Two ChurchesPub Date : 2019-12-31DOI: 10.1525/9780520908451-001
Robert J. Brentano
{"title":"PREFACE TO NEW EDITION","authors":"Robert J. Brentano","doi":"10.1525/9780520908451-001","DOIUrl":"https://doi.org/10.1525/9780520908451-001","url":null,"abstract":"","PeriodicalId":205951,"journal":{"name":"Two Churches","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126358157","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Two ChurchesPub Date : 2019-12-31DOI: 10.1525/9780520908451-004
A. Dostanko, V. Ivkin
{"title":"I. THE CONNECTION","authors":"A. Dostanko, V. Ivkin","doi":"10.1525/9780520908451-004","DOIUrl":"https://doi.org/10.1525/9780520908451-004","url":null,"abstract":"the phosphorus into the oxide results in a negligible threshold voL.-tage growth and transconductance reductioniLobility degradation ina IOSPT channel of a split drain—contact transistor has been tes—ted by means of an in—situ Hall current method. It is shown thatdoping oxide with phosphorus leads to a negligible reduction 0±'","PeriodicalId":205951,"journal":{"name":"Two Churches","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125402981","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}