Universal Journal of Physics and Application最新文献_第6页

From Electrojet to ITER: India's Journey in Experimental Plasma Physics 从电射流到ITER:印度实验等离子体物理学之旅

Universal Journal of Physics and Application Pub Date : 2017-02-01 DOI: 10.13189/UJPA.2017.110104

P. I. John

{"title":"From Electrojet to ITER: India's Journey in Experimental Plasma Physics","authors":"P. I. John","doi":"10.13189/UJPA.2017.110104","DOIUrl":"https://doi.org/10.13189/UJPA.2017.110104","url":null,"abstract":"India has an international presence in Plasma Physics and its diverse applications such as thermonuclear fusion, material processing, strategic and environmental applications and plasma devices. From a modest start in the early 1970s, we have made great strides in the field of experimental plasma physics. Capacity building in techniques relevant to plasma production, manipulation and parameter control, pulsed power, creation of magnetic fields of complex geometries, clean vacuum and pumping systems, development and deployment of diagnostics to enable understanding of fundamental processes in plasmas and computer simulation to model plasma phenomena have been truly remarkable. Parallel to this, a community of physicists, engineers and computer experts has grown and matured. Funding mechanisms and financial support essential to broad base the research and development activity by drawing in Universities and education institutes have been nucleated. It is through these activities that the human resource and technology development essential to sustain India's ambitious forays into magnetic confinement fusion and industrial and strategic plasma applications has taken place. This paper is an attempt to give a historical perspective to this journey, which started at the Physical Research Laboratory, Ahmedabad and later, involved the Institute for Plasma Research at Gandhinagar, many DAE Institutions, IITs and Universities.","PeriodicalId":23443,"journal":{"name":"Universal Journal of Physics and Application","volume":"143 1","pages":"33-43"},"PeriodicalIF":0.0,"publicationDate":"2017-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75041650","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Light in the Service of Mankind 为人类服务的光

Universal Journal of Physics and Application Pub Date : 2017-02-01 DOI: 10.13189/UJPA.2017.110101

J. Connerade

引用次数: 0

Renormalization the Energy of Elementary Excitations in Solids by the Strong (Nuclear) Interaction 用强(核)相互作用重整固体中基本激发的能量

Universal Journal of Physics and Application Pub Date : 2017-01-01 DOI: 10.13189/UJPA.2017.110102

V. Plekhanov

引用次数: 1

Investigation of Optical Properties on BaSnO 3 Materials basno3材料光学性质的研究

Universal Journal of Physics and Application Pub Date : 2017-01-01 DOI: 10.13189/UJPA.2017.110603

D. T. Anh, N. T. Thanh

引用次数: 2

Challenges of Superdense Coding with Accelerated Fermions 用加速费米子进行高密度编码的挑战

Universal Journal of Physics and Application Pub Date : 2017-01-01 DOI: 10.13189/UJPA.2017.110501

Mehrnoosh Farahmand, H. Mohammadzadeh

引用次数: 0

Industrial Use of HiPIMS up to Now and a Glance into the Future, A Review by a Manufacturer Introduction of the hiP-V hiPlus Technology hiims的工业应用现状及未来展望，一家制造商的回顾介绍hiP-V hiPlus技术

Universal Journal of Physics and Application Pub Date : 2017-01-01 DOI: 10.13189/UJPA.2017.110301

G. Eichenhofer, I. Fernandez, A. Wennberg

{"title":"Industrial Use of HiPIMS up to Now and a Glance into the Future, A Review by a Manufacturer Introduction of the hiP-V hiPlus Technology","authors":"G. Eichenhofer, I. Fernandez, A. Wennberg","doi":"10.13189/UJPA.2017.110301","DOIUrl":"https://doi.org/10.13189/UJPA.2017.110301","url":null,"abstract":"It has been demonstrated by several groups that HiPIMS is a state of the art tool for applying demanding coatings with superior film properties. The real industrial breakthrough for the HiPIMS-technology has not yet happened. On the other hand, the up till now available HiPIMS-PS were mainly been up-scaled “prototypes”, far away from industrial work horses. With the hiP-V HiPIMS power system, a direct derivative of a robust power supply technology already in commercial use for public transportation systems, another milestone is set to make the HiPIMS technology go mainstream. HiPIMS is not a revolution that will make all other technologies obsolete, yet it is a very powerful complement. With a reliable, multi-functional power supply and with a rapid arc-handling, it could possibly be a start of a new era in thin film production. Just consider the possibility of etching and implantation to increase cleanliness and adhesion of the samples. Until now, most of the R&D work done in HiPIMS, has been dedicated to hard coatings and tool coatings. Here, HiPIMS is surely useful but not the expected technological breakthrough. For the future, the implementation of the new pos. reverse pulse, the hiP-V hiPlus HiPIMS technology, is opening a whole new field of possible applications for i.e. nonconductive substrates where no bias can be applied. Glass and plastics can be processed with remarkable results in hardness, enhanced film properties and additionally, it is achieved at lower substrate temperatures. It has been a slow start for HiPIMS, but the future looks bright.","PeriodicalId":23443,"journal":{"name":"Universal Journal of Physics and Application","volume":"1 1","pages":"73-79"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88870987","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 10

Quality Control of Intensity Modulated Radiation Therapy (IMRT) 调强放射治疗(IMRT)质量控制

Universal Journal of Physics and Application Pub Date : 2017-01-01 DOI: 10.13189/ujpa.2017.110201

M. Mahfuzur, A. Golam, Md. Anwarul

{"title":"Quality Control of Intensity Modulated Radiation Therapy (IMRT)","authors":"M. Mahfuzur, A. Golam, Md. Anwarul","doi":"10.13189/ujpa.2017.110201","DOIUrl":"https://doi.org/10.13189/ujpa.2017.110201","url":null,"abstract":"The aim of this study is to ensure the MLC positional and leaf speed accuracy. To check the MLC positional and leaf speed accuracy picket fence and synchronized segmented stripes test pattern were performed. The relative and absolute dosimetric verification were analyzed in this study. This project was followed by Quality control for Intensity-Modulated Radiation Therapy, as in the Recommendation No.15 from SGSMP. For relative dosimetric verification test such as different dose in same depth, same dose in different depth, chair test and inhomogeneous test were performed. All the plans were followed by Gamma index. To verify absolute dose 0.3 cc SemiFlex chamber along with a PTW solid water phantom was used. In picket fence and synchronized segmented stripes test, match-lines appear at -10.0, -5.0, 0.0, 5.0, 10.0 and -12.0, -8.0, -4.0, 0.0, 4.0, 8.0, 12.0 cm respectively from the center of the field. The Gamma Index for the different dose in same depth, same dose in different depth, chair test and inhomogeneous test were 99.48% & -0.52%, 99.35% & -0.65%, 99.04% & -1.96% and 98.34% & -1.66% at the pixel range of -1.00 to 1.00 & 1.00 to 2.00 respectively. Calculated and measured absolute dose for three cases were 2.050 &1.970 (% deviation 4.06), 1.728 & 1.730 (% deviation -0.011) and 1.270 & 1.250 (% deviation 1.6).","PeriodicalId":23443,"journal":{"name":"Universal Journal of Physics and Application","volume":"20 1","pages":"45-49"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91374867","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Study on Discharge Dynamics in an Atmospheric Pressure Dielectric Barrier Discharge 常压介质阻挡放电放电动力学研究

Universal Journal of Physics and Application Pub Date : 2017-01-01 DOI: 10.13189/UJPA.2017.110302

W. Tay, S. S. Kausik, S. Yap, C. S. Wong

{"title":"Study on Discharge Dynamics in an Atmospheric Pressure Dielectric Barrier Discharge","authors":"W. Tay, S. S. Kausik, S. Yap, C. S. Wong","doi":"10.13189/UJPA.2017.110302","DOIUrl":"https://doi.org/10.13189/UJPA.2017.110302","url":null,"abstract":"In this work, the discharge dynamics in an atmospheric pressure dielectric barrier discharge (DBD) is studied in a DBD reactor having parallel plate electrodes geometry. The DBD reactor is powered by a 50 Hz ac high voltage power source through a ballast resistor. The images of filaments occurring in the discharge gap are captured using a high speed intensified charge coupled device camera. The occurrence of frequent synchronous breakdown of micro discharges has been observed across the discharge gap when the electron avalanche happens in the direction from the dielectric surface towards the opposite electrode. The discharge gap dependence on synchronous breakdown is studied by changing the discharge gap. The shape of the filaments has been found to be strongly dependent on the direction of the electron avalanche. It is demonstrated that the diffusion of electrons occurs when the electron avalanche happens in the direction towards the dielectric from the opposite electrode. A smaller diffusion leading to narrower filaments is observed when the electron avalanche happens in the direction from the dielectric to the opposite electrode. This can be explained by the existence of memory charge on the dielectric surface.","PeriodicalId":23443,"journal":{"name":"Universal Journal of Physics and Application","volume":"83 1","pages":"80-84"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84253921","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Mass-spectrum of Charged Leptons from the Planck Mass 来自普朗克质量的带电轻子的质谱

Universal Journal of Physics and Application Pub Date : 2016-12-01 DOI: 10.13189/ujpa.2016.100605

A. Kotkov

引用次数: 0

Scale Independent Workable Model of Final Unification 最终统一的尺度独立可行模型

Universal Journal of Physics and Application Pub Date : 2016-12-01 DOI: 10.13189/UJPA.2016.100604

U. Seshavatharam, S. Lakshminarayana

引用次数: 8