64th Annual Technical Conference Proceedings最新文献

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ALD-CAP® Encapsulation of Wafers, Devices, and Objects ALD-CAP®晶圆、器件和对象封装
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0082
D. Higgs
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引用次数: 0
Atomic Layer Deposition: An Enabling Thin Film Nanotechnology for a Growing Number of Applications 原子层沉积:使薄膜纳米技术在越来越多的应用
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0083
W. Kessels
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引用次数: 0
The Full Range of Magnetic Array Options for Planar Magnetrons – Too Much Choice? 平面磁控管的全范围磁阵列选项-太多的选择?
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0081
D. Monaghan
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引用次数: 0
Variation of Indices of Refraction of Very Thin Silver Layers with Materials, Thickness, and Simulation Models 极薄银层折射率随材料、厚度和模拟模型的变化
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0039
R. Willey
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引用次数: 0
Enabling Extreme Fast Charging Through Control of Li Deposition Overpotential 通过控制锂沉积过电位实现极快充电
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0004
David Bock
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引用次数: 0
Innovations in E-Beam Deposition 电子束沉积的创新
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0070
Tom Guppenberger
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引用次数: 0
Interphases and Interfaces in Batteries Probed by PES Techniques 用PES技术探测电池的界面和界面
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0017
K. Edström
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引用次数: 0
Vacuum Thin Film Deposition for Automotive Applications 汽车用真空薄膜沉积
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0035
C. Deus
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引用次数: 0
Benefits of Using a Magnetic Active Anode in the Sputtering of Rotatable Magnetrons 在可旋转磁控管溅射中使用磁性活性阳极的好处
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0036
Patrick T. McCarthy, G. Ltd.
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引用次数: 0
Conveyor Imprints Cleaning, Surface Etching and Activation - All in One Scalable Solution Based on Ion Source "LUCH" from Izovac 输送印痕清洗,表面蚀刻和激活-所有在一个可扩展的解决方案,基于离子源“LUCH”从Izovac
64th Annual Technical Conference Proceedings Pub Date : 2021-09-15 DOI: 10.14332/svc21.proc.0030
Pavel Shapotkin, Izovac Ltd.
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引用次数: 0
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