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Plasmas and Polymers最新文献

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Hydrophilization of PVC Surfaces by Argon Plasma Immersion Ion Implantation 氩等离子体浸没离子注入PVC表面的亲水性研究
Plasmas and Polymers Pub Date : 2003-03-01 DOI: 10.1023/A:1022827307458
W. C. A. Bento, R. Y. Honda, M. E. Kayama, W. Schreiner, N. Cruz, E. Rangel
{"title":"Hydrophilization of PVC Surfaces by Argon Plasma Immersion Ion Implantation","authors":"W. C. A. Bento, R. Y. Honda, M. E. Kayama, W. Schreiner, N. Cruz, E. Rangel","doi":"10.1023/A:1022827307458","DOIUrl":"https://doi.org/10.1023/A:1022827307458","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"24 1","pages":"1-11"},"PeriodicalIF":0.0,"publicationDate":"2003-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74579913","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 21
Chlorinated Organic Compound Removal by Gas Phase Pulsed Streamer Corona Electrical Discharge with Reticulated Vitreous Carbon Electrodes 网状玻璃碳电极气相脉冲流光电晕放电去除氯化有机化合物的研究
Plasmas and Polymers Pub Date : 2003-01-01 DOI: 10.1023/A:1024845721132
M. Kirkpatrick, W. C. Finney, B. Locke
{"title":"Chlorinated Organic Compound Removal by Gas Phase Pulsed Streamer Corona Electrical Discharge with Reticulated Vitreous Carbon Electrodes","authors":"M. Kirkpatrick, W. C. Finney, B. Locke","doi":"10.1023/A:1024845721132","DOIUrl":"https://doi.org/10.1023/A:1024845721132","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"206 1","pages":"165-177"},"PeriodicalIF":0.0,"publicationDate":"2003-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89320922","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 27
Plasma Copolymerization of Acrylic Acid with Hexamethyldisilazane 丙烯酸与六甲基二氮杂烷的等离子体共聚
Plasmas and Polymers Pub Date : 2002-12-01 DOI: 10.1023/A:1021333120098
T. Hirotsu, Chie Tagaki, A. Partridge
{"title":"Plasma Copolymerization of Acrylic Acid with Hexamethyldisilazane","authors":"T. Hirotsu, Chie Tagaki, A. Partridge","doi":"10.1023/A:1021333120098","DOIUrl":"https://doi.org/10.1023/A:1021333120098","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"1 1","pages":"353-366"},"PeriodicalIF":0.0,"publicationDate":"2002-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76818219","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 19
Surface Fluorination of Carboxylated Nitrile Butadiene Rubber: An XPS Study 羧基丁腈橡胶表面氟化的XPS研究
Plasmas and Polymers Pub Date : 2002-12-01 DOI: 10.1023/A:1021376902351
E. Durand, C. Labrugère, A. Tressaud, M. Renaud
{"title":"Surface Fluorination of Carboxylated Nitrile Butadiene Rubber: An XPS Study","authors":"E. Durand, C. Labrugère, A. Tressaud, M. Renaud","doi":"10.1023/A:1021376902351","DOIUrl":"https://doi.org/10.1023/A:1021376902351","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"61 1","pages":"311-325"},"PeriodicalIF":0.0,"publicationDate":"2002-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89063299","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Deposition of SiO2-Like Films by HMDSN/O2 Plasmas at Low Pressure in a MMP-DECR Reactor HMDSN/O2等离子体在MMP-DECR反应器中低压沉积类sio2薄膜
Plasmas and Polymers Pub Date : 2002-12-01 DOI: 10.1023/A:1021329019189
S. Sahli, S. Rebiai, P. Raynaud, Y. Segui, A. Zenasni, S. Mouissat
{"title":"Deposition of SiO2-Like Films by HMDSN/O2 Plasmas at Low Pressure in a MMP-DECR Reactor","authors":"S. Sahli, S. Rebiai, P. Raynaud, Y. Segui, A. Zenasni, S. Mouissat","doi":"10.1023/A:1021329019189","DOIUrl":"https://doi.org/10.1023/A:1021329019189","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"12 1","pages":"327-340"},"PeriodicalIF":0.0,"publicationDate":"2002-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86143275","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 23
Analysis of Low-k Organosilicon and Low-Density Silica Films Deposited in HMDSO Plasmas HMDSO等离子体沉积低钾有机硅和低密度二氧化硅薄膜的分析
Plasmas and Polymers Pub Date : 2002-12-01 DOI: 10.1023/A:1021381003259
G. Borvon, A. Goullet, A. Granier, G. Turban
{"title":"Analysis of Low-k Organosilicon and Low-Density Silica Films Deposited in HMDSO Plasmas","authors":"G. Borvon, A. Goullet, A. Granier, G. Turban","doi":"10.1023/A:1021381003259","DOIUrl":"https://doi.org/10.1023/A:1021381003259","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"11 1","pages":"341-352"},"PeriodicalIF":0.0,"publicationDate":"2002-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87569346","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 33
Deposition of SiOx Films from Hexamethyldisiloxane/Oxygen Radiofrequency Glow Discharges: Process Optimization by Plasma Diagnostics 六甲基二硅氧烷/氧射频辉光放电沉积SiOx薄膜:等离子体诊断工艺优化
Plasmas and Polymers Pub Date : 2002-09-01 DOI: 10.1023/A:1019942625607
M. Creatore, F. Palumbo, R. D'agostino
{"title":"Deposition of SiOx Films from Hexamethyldisiloxane/Oxygen Radiofrequency Glow Discharges: Process Optimization by Plasma Diagnostics","authors":"M. Creatore, F. Palumbo, R. D'agostino","doi":"10.1023/A:1019942625607","DOIUrl":"https://doi.org/10.1023/A:1019942625607","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"10 1","pages":"291-310"},"PeriodicalIF":0.0,"publicationDate":"2002-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90375885","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 69
Electroless Deposition of Copper on Poly(tetrafluoroethylene) Films Modified by Plasma-Induced Surface Grafting of Poly(4-vinylpyridine) 等离子体诱导聚4-乙烯吡啶表面接枝改性聚四氟乙烯薄膜上化学沉积铜
Plasmas and Polymers Pub Date : 2002-09-01 DOI: 10.1023/A:1019934323790
W. Wang, Yan Zhang, E. Kang, K. Neoh
{"title":"Electroless Deposition of Copper on Poly(tetrafluoroethylene) Films Modified by Plasma-Induced Surface Grafting of Poly(4-vinylpyridine)","authors":"W. Wang, Yan Zhang, E. Kang, K. Neoh","doi":"10.1023/A:1019934323790","DOIUrl":"https://doi.org/10.1023/A:1019934323790","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"17 1","pages":"207-225"},"PeriodicalIF":0.0,"publicationDate":"2002-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75398874","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
Synthesis of Polymer Films by an Electron Emission CVD Technique 电子发射CVD技术合成聚合物薄膜
Plasmas and Polymers Pub Date : 2002-09-01 DOI: 10.1023/A:1019986307860
Jianjun Wang, M. B. De Moraes, R. Landers, B. C. Trasferetti
{"title":"Synthesis of Polymer Films by an Electron Emission CVD Technique","authors":"Jianjun Wang, M. B. De Moraes, R. Landers, B. C. Trasferetti","doi":"10.1023/A:1019986307860","DOIUrl":"https://doi.org/10.1023/A:1019986307860","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"36 1","pages":"227-244"},"PeriodicalIF":0.0,"publicationDate":"2002-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85430406","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Novel AC and DC Non-Thermal Plasma Sources for Cold Surface Treatment of Polymer Films and Fabrics at Atmospheric Pressure 常压下用于聚合物薄膜和织物表面冷处理的新型交、直流非热等离子体源
Plasmas and Polymers Pub Date : 2002-09-01 DOI: 10.1023/A:1019990508769
Y. Akishev, M. Grushin, A. Napartovich, N. Trushkin
{"title":"Novel AC and DC Non-Thermal Plasma Sources for Cold Surface Treatment of Polymer Films and Fabrics at Atmospheric Pressure","authors":"Y. Akishev, M. Grushin, A. Napartovich, N. Trushkin","doi":"10.1023/A:1019990508769","DOIUrl":"https://doi.org/10.1023/A:1019990508769","url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"37 1","pages":"261-289"},"PeriodicalIF":0.0,"publicationDate":"2002-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90613640","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 60
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