Chappel Sharrock, B. Hicks, Emily M. Turner, George Wang, M. Law, K. Jones
{"title":"Activation Energy of Rapid Ge Diffusion along Si/SiO2 Interfaces during High Temperature Oxidation.","authors":"Chappel Sharrock, B. Hicks, Emily M. Turner, George Wang, M. Law, K. Jones","doi":"10.2172/1862899","DOIUrl":"https://doi.org/10.2172/1862899","url":null,"abstract":"","PeriodicalId":259494,"journal":{"name":"Proposed for presentation at the MRS Spring 2021 - Virtual Conference held April 17-23, 2021.","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129403765","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}