of a Versatile Single Particle Detection Apparatus for Time-Integrated and Time-Resolved Fluorescence Measurements—Part I: Theoretical Considerations","authors":"Xihong Wu, N. Omenetto, J. Winefordner","doi":"10.1155/2009/295765","DOIUrl":"https://doi.org/10.1155/2009/295765","url":null,"abstract":"Recent progress in aerosol science has resulted in more challenging demands in the design of new particle beam introduction systems. In this paper, the concept of a variable orifice aerodynamic lens system is presented and supported by the numerical simulation results. This novel particle beam inlet can serve as either a narrow band pass filter (a particle segregator) that only confines particles with a specific size or a broad band pass filter (a particle concentrator) that allows particles with a wide size range to be concentrated on the beam axis. Following a brief description of the inlet system, computational details are described. Simulation of this inlet has been carried out by the commercial computational fluid dynamics protocol FLUENT. Focusing performance and characteristic of single-thin plate orifices have been first revealed and discussed, and then the dynamics and advantages of using multiple lenses with variable orifices are addressed. It is clearly shown that the focusing size range can be primarily adjusted by varying the working pressure, the orifice geometry, and/or the arrangement of orifices. As a result, a selection of the desired particle focusing size range can be achieved without the need of changing the inlet, thus increasing the versatility of the device for a broad range of applications.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134157615","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 5

Gratings in structured optical fibres 结构光纤中的光栅

Laser Chemistry Pub Date : 2008-12-01 DOI: 10.1155/2008/239417

J. Canning, N. Groothoff, K. Cook, C. Martelli, A. Pohl, J. Holdsworth, S. Bandyopadhyay, M. Stevenson

引用次数: 29

Photosensitivity of the Er/Yb-Codoped Schott IOG1 Phosphate Glass Using 248 nm, Femtosecond, and Picosecond Laser Radiation 利用248 nm、飞秒和皮秒激光辐射研究Er/ yb共掺肖特IOG1磷酸盐玻璃的光敏性

Laser Chemistry Pub Date : 2008-11-24 DOI: 10.1155/2008/868767

S. Pissadakis, I. Michelakaki

{"title":"Photosensitivity of the Er/Yb-Codoped Schott IOG1 Phosphate Glass Using 248 nm, Femtosecond, and Picosecond Laser Radiation","authors":"S. Pissadakis, I. Michelakaki","doi":"10.1155/2008/868767","DOIUrl":"https://doi.org/10.1155/2008/868767","url":null,"abstract":"The effect of 248 nm laser radiation, with pulse duration of 5 picoseconds, 500 femtoseconds, and 120 femtoseconds, on the optical properties and the Knoop hardness of a commercial Er/Yb-codoped phosphate glass is presented here. Refractive index changes of the order of few parts of 10-4 are correlated with optical absorption centers induced in the glass volume, using Kramers-Kroning relationship. Accordingly, substantially lower refractive index changes are measured in volume Bragg gratings inscribed in the glass, indicating that, in addition to the optical density changes, volume dilation changes of negative sign may also be associated with the 248 nm ultrafast irradiation. The Knoop hardness experimental results reveal that the glass matrix undergoes an observable initial hardening and then a reversing softening and volume dilation process for modest accumulated energy doses, where the Knoop hardness follows a nonmonotonic trend. Comparative results on the Knoop hardness trend are also presented for the case of 193 nm excimer laser radiation. The above findings denote that the positive or negative evolution of refractive index changes induced by the 248 nm ultrafast radiation in the glass is dominated by the counteraction of the color center formation and the volume modification effects.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123476407","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 3

Laser-Induced Backside Wet Etching of Transparent Materials with Organic and Metallic Absorbers 含有机和金属吸收剂的透明材料激光诱导背面湿法蚀刻

Laser Chemistry Pub Date : 2008-11-16 DOI: 10.1155/2008/170632

K. Zimmer, R. Böhme

引用次数: 28

Three-Dimensional Modeling of the Heat-Affected Zone in Laser Machining Applications 激光加工中热影响区的三维建模

Laser Chemistry Pub Date : 2008-11-09 DOI: 10.1155/2008/976205

M. Beresna, T. Gertus, R. Tomašiūnas, H. Misawa, S. Juodkazis

引用次数: 10

Two-Photon Polymerization of Hybrid Sol-Gel Materials for Photonics Applications 混合溶胶-凝胶材料在光子学应用中的双光子聚合

Laser Chemistry Pub Date : 2008-10-28 DOI: 10.1155/2008/493059

A. Ovsianikov, A. Gaidukevičiūtė, B. Chichkov, M. Oubaha, B. MacCraith, I. Sakellari, A. Giakoumaki, D. Gray, M. Vamvakaki, M. Farsari, C. Fotakis

引用次数: 65

Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation 纳秒和飞秒紫外激光烧蚀加工介质光学涂层

Laser Chemistry Pub Date : 2008-10-16 DOI: 10.1155/2008/623872

J. Ihlemann, J. Békési, J. Klein-Wiele, P. Simon

{"title":"Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation","authors":"J. Ihlemann, J. Békési, J. Klein-Wiele, P. Simon","doi":"10.1155/2008/623872","DOIUrl":"https://doi.org/10.1155/2008/623872","url":null,"abstract":"Microprocessing of dielectric optical coatings by UV laser ablation is demonstrated. Excimer laser ablation at deep UV wavelengths (248 nm, 193 nm) is used for the patterning of thin oxide films or layer stacks. The layer removal over extended areas as well as sub-μm-structuring is possible. The ablation of SiO2, Al2O3, HfO2, and Ta2O5 layers and layer systems has been investigated. Due to their optical, chemical, and thermal stability, these inorganic film materials are well suited for optical applications, even if UV-transparency is required. Transparent patterned films of SiO2 are produced by patterning a UV-absorbing precursor SiOx suboxide layer and oxidizing it afterwards to SiO2. In contrast to laser ablation of bulk material, in the case of thin films, the layer-layer or layer-substrate boundaries act as predetermined end points, so that precise depth control and a very smooth surface can be achieved. For large area ablation, nanosecond lasers are well suited; for patterning with submicron resolution, femtosecond excimer lasers are applied. Thus the fabrication of optical elements like dielectric masks, pixelated diffractive elements, and gratings can be accomplished.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129792334","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 5