2017 IEEE International Conference on Plasma Science (ICOPS)最新文献_第9页

Synthesising Nanofluids Using Laser Induced Plasma 利用激光诱导等离子体合成纳米流体

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496131

M. Thiyagarajan

引用次数: 0

3D Printed Mini Plasma Jet: Application To Hemostatic Treatment For Endoscope 3D打印迷你等离子射流:在内窥镜止血治疗中的应用

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496372

Y. Hayashi, H. Kawano, H. Miyahara, A. Okino, Yudai Nomura, T. Takamatsu, Takeshi Azuma, Syosaku Ota

引用次数: 0

Preparation Of Graphene Oxide/Conducting Polymer Nanocomposites By Rf-Plasma Polymerization 射频等离子体聚合制备氧化石墨烯/导电聚合物纳米复合材料

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496232

Sadık Çoğal, Gamze Celik Cogal, A. Oksuz

引用次数: 0

Self-Consistent Numerical Simulation of Carbon Arc for Nanoparticle Synthesis 纳米颗粒合成碳弧自洽数值模拟

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496331

A. Khrabry, A. Khodak, I. Kaganovich, Vladislav Vekselman, V. Nemchinsky

引用次数: 1

Large Scale Optimization of RF Devices 射频器件的大规模优化

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496324

A. Jensen, J. Petillo, S. Ovtchinnikov, A. Burke, D. Panagos, C. Kostas, G. Stantchev, S. Cooke

{"title":"Large Scale Optimization of RF Devices","authors":"A. Jensen, J. Petillo, S. Ovtchinnikov, A. Burke, D. Panagos, C. Kostas, G. Stantchev, S. Cooke","doi":"10.1109/PLASMA.2017.8496324","DOIUrl":"https://doi.org/10.1109/PLASMA.2017.8496324","url":null,"abstract":"The design cycle of RF devices is greatly facilitated by the use of the “virtual prototyping” methodology based on highfidelity computer simulations that are capable of predicting the RF device’s performance in response to changes in its physical parameters. In particular, parameters such as the critical dimensions of the structure or the quantitative properties of its various electromagnetic components are routinely used in the process of optimizing the desired performance characteristics of the RF device. In a typical optimization workflow these parameters are adjusted manually and the simulation code(s) run repeatedly with varying parameter values until desired design criteria are met. This type of process, however, is well suited to semisupervised global optimization. To this end we have integrated several codes including Capstone 1and MICHELLE 2with our recently developed framework prototype for high-performance RF device optimization based on DAKOTA 3and the parallel code deployment and management tool, Galaxy Simulation Builder (GSB 4. We present results from several RF device design studies- based on this extended framework and demonstrate how this approach can help automate and significantly accelerate the geometric parameter search, and ultimately improve the accuracy and efficiency of the RF device design cycle.","PeriodicalId":145705,"journal":{"name":"2017 IEEE International Conference on Plasma Science (ICOPS)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114043324","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Hydrogen Peroxide Formation at Plasma-water Interface under Positive Dc Streamer and Pulsed Corona Discharge 正直流流光和脉冲电晕放电下等离子体-水界面过氧化氢的形成

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496030

Y. Zhao, Tao Wang, S. Macgregor, Mark P. Wilson, I. Timoshkin

引用次数: 0

Beam Profile And Position Instability Of A Post-Accelerated Pseudospark-Sourced Electron Beam For An Extended Interaction Oscillator 扩展相互作用振荡器后加速伪火花源电子束的束形和位置不稳定性

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8495999

A. Cross, H. Yin, L. Zhang, W. He, G. Shu, K. Ronald, A. Phelps, J. Zhao, Y. Yin

引用次数: 0

Development Of Pulsed Pinch Plasmas For The Application As Fair Plasma Stripper* 应用于公平等离子体剥离器的脉冲捏缩等离子体的发展*

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496371

M. Iberler, T. Ackermann, B. Bohlender, K. Cistakov, C. Hock, D. Mann, G. Xu, J. Wiechula, J. Jacoby

{"title":"Development Of Pulsed Pinch Plasmas For The Application As Fair Plasma Stripper*","authors":"M. Iberler, T. Ackermann, B. Bohlender, K. Cistakov, C. Hock, D. Mann, G. Xu, J. Wiechula, J. Jacoby","doi":"10.1109/PLASMA.2017.8496371","DOIUrl":"https://doi.org/10.1109/PLASMA.2017.8496371","url":null,"abstract":"The Facility for Antiproton and Ion Research (FAIR) is a new international accelerator laboratory at the GSI in Darmstadt, Germany. The main topic at this facility is aimed to heavy ion research. The FAIR project in comparison to the existing facility GSI extends the research area by raising the energy of heavy ion beams. The demand for acceleration of the beam to the highest possible energy is a highly ionized charge state of the Ion beam. For beam stripping to get higher charge state, the traditional tools are foil stripper and gas stripper. Hence pulsed Plasma is suggested to be a stripper medium. In Frankfurt are different kinds of Pinch Plasmas under investigation for this application. One is a Spherical Theta Pinch and the other a hollow cathode Screw Pinch 1. The screw pinch plasma consists of a superposition of a linear Zpinch and a Theta pinch. The constricting effect on the plasma or conductor is produced by the magnetic field pressure resulting from the magnetic field of the linear current and magnetic field of the coil. The device operates at a frequency of approximate 14 kHz and with a capacity of $34 mu mathrm {F}$. This contribution gives the first results of the transfer efficiency and optical investigations of pulsed the screw pinch compared to a theta pinch 2. In addition first measurements of beam time experiments at GSI will be presented.","PeriodicalId":145705,"journal":{"name":"2017 IEEE International Conference on Plasma Science (ICOPS)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133572634","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Neon Plasma Jet Interactions With Conductive and Non-Conductive Targets 氖等离子体射流与导电和非导电目标的相互作用

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496130

A. Kone, B. Caillier, C. Muja, F. Sainct, P. Guillot

引用次数: 1

Investigation of the Similarity Law in Discharges at High Pressure Using A Kinetic Global Model 用动力学全局模型研究高压下泄流的相似规律

2017 IEEE International Conference on Plasma Science (ICOPS) Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496350

Yangyang Fu, Guy M. Parsey, J. Krek, J. Verboncoeur, A. Christlieb, Xinxin Wang

{"title":"Investigation of the Similarity Law in Discharges at High Pressure Using A Kinetic Global Model","authors":"Yangyang Fu, Guy M. Parsey, J. Krek, J. Verboncoeur, A. Christlieb, Xinxin Wang","doi":"10.1109/PLASMA.2017.8496350","DOIUrl":"https://doi.org/10.1109/PLASMA.2017.8496350","url":null,"abstract":"A kinetic global model framework (KGMf) has been developed and used to investigate the similarity law in discharges at high pressure. Keeping the pd (gas pressure $times $ linear dimension) unchanged, the electron and ion densities in the steady state are calculated while the geometrical similar volume increases from micron scale $(500 ~mu mathrm {m})$ to millimeter scale (2.5mm) and at the pressure decreases from 760Torr to 152Torr, correspondently. In the model, electrons, positive ions and fourteen excited levels of argon atom are considered, and the transition of excitations, three-body collisions, and stepwise ionizations, which are forbidden processes from the similarity law are included and excluded, respectively1–3. The simulation results showed that within the forbidden processes the normalized density relations are below the predicted relations from the similarity law, which is attributed to the nonlinear impact of forbidden processes. Without the forbidden processes, the parameter relations are in good agreement with the theoretical prediction from the similarity law. The KGMf has the potential for deeper studies on similarity law at high pressure, such as gas mixtures with other volume and surface processes.","PeriodicalId":145705,"journal":{"name":"2017 IEEE International Conference on Plasma Science (ICOPS)","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127574213","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0