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Nanoliquid Processes for Electronic Devices最新文献

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Thin-Film Oxide Transistor by Liquid Process (2): UV and Solvothermal Treatments for TFT Fabrication 液态氧化薄膜晶体管(2):紫外和溶剂热处理在TFT制造中的应用
Nanoliquid Processes for Electronic Devices Pub Date : 1900-01-01 DOI: 10.1007/978-981-13-2953-1_17
T. Shimoda
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引用次数: 0
Liquid Silicon Family Materials(1): SiO2, CoSi2, and Al 液态硅族材料(1):SiO2、CoSi2和Al
Nanoliquid Processes for Electronic Devices Pub Date : 1900-01-01 DOI: 10.1007/978-981-13-2953-1_6
T. Shimoda
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引用次数: 0
Liquid Silicon 液体硅
Nanoliquid Processes for Electronic Devices Pub Date : 1900-01-01 DOI: 10.1007/978-981-13-2953-1_3
Tatsuya Shimoda
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引用次数: 0
Direct Imprinting of Gel (Nano-rheology Printing) 凝胶直接压印(纳米流变学印刷)
Nanoliquid Processes for Electronic Devices Pub Date : 1900-01-01 DOI: 10.1007/978-981-13-2953-1_14
T. Shimoda
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引用次数: 0
Novel Materials Proper to Liquid Process 适用于液体工艺的新型材料
Nanoliquid Processes for Electronic Devices Pub Date : 1900-01-01 DOI: 10.1007/978-981-13-2953-1_15
T. Shimoda
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引用次数: 0
Improvement of Solid Through Improved Solutions and Gels (1): Utilization of Reduction Agent and Reduced Atmosphere 通过改进溶液和凝胶改善固体(1):还原剂和还原气氛的利用
Nanoliquid Processes for Electronic Devices Pub Date : 1900-01-01 DOI: 10.1007/978-981-13-2953-1_12
T. Shimoda
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引用次数: 0
Thin-Film Oxide Transistor by Liquid Process (1): FGT (Ferroelectric Gate Thin-Film Transistor) 液态氧化薄膜晶体管(1):FGT(铁电栅薄膜晶体管)
Nanoliquid Processes for Electronic Devices Pub Date : 1900-01-01 DOI: 10.1007/978-981-13-2953-1_16
T. Shimoda
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引用次数: 0
Thin Film Formation by Coating 涂层形成薄膜
Nanoliquid Processes for Electronic Devices Pub Date : 1900-01-01 DOI: 10.1007/978-981-13-2953-1_4
T. Shimoda
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引用次数: 0
Liquid Vapor Deposition Using Liquid Silicon (LVD) 利用液态硅(LVD)进行液相气相沉积
Nanoliquid Processes for Electronic Devices Pub Date : 1900-01-01 DOI: 10.1007/978-981-13-2953-1_5
T. Shimoda
{"title":"Liquid Vapor Deposition Using Liquid Silicon (LVD)","authors":"T. Shimoda","doi":"10.1007/978-981-13-2953-1_5","DOIUrl":"https://doi.org/10.1007/978-981-13-2953-1_5","url":null,"abstract":"","PeriodicalId":266266,"journal":{"name":"Nanoliquid Processes for Electronic Devices","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127331632","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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