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64th Annual Technical Conference Proceedings最新文献

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Optical Properties of Amorphous MoOx, AR for Metal Conductors 金属导体非晶MoOx的光学特性
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0043
D. Tsu
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引用次数: 0
Parity-Time High Contrast (PT-HCGs): A New Platform for Integrated Thin Film Gas Sensors 奇偶时间高对比度(pt - hcg):集成薄膜气体传感器的新平台
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0050
Tahere Hemati
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引用次数: 0
ALD/PVD – Hybrid Coating for Antireflection of 3D Surfaces ALD/PVD - 3D表面增反射复合涂层
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0065
Ulrike Schulz
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引用次数: 0
Investigating the Manufacturability of Flexible Thin-Film Devices (TEGs) Using Roll-to-Roll Processing 利用卷对卷加工技术研究柔性薄膜器件的可制造性
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0058
X. Tao
{"title":"Investigating the Manufacturability of Flexible Thin-Film Devices (TEGs) Using Roll-to-Roll Processing","authors":"X. Tao","doi":"10.14332/svc21.proc.0058","DOIUrl":"https://doi.org/10.14332/svc21.proc.0058","url":null,"abstract":"","PeriodicalId":153602,"journal":{"name":"64th Annual Technical Conference Proceedings","volume":"77 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127537574","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Freeform Optics and The Ideal Antireflection Surface 自由曲面光学与理想增透表面
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0038
R. Willey
{"title":"Freeform Optics and The Ideal Antireflection Surface","authors":"R. Willey","doi":"10.14332/svc21.proc.0038","DOIUrl":"https://doi.org/10.14332/svc21.proc.0038","url":null,"abstract":"","PeriodicalId":153602,"journal":{"name":"64th Annual Technical Conference Proceedings","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125866070","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
On the Deposition Rate and Ionized Flux Fraction in High Power Impulse Magnetron Sputtering (HiPIMS) 高功率脉冲磁控溅射(HiPIMS)沉积速率和电离通量分数的研究
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0022
J. Gudmundsson
{"title":"On the Deposition Rate and Ionized Flux Fraction in High Power Impulse Magnetron Sputtering (HiPIMS)","authors":"J. Gudmundsson","doi":"10.14332/svc21.proc.0022","DOIUrl":"https://doi.org/10.14332/svc21.proc.0022","url":null,"abstract":"","PeriodicalId":153602,"journal":{"name":"64th Annual Technical Conference Proceedings","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121913870","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasma Diagnostic: A Mandatory Step Towards a Better Understanding of the Plasma Polymerization Process 等离子体诊断:迈向更好地理解等离子体聚合过程的强制性步骤
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0049
D. Thiry
{"title":"Plasma Diagnostic: A Mandatory Step Towards a Better Understanding of the Plasma Polymerization Process","authors":"D. Thiry","doi":"10.14332/svc21.proc.0049","DOIUrl":"https://doi.org/10.14332/svc21.proc.0049","url":null,"abstract":"","PeriodicalId":153602,"journal":{"name":"64th Annual Technical Conference Proceedings","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124181555","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synthesis of Porous Silicon, Nickel and Carbon Layers by Vapor Phase Dealloying 气相脱合金法制备多孔硅、镍、碳层
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0018
S. Saager, B. Scheffel, T. Modes, O. Zywitzki
{"title":"Synthesis of Porous Silicon, Nickel and Carbon Layers by Vapor Phase Dealloying","authors":"S. Saager, B. Scheffel, T. Modes, O. Zywitzki","doi":"10.14332/svc21.proc.0018","DOIUrl":"https://doi.org/10.14332/svc21.proc.0018","url":null,"abstract":"Abstract Porous thin films have various application fields, e.g., for energy conversion in fuel cells, energy storage in lithium ion batteries or supercapacitors as well for catalysis, filtration and sensing. We synthesized porous thin films by co-evaporating a low-vapor-pressure material (e.g., Si, Ni or C) together with zinc and depositing a compact layer of resulting composite. High-rate deposition process up to 100 nm/s was realized by electron beam physical vapor deposition (EB-PVD) of the materials from two graphite crucibles with a fast deflected electron beam in high vacuum. Immediately after deposition, the coated substrates were heated up in vacuum to a temperature above 500 °C and thereby zinc is removed selectively. Due to its higher vapor pressure against that of remaining component, zinc is expelled from the layer and vacancies are generated by so called vapor phase dealloying (VPD). We investigated the feasibility of VPD process for the elements silicon, nickel and carbon. The elemental composition and the morphology of the layers prior and after thermal annealing were analyzed by scanning electron microscopy, by energy-dispersive X-ray spectrometry and by X-ray diffraction.","PeriodicalId":153602,"journal":{"name":"64th Annual Technical Conference Proceedings","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114378867","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Extracting n and k Values of Optical Coating Layers From Spectrophotometric Curves 从分光光度曲线中提取光学镀膜层的n和k值
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0040
R. Willey, Consultants Willey Optical
{"title":"Extracting n and k Values of Optical Coating Layers From Spectrophotometric Curves","authors":"R. Willey, Consultants Willey Optical","doi":"10.14332/svc21.proc.0040","DOIUrl":"https://doi.org/10.14332/svc21.proc.0040","url":null,"abstract":"","PeriodicalId":153602,"journal":{"name":"64th Annual Technical Conference Proceedings","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126249124","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasma Enhanced Atomic Layer Deposition of ZnO Ultra-Thin Films Monitored by In-Situ Spectroscopic Ellipsometry 原位椭偏光谱法监测ZnO超薄膜的等离子体增强原子层沉积
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0007
U. Kılıç
{"title":"Plasma Enhanced Atomic Layer Deposition of ZnO Ultra-Thin Films Monitored by In-Situ Spectroscopic Ellipsometry","authors":"U. Kılıç","doi":"10.14332/svc21.proc.0007","DOIUrl":"https://doi.org/10.14332/svc21.proc.0007","url":null,"abstract":"","PeriodicalId":153602,"journal":{"name":"64th Annual Technical Conference Proceedings","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124551017","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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