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Activation Energy of Rapid Ge Diffusion along Si/SiO2 Interfaces during High Temperature Oxidation.

Proposed for presentation at the MRS Spring 2021 - Virtual Conference held April 17-23, 2021. Pub Date : 2021-04-01 DOI:10.2172/1862899
Chappel Sharrock, B. Hicks, Emily M. Turner, George Wang, M. Law, K. Jones
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高温氧化过程中Ge沿Si/SiO2界面快速扩散的活化能
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Proposed for presentation at the MRS Spring 2021 - Virtual Conference held April 17-23, 2021.
Proposed for presentation at the MRS Spring 2021 - Virtual Conference held April 17-23, 2021.
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