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Plasmas and Polymers最新文献

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Electrical and Optical Diagnostics of Dielectric Barrier Discharges (DBD) in He and N2 for Polymer Treatment 聚合物处理中He和N2介质阻挡放电(DBD)的电学和光学诊断
Plasmas and Polymers Pub Date : 2000-06-01 DOI: 10.1023/A:1009531831404
S. F. Miralaï, E. Monette, R. Bartnikas, G. Czeremuszkin, M. Latreche, M. Wertheimer
{"title":"Electrical and Optical Diagnostics of Dielectric Barrier Discharges (DBD) in He and N2 for Polymer Treatment","authors":"S. F. Miralaï, E. Monette, R. Bartnikas, G. Czeremuszkin, M. Latreche, M. Wertheimer","doi":"10.1023/A:1009531831404","DOIUrl":"https://doi.org/10.1023/A:1009531831404","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"37 1","pages":"63-77"},"PeriodicalIF":0.0,"publicationDate":"2000-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80952864","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 66
Surface Functionalization at Atmospheric Pressure by DBD-Based Pulsed Plasma Polymerization 常压下基于dbd的脉冲等离子体聚合表面功能化
Plasmas and Polymers Pub Date : 2000-06-01 DOI: 10.1023/A:1009583815474
C. Klages, K. Höpfner, Niklas Kläke, R. Thyen
{"title":"Surface Functionalization at Atmospheric Pressure by DBD-Based Pulsed Plasma Polymerization","authors":"C. Klages, K. Höpfner, Niklas Kläke, R. Thyen","doi":"10.1023/A:1009583815474","DOIUrl":"https://doi.org/10.1023/A:1009583815474","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"1 1","pages":"79-89"},"PeriodicalIF":0.0,"publicationDate":"2000-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80031933","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 54
Sterilization by Low-Pressure Plasma: The Role of Vacuum-Ultraviolet Radiation 低压等离子体灭菌:真空-紫外线辐射的作用
Plasmas and Polymers Pub Date : 2000-03-01 DOI: 10.1023/A:1009504209276
S. Lerouge, A. Fozza, M. Wertheimer, R. Marchand, L. Yahia
{"title":"Sterilization by Low-Pressure Plasma: The Role of Vacuum-Ultraviolet Radiation","authors":"S. Lerouge, A. Fozza, M. Wertheimer, R. Marchand, L. Yahia","doi":"10.1023/A:1009504209276","DOIUrl":"https://doi.org/10.1023/A:1009504209276","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"25 1","pages":"31-46"},"PeriodicalIF":0.0,"publicationDate":"2000-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79337406","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 113
Plasma-Deposition of Ag-Containing Polyethyleneoxide-Like Coatings 等离子沉积含银类聚环氧乙烷涂层
Plasmas and Polymers Pub Date : 2000-03-01 DOI: 10.1023/A:1009517408368
P. Favia, M. Vulpio, R. Marino, R. D'agostino, R. Mota, M. Catalano
{"title":"Plasma-Deposition of Ag-Containing Polyethyleneoxide-Like Coatings","authors":"P. Favia, M. Vulpio, R. Marino, R. D'agostino, R. Mota, M. Catalano","doi":"10.1023/A:1009517408368","DOIUrl":"https://doi.org/10.1023/A:1009517408368","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"10 1","pages":"1-14"},"PeriodicalIF":0.0,"publicationDate":"2000-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73697755","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 53
Influence of Vapor Phase Pretreatments of Epoxy Surfaces on the Nucleation of MOCVD Copper Thin Films 环氧表面气相预处理对MOCVD铜薄膜成核的影响
Plasmas and Polymers Pub Date : 2000-03-01 DOI: 10.1023/A:1009560413046
S. Vidal, F. Maury, A. Gleizes, Y. Segui, N. Lacombe, P. Raynaud
{"title":"Influence of Vapor Phase Pretreatments of Epoxy Surfaces on the Nucleation of MOCVD Copper Thin Films","authors":"S. Vidal, F. Maury, A. Gleizes, Y. Segui, N. Lacombe, P. Raynaud","doi":"10.1023/A:1009560413046","DOIUrl":"https://doi.org/10.1023/A:1009560413046","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"55 1","pages":"15-29"},"PeriodicalIF":0.0,"publicationDate":"2000-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76669321","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
A Surface Masking Technique for the Determination of Plasma Polymer Film Thickness by AFM 原子力显微镜测定等离子体聚合物膜厚度的表面掩蔽技术
Plasmas and Polymers Pub Date : 2000-03-01 DOI: 10.1023/A:1009508426115
P. Hartley, H. Thissen, T. Vaithianathan, H. Griesser
{"title":"A Surface Masking Technique for the Determination of Plasma Polymer Film Thickness by AFM","authors":"P. Hartley, H. Thissen, T. Vaithianathan, H. Griesser","doi":"10.1023/A:1009508426115","DOIUrl":"https://doi.org/10.1023/A:1009508426115","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"1 1","pages":"47-60"},"PeriodicalIF":0.0,"publicationDate":"2000-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88122355","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 47
Universal Correlation of Nitrogen 1s and Oxygen 1s Photoelectron Binding Energies with Chemical Composition in Nitrogen-Containing Plasma Polymers 含氮等离子体聚合物中氮1s和氧1s光电子结合能与化学成分的普遍相关性
Plasmas and Polymers Pub Date : 1999-12-01 DOI: 10.1023/A:1021831527895
T. Gengenbach, R. Chatelier, H. Griesser
{"title":"Universal Correlation of Nitrogen 1s and Oxygen 1s Photoelectron Binding Energies with Chemical Composition in Nitrogen-Containing Plasma Polymers","authors":"T. Gengenbach, R. Chatelier, H. Griesser","doi":"10.1023/A:1021831527895","DOIUrl":"https://doi.org/10.1023/A:1021831527895","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"51 1","pages":"283-307"},"PeriodicalIF":0.0,"publicationDate":"1999-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74869699","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 14
Ashing of Organic Compounds with Spray-Type Plasma Reactor at Atmospheric Pressure 常压下喷雾式等离子体反应器对有机化合物灰化的研究
Plasmas and Polymers Pub Date : 1999-12-01 DOI: 10.1023/A:1021879411056
Kunihito Tanaka, T. Inomata, M. Kogoma
{"title":"Ashing of Organic Compounds with Spray-Type Plasma Reactor at Atmospheric Pressure","authors":"Kunihito Tanaka, T. Inomata, M. Kogoma","doi":"10.1023/A:1021879411056","DOIUrl":"https://doi.org/10.1023/A:1021879411056","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"105 1","pages":"269-281"},"PeriodicalIF":0.0,"publicationDate":"1999-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80700906","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
In situ and Real-Time Monitoring of Plasma-Induced Etching of PET and Acrylic Films 等离子体诱导蚀刻PET和丙烯酸薄膜的原位和实时监测
Plasmas and Polymers Pub Date : 1999-12-01 DOI: 10.1023/A:1021875310148
M. Shi, G. Graff, M. Gross, P. Martin
{"title":"In situ and Real-Time Monitoring of Plasma-Induced Etching of PET and Acrylic Films","authors":"M. Shi, G. Graff, M. Gross, P. Martin","doi":"10.1023/A:1021875310148","DOIUrl":"https://doi.org/10.1023/A:1021875310148","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"57 1-2 1","pages":"247-258"},"PeriodicalIF":0.0,"publicationDate":"1999-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85462783","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Identification of Fragment Ions by Their Kinetic Energy Gained During Dissociative Ionization by Electron Impact 用电子冲击解离电离获得的动能鉴定碎片离子
Plasmas and Polymers Pub Date : 1999-12-01 DOI: 10.1023/A:1021827426986
R. Foest, R. Basner, M. Schmidt
{"title":"Identification of Fragment Ions by Their Kinetic Energy Gained During Dissociative Ionization by Electron Impact","authors":"R. Foest, R. Basner, M. Schmidt","doi":"10.1023/A:1021827426986","DOIUrl":"https://doi.org/10.1023/A:1021827426986","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"49 23","pages":"259-268"},"PeriodicalIF":0.0,"publicationDate":"1999-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91468115","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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