Standards, Methods and Solutions of Metrology最新文献

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Biotoxicological Monitoring of Organic Solvents in the Tunisian Footwear Industry 突尼斯制鞋业有机溶剂的生物毒理学监测
Standards, Methods and Solutions of Metrology Pub Date : 2019-10-02 DOI: 10.5772/intechopen.86295
I. Gargouri, F. Omrane, M. Khadhraoui
{"title":"Biotoxicological Monitoring of Organic Solvents in the Tunisian Footwear Industry","authors":"I. Gargouri, F. Omrane, M. Khadhraoui","doi":"10.5772/intechopen.86295","DOIUrl":"https://doi.org/10.5772/intechopen.86295","url":null,"abstract":"Organic solvents (OS) are widely used in Tunisian footwear industry; however, there are no data related to employees ’ exposure. The objective of this study was therefore to adjust analytical methods in our laboratory for exposure assessment purposes. The predominant solvents are acetone, cyclohexane, hexane, methyl ethyl ketone, and toluene. Eighteen companies benefited from 55 airborne and 190 urine samples. Quantification of solvents and their metabolites was achieved by analytical methods that were adapted and validated in our laboratory. Airborne solvents were determined using gas chromatography (GC-FID). Urinary solvents or metabolites were measured either by GC or high-performance liquid chromatography (HPLC). Validation criteria were determined and used to judge the methods reliability. For airborne solvents, the concentrations exceeding the threshold limit value are mainly for hexane. For urines, the hippuric acid concentrations exceeded the biological limit value in semi-industrial process. Surprisingly, trans, trans-muconic acid was found in industrial and artisanal processes even though benzene was not among the used products. GC and HPLC methods have been adjusted, optimized, and effectively used to quantify OS and their metabolites in airborne and urine samples. Thus, a process of occupational risk assessment via a biotoxicological and airborne monitoring for solvents is now set.","PeriodicalId":275425,"journal":{"name":"Standards, Methods and Solutions of Metrology","volume":"34 2","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"113956567","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis of Pulsating White Dwarf Star Light Curves 脉动白矮星光曲线分析
Standards, Methods and Solutions of Metrology Pub Date : 2019-07-05 DOI: 10.5772/INTECHOPEN.86404
D. Sullivan
{"title":"Analysis of Pulsating White Dwarf Star Light Curves","authors":"D. Sullivan","doi":"10.5772/INTECHOPEN.86404","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.86404","url":null,"abstract":"Analysis techniques are presented for extracting the frequencies contained in the light curves of pulsating white dwarf stars. In several surface temperature regimes, these astronomical objects are unstable to gravity mode pulsations which result in brightness variations corresponding to the periods of the excited modes. There is a rich array of possible periods with values ranging from about 100 to 1000 seconds. Mode periods present in the light curve are detected by undertaking a Fourier analysis of the time series light curve; theoretical models of the star can be refined with this information. The Fourier analysis needs to take into account such things as finite length, data gaps and the presence of noise.","PeriodicalId":275425,"journal":{"name":"Standards, Methods and Solutions of Metrology","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121467208","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Self-Calibration of Precision XYθz Metrology Stages 精密y θz计量级的自校准
Standards, Methods and Solutions of Metrology Pub Date : 2019-04-12 DOI: 10.5772/INTECHOPEN.85539
Chuxiong Hu, Yu Zhu, Luzheng Liu
{"title":"Self-Calibration of Precision XYθz Metrology Stages","authors":"Chuxiong Hu, Yu Zhu, Luzheng Liu","doi":"10.5772/INTECHOPEN.85539","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.85539","url":null,"abstract":"This chapter studies the on-axis calibration for precision XYθz metrology stages and presents a holistic XYθz self-calibration approach. The proposed approach uses an artifact plate, specially designed with XY grid mark lines and angular mark lines, as a tool to be measured by the XYθz metrology stages. In detail, the artifact plate is placed on the uncalibrated XYθz metrology stages in four measurement postures or views. Then, the measurement error can be modeled as the construction of XYθz systematic measurement error (i.e. stage error), artifact error, misalignment error, and random measurement noise. With a new property proposed, redundance of the XYθz stage error is obtained, while the misalignment errors of all measurement views are determined by rigid mathematical processing. Resultantly, a least squarebased XYθz self-calibration law is synthesized for final determination of the stage error. Computer simulation is conducted, and the calculation results validate that the proposed scheme can accurately realize the stage error even under the existence of various random measurement noise. Finally, the designed artifact plate is developed and illustrated for explanation of a standard XYθz self-calibration procedure to meet practical industrial requirements.","PeriodicalId":275425,"journal":{"name":"Standards, Methods and Solutions of Metrology","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134256842","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Metrological Traceability at Different Measurement Levels 不同测量水平的计量溯源性
Standards, Methods and Solutions of Metrology Pub Date : 2019-03-10 DOI: 10.5772/INTECHOPEN.84853
O. Velychko, T. Gordiyenko
{"title":"Metrological Traceability at Different Measurement Levels","authors":"O. Velychko, T. Gordiyenko","doi":"10.5772/INTECHOPEN.84853","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.84853","url":null,"abstract":"The international agreements are the basis for establishing the global metrological traceability at different measurement levels. The concepts and concept relations around metrological traceability are presented. An important element of providing the metrological traceability is the evaluation of measurement uncertainty. The procedure of linking of key and supplementary comparison results is described. Linking of key and supplementary comparison results of the Regional Metrology Organization for some quantities according to the described procedure was presented. Results for all participants of presented key and supplementary comparisons are satisfactory for chi-square test and E n number. The procedure of linking of key or supplementary comparison and national inter-laboratory comparison results is described. This procedure can be used for practical evaluation of specific interlaboratory comparison results on a national level in different countries by means of laboratory results of the National Metrology Institute and Designated Institute. This procedure can contribute the mutual recognition of measurement and testing results by different countries. Linking of key comparison and inter-laboratory comparison results for some quantities according to the described procedure was presented. Results for all participants of presented key comparison and interlaboratory comparison are satisfactory for chi-square test, E n number, z scores and ζ scores. procedure can be used for practical estimation of results specific ILC on a national level by means of the results from NMI/DI laboratories. Linking of COOMET.EM-K6.a comparison and national ILC of AC/DC voltage transfer difference results was presented. The value of chi-square test was calculated and the obtained value of chi-square test for all participants can be considered consistent. Results for all participants of comparisons are satisfactory for E n number (from 0.10 to 0.83), z scores (from 0.01 to 2.22), and ζ scores (from 0.05 to 0.41).Results of this linking can be used also for different metrological areas as technical basis of confirming CMC accredited laboratories. Such work can be done by RL of the ILC, as well as by metrological experts. The RL of the ILC can also implement a full assessment of the uncertainty budget and the metrological traceability for validation of their CMCs in a wide range of used quantities.","PeriodicalId":275425,"journal":{"name":"Standards, Methods and Solutions of Metrology","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114082916","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 17
Third-Order Nonlinear Optical Properties of Quantum Dots 量子点的三阶非线性光学性质
Standards, Methods and Solutions of Metrology Pub Date : 2019-02-15 DOI: 10.5772/INTECHOPEN.84191
K. E. Jasim
{"title":"Third-Order Nonlinear Optical Properties of Quantum Dots","authors":"K. E. Jasim","doi":"10.5772/INTECHOPEN.84191","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.84191","url":null,"abstract":"Quantum dots (QDs) are semiconducting nanocrystalline particles. QDs are attractive photonic media. In this chapter, we introduce third-order nonlinear optical properties and a brief idea about the physics of QDs. Z-scan technique and theoretical analysis adopted to obtain nonlinear parameters will be discussed. Analysis of third-order nonlinear optical parameters for PbS QDs suspended in toluene with radii 2.4 and 5.0 nm under different excitation beam power level and three different wavelengths (488, 514, and 633 nm) will be detailed. Third-order optical susceptibility χ (3) and optical-limiting behavior of PbS QD suspended in toluene are presented. Irrespective of their size, QDs are a good example of optical limiters with low threshold.","PeriodicalId":275425,"journal":{"name":"Standards, Methods and Solutions of Metrology","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-02-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122326253","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
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