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The transactions of the Institute of Electrical Engineers of Japan.A最新文献

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Scene Expression of WAKA by using the Techno Craft 用技术工艺表达WAKA的场景
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/ieejfms.137.553
H. Miyauchi, Yoko Ogawa
{"title":"Scene Expression of WAKA by using the Techno Craft","authors":"H. Miyauchi, Yoko Ogawa","doi":"10.1541/ieejfms.137.553","DOIUrl":"https://doi.org/10.1541/ieejfms.137.553","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"7 1","pages":"553-558"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89946482","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of Hablanian Plot Results based on Fiber Laser Welding Data for Stainless Steel 基于不锈钢光纤激光焊接数据的hablian图结果研究
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/IEEJFMS.137.271
M. Heya, A. Tsuboi, Masao Tagawa
{"title":"Investigation of Hablanian Plot Results based on Fiber Laser Welding Data for Stainless Steel","authors":"M. Heya, A. Tsuboi, Masao Tagawa","doi":"10.1541/IEEJFMS.137.271","DOIUrl":"https://doi.org/10.1541/IEEJFMS.137.271","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"13 1","pages":"271-277"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74521476","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Correlations between Durations of Negative Downward Stepped Leaders and Peak Currents of First Return Strokes 负下阶先导持续时间与首回击球峰值电流的相关性研究
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/IEEJFMS.137.489
M. Matsui, K. Michishita
{"title":"Correlations between Durations of Negative Downward Stepped Leaders and Peak Currents of First Return Strokes","authors":"M. Matsui, K. Michishita","doi":"10.1541/IEEJFMS.137.489","DOIUrl":"https://doi.org/10.1541/IEEJFMS.137.489","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"98 1","pages":"489-496"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79481911","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Interfacial Stress Occured with Formation of CoFe 2 O 4 Nanopillars in BaTiO 3 Films batio3薄膜中cofe2o4纳米柱的形成产生了界面应力
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/IEEJFMS.137.135
Shogo Sota, Shuya Tajiri, Y. Yoshida, Y. Ichino, A. Ichinose
{"title":"Interfacial Stress Occured with Formation of CoFe 2 O 4 Nanopillars in BaTiO 3 Films","authors":"Shogo Sota, Shuya Tajiri, Y. Yoshida, Y. Ichino, A. Ichinose","doi":"10.1541/IEEJFMS.137.135","DOIUrl":"https://doi.org/10.1541/IEEJFMS.137.135","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"30 1","pages":"135-140"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80649318","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
電子線照射フッ素系絶縁材料中の電子正孔対生成量の解析;電子線照射フッ素系絶縁材料中の電子正孔対生成量の解析;Analysis for Amount of Electron Hole Pair in Electron Beam Irradiated Floride Polymers 電子線照射フッ素系絶縁材料中の電子正孔対生成量の解析;電子線照射フッ素系絶縁材料中の電子正孔対生成量の解析;Analysis for Amount of Electron Hole Pair in Electron Beam Irradiated Floride Polymers
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/IEEJFMS.137.632
Shugo Yoshida, Takahiro Nagase, K. Iwama, Hiroaki Miyake, Yasuhiro Tanaka
{"title":"電子線照射フッ素系絶縁材料中の電子正孔対生成量の解析;電子線照射フッ素系絶縁材料中の電子正孔対生成量の解析;Analysis for Amount of Electron Hole Pair in Electron Beam Irradiated Floride Polymers","authors":"Shugo Yoshida, Takahiro Nagase, K. Iwama, Hiroaki Miyake, Yasuhiro Tanaka","doi":"10.1541/IEEJFMS.137.632","DOIUrl":"https://doi.org/10.1541/IEEJFMS.137.632","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"18 1","pages":"632-638"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74044331","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Development of Non-thermal Sterilization Treatment System without Impacting to Enzyme in Vegetable Drink by Pulsed Electric Field 脉冲电场对蔬菜饮料中酶无影响的非热灭菌处理系统的研制
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/IEEJFMS.137.678
Koki Saito, Y. Nozawa, Y. Minamitani, H. Fukata
{"title":"Development of Non-thermal Sterilization Treatment System without Impacting to Enzyme in Vegetable Drink by Pulsed Electric Field","authors":"Koki Saito, Y. Nozawa, Y. Minamitani, H. Fukata","doi":"10.1541/IEEJFMS.137.678","DOIUrl":"https://doi.org/10.1541/IEEJFMS.137.678","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"35 1","pages":"678-684"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74148132","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
The Study of the Sensitizing of EUV Resist EUV抗蚀剂敏化的研究
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/IEEJFMS.137.242
A. Sekiguchi
{"title":"The Study of the Sensitizing of EUV Resist","authors":"A. Sekiguchi","doi":"10.1541/IEEJFMS.137.242","DOIUrl":"https://doi.org/10.1541/IEEJFMS.137.242","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"1 1","pages":"242-245"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81754969","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Characteristic of Generation of Intense Microwave in Oversized W-band Surface Wave Oscillator Driven by Weakly Relativistic Electron Beam 弱相对论电子束驱动w波段超大表面波振荡器强微波的产生特性
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/IEEJFMS.137.165
Y. Annaka, K. Yambe, K. Ogura
{"title":"Characteristic of Generation of Intense Microwave in Oversized W-band Surface Wave Oscillator Driven by Weakly Relativistic Electron Beam","authors":"Y. Annaka, K. Yambe, K. Ogura","doi":"10.1541/IEEJFMS.137.165","DOIUrl":"https://doi.org/10.1541/IEEJFMS.137.165","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"14 1","pages":"165-170"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73220368","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electrochemical Deposition of Transparent p-type Semiconductor NiO 透明p型半导体NiO的电化学沉积
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/IEEJFMS.137.542
Bayingaerdi Tong, M. Ichimura
{"title":"Electrochemical Deposition of Transparent p-type Semiconductor NiO","authors":"Bayingaerdi Tong, M. Ichimura","doi":"10.1541/IEEJFMS.137.542","DOIUrl":"https://doi.org/10.1541/IEEJFMS.137.542","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"8 1","pages":"542-546"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75356484","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Deposition of DLC Films using Intense Pulsed Beam in Plasma Focus Device 等离子体聚焦装置中强脉冲束沉积DLC薄膜的研究
The transactions of the Institute of Electrical Engineers of Japan.A Pub Date : 2017-01-01 DOI: 10.1541/IEEJFMS.137.559
Hiroaki Ito, Y. Nakata, Zhiping Wang
{"title":"Deposition of DLC Films using Intense Pulsed Beam in Plasma Focus Device","authors":"Hiroaki Ito, Y. Nakata, Zhiping Wang","doi":"10.1541/IEEJFMS.137.559","DOIUrl":"https://doi.org/10.1541/IEEJFMS.137.559","url":null,"abstract":"","PeriodicalId":23081,"journal":{"name":"The transactions of the Institute of Electrical Engineers of Japan.A","volume":"21 1","pages":"559-563"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78750049","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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